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公开(公告)号：US20190292653A1
公开(公告)日：2019-09-26
申请号：US16302593
申请日：2016-05-18
Applicant: Stefan BANGERT , Oliver HEIMEL , Dieter HAAS , Tommaso VERCESI , Applied Materials, Inc.
Inventor： Stefan BANGERT , Oliver HEIMEL , Dieter HAAS , Tommaso VERCESI
Abstract: An apparatus for contactless transportation of a deposition source is provided. The apparatus includes a deposition source assembly. The deposition source assembly includes the deposition source. The deposition source assembly includes a first active magnetic unit. The apparatus includes a guiding structure extending in a source transportation direction. The deposition source assembly is movable along the guiding structure. The first active magnetic unit and the guiding structure are configured for providing a first magnetic levitation force for levitating the deposition source assembly.
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公开(公告)号：US20210328146A1
公开(公告)日：2021-10-21
申请号：US16335231
申请日：2018-04-03
Applicant: Applied Materials, Inc.
Inventor： Matthias HEYMANNS , Tommaso VERCESI , Stefan BANGERT , Ulrich OLDENDORF , Achim HUWIG
Abstract: An apparatus for carrier alignment in a vacuum chamber is described. The apparatus includes a support extending in a first direction in the vacuum chamber, a magnetic levitation system configured to transport a first carrier in the first direction in the vacuum chamber, the magnetic levitation system comprising at least one magnet unit, and an alignment system for aligning the first carrier. The at least one magnet unit and the alignment system are rigidly fixed to the support. Further, a vacuum system and a method of aligning a carrier are described.
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Patent Agency Ranking
公开(公告)号：US20190301002A1
公开(公告)日：2019-10-03
申请号：US16422794
申请日：2019-06-26
Applicant: Applied Materials, Inc.
Inventor： Stefan BANGERT , Tommaso VERCESI , Daniele GISLON , Oliver HEIMEL , Andreas LOPP , Dieter HAAS
IPC: C23C14/04 , C23C16/04 , C23C16/458
Abstract: A mask arrangement for masking a substrate in a processing chamber is provided. The mask arrangement includes a mask frame having one or more frame elements and is configured to support a mask device, wherein the mask device is connectable to the mask frame; and at least one actuator connectable to at least one frame element of the one or more frame elements, wherein the at least one actuator is configured to apply a force to the at least one frame element.
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公开(公告)号：US20170342541A1
公开(公告)日：2017-11-30
申请号：US15534826
申请日：2014-12-10
Applicant: Applied Materials, Inc.
Inventor： Stefan BANGERT , Tommaso VERCESI , Daniele GISLON , Oliver HEIMEL , Andreas LOPP , Dieter HAAS
Abstract: A mask arrangement for masking a substrate in a processing chamber is provided. The mask arrangement includes a mask frame having one or more frame elements and is configured to support a mask device, wherein the mask device is connectable to the mask frame; and at least one actuator connectable to at least one frame element of the one or more frame elements, wherein the at least one actuator is configured to apply a force to the at least one frame element.
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公开(公告)号：US20210328147A1
公开(公告)日：2021-10-21
申请号：US16340372
申请日：2018-04-03
Applicant: Applied Materials, Inc.
Inventor： Tommaso VERCESI , Matthias HEYMANNS
Abstract: A carrier for supporting a substrate or a mask in a vacuum chamber in or parallel to a first plane is provided. The carrier comprises a clamping device for fixing the carrier to an aligning device and a mechanical motion element connecting the clamping device to the carrier, the mechanical motion element allowing for relative movement of the clamping device and the carrier for at least one degree of freedom and providing a fixed connection between the clamping device and the carrier for at least another degree of freedom.
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公开(公告)号：US20180030596A1
公开(公告)日：2018-02-01
申请号：US15542891
申请日：2015-01-12
Applicant: Tommaso VERCESI , Dieter HAAS , Stefan BANGERT , Oliver HEIMEL , Daniele GISLON , Applied Materials, Inc.
Inventor： Tommaso VERCESI , Dieter HAAS , Stefan BANGERT , Oliver HEIMEL , Daniele GISLON
IPC: C23C16/458 , C23C14/50 , H01L21/68 , C23C14/04
CPC classification number: C23C16/4587 , C23C14/042 , C23C14/12 , C23C14/50 , C23C16/042 , H01L21/682 , H01L51/0011
Abstract: A holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber is provided. The holding arrangement includes two or more alignment actuators connectable to at least one of the substrate carrier and the mask carrier, wherein the holding arrangement is configured to support the substrate carrier in, or parallel to, a first plane, wherein a first alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in a first direction, wherein a second alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in the first direction and a second direction different from the first direction, and wherein the first direction and the second direction are in the first plane.
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公开(公告)号：US20160043319A1
公开(公告)日：2016-02-11
申请号：US14782500
申请日：2014-04-21
Applicant: APPLIED MATERIALS, INC.
Inventor： John M. WHITE , Robert Jan VISSER , Dieter HAAS , Tommaso VERCESI , Andreas LOPP
Abstract: The embodiments described herein generally relate to active alignment of a fine metal mask. The fine metal mask is connected with a frame through a plurality of microactuators. The microactuators can act on the fine metal mask to stretch the mask, reposition the mask or both. In this way, the position and size of the fine metal mask can be maintained in relation to the substrate.
Abstract translation: 本文描述的实施例通常涉及精细金属掩模的主动对准。 细金属掩模通过多个微致动器与框架连接。 微致动器可以作用在细金属掩模上以拉伸掩模，重新定位掩模或两者。 以这种方式，可以相对于衬底维持细金属掩模的位置和尺寸。
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