公开(公告)号：US20180226225A1

公开(公告)日：2018-08-09

申请号：US15424405

申请日：2017-02-03

Applicant: APPLIED MATERIALS, INC.

Inventor： TRAVIS KOH ,  PHILIP ALLAN KRAUS ,  LEONID DORF ,  PRABU GOPALRAJA

IPC: H01J37/32 ,  H01L21/683 ,  H01L21/67

CPC classification number: H01J37/32045 ,  H01J37/32027 ,  H01J37/32697 ,  H01J37/32715 ,  H01J2237/332 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/6833

Abstract: Systems and methods for tunable workpiece biasing in a plasma reactor are provided herein. In some embodiments, a system includes: a plasma chamber that performs plasma processing on a workpiece, a first pulsed voltage source, coupled directly to a workpiece, a second pulsed voltage source, coupled capacitively to the workpiece, and a biasing controller comprising one or more processors, and memory, wherein the memory comprises a set of computer instructions that when executed by the one or more processors, independently controls the first pulsed voltage source and the second pulsed voltage source based on one or more parameters of the first pulsed voltage source and the second pulsed voltage source in order to tailor ion energy distribution of the flux of ions directed to the workpiece.