MASK INSPECTION OF A SEMICONDUCTOR SPECIMEN

    公开(公告)号:US20210073963A1

    公开(公告)日:2021-03-11

    申请号:US16833380

    申请日:2020-03-27

    IPC分类号: G06T7/00 G06T1/00

    摘要: There is provided a mask inspection system and a method of mask inspection. The method comprises: during a runtime scan of a mask of a semiconductor specimen, processing a plurality of aerial images of the mask acquired by the mask inspection system to calculate a statistic-based Edge Positioning Displacement (EPD) of a potential defect, wherein the statistic-based EPD is calculated using a Print Threshold (PT) characterizing the mask and is applied to each of the one or more acquired aerial images to calculate respective EPD of the potential defect therein; and filtering the potential defect as a “runtime true” defect when the calculated statistic-based EPD exceeds a predefined EPD threshold, and filtering out the potential defect as a “false” defect when the calculated statistic-based EPD is lower than the predefined EPD threshold. The method can further comprise after-runtime EPD-based filtering of the plurality of “runtime true” defects.

    MASK INSPECTION FOR SEMICONDUCTOR SPECIMEN FABRICATION

    公开(公告)号:US20230080151A1

    公开(公告)日:2023-03-16

    申请号:US17473342

    申请日:2021-09-13

    摘要: There is provided a system and method of a method of mask inspection, comprising: obtaining a first image representative of at least part of the mask; applying a printing threshold on the first image to obtain a second image; estimating a contour for each structural element of interest (SEI) of a group of SEIs, and extracting a set of attributes characterizing the contour, giving rise to a group of contours corresponding to the group of SEIs and respective sets of attributes associated therewith; for each given contour, identifying, among the remaining contours in the group of contours, one or more reference contours similar to the given contour, by comparing between the respective sets of attributes associated therewith; and measuring a deviation between the given contour and each reference contour thereof, giving rise to one or more measured deviations indicative of whether a defect is present.

    MASK INSPECTION FOR SEMICONDUCTOR SPECIMEN FABRICATION

    公开(公告)号:US20230131950A1

    公开(公告)日:2023-04-27

    申请号:US17510227

    申请日:2021-10-25

    摘要: There is provided a system and method for mask inspection, comprising: obtaining a plurality of images, each representative of a respective part of the mask; generating a CD map of the mask comprising a plurality of composite values of a CD measurement of a POI respectively derived from the plurality of images, comprising, for each given image: dividing the given image into a plurality of sections; searching for the POI in the plurality of sections, giving rise to a set of sections, each with presence of at least one of the POI therein; for each section, obtaining a value of the CD measurement using a printing threshold, giving rise to a set of values of the CD measurement corresponding to the set of sections; and combining the set of values to a composite value of the CD measurement corresponding to the given image.

    MASK INSPECTION OF A SEMICONDUCTOR SPECIMEN

    公开(公告)号:US20220254000A1

    公开(公告)日:2022-08-11

    申请号:US17730117

    申请日:2022-04-26

    IPC分类号: G06T7/00 G06T1/00 G03F7/20

    摘要: There is provided a mask inspection system and a method of mask inspection. The method comprises: detecting, by the inspection tool, a runtime defect at a defect location on a mask of a semiconductor specimen during runtime scan of the mask, and acquiring, by the inspection tool after runtime and based on the defect location, a plurality sets of aerial images of the runtime defect corresponding to a plurality of focus states throughout a focus process window, each set of aerial images acquired at a respective focus state. The method further comprises for each set of aerial images, calculating a statistic-based EPD value of the runtime defect, thereby giving rise to a plurality of statistic-based EPD values each corresponding to a respective focus state, and determining whether the runtime defect is a true defect based on the plurality of statistic-based EPD values.

    METHOD OF GENERATING AN EXAMINATION RECIPE AND SYSTEM THEREOF

    公开(公告)号:US20190080447A1

    公开(公告)日:2019-03-14

    申请号:US15701371

    申请日:2017-09-11

    IPC分类号: G06T7/00 G06T7/11

    摘要: There are provided system and method of generating an examination recipe usable for examining a specimen, the method comprising: capturing images from dies and obtaining noise map indicative of noise distribution on the images; receiving design data representative of a plurality of design groups each having the same design pattern; calculating a group score for each given design group, the group score calculated based on the noise data associated with the given design group and a defect budget allocated for area of the given design group; providing segmentation related to the dies, comprising: associating design groups with segmentation labels indicative of different noise levels based on the group score, thereby obtaining a set of die segments each corresponding to one or more design groups associated with the same segmentation label and segmentation configuration data; and generating an examination recipe using the segmentation configuration data.

    SYSTEMS, METHODS AND COMPUTER PROGRAM PRODUCTS FOR SIGNATURE DETECTION
    7.
    发明申请
    SYSTEMS, METHODS AND COMPUTER PROGRAM PRODUCTS FOR SIGNATURE DETECTION 有权
    用于签名检测的系统,方法和计算机程序产品

    公开(公告)号:US20160292492A1

    公开(公告)日:2016-10-06

    申请号:US14673712

    申请日:2015-03-30

    IPC分类号: G06K9/00 G06K9/62 G06F3/048

    摘要: Methods, systems, and computer program products for signature detection. One example of a method includes: acquiring an article defect density map comprising a plurality of sections corresponding to a first resolution level which is indicative of defect numbers for the sections, and determining a distribution representative of the defect numbers or function thereof; determining a threshold in accordance with said distribution, and identifying sections, out of said plurality of sections in the article defect density map, with defect numbers or function thereof above the threshold; and clustering at least part of adjoining identified sections, into one or more signatures, thus detecting said one or more signatures.

    摘要翻译: 用于签名检测的方法,系统和计算机程序产品。 一种方法的一个例子包括:获得一个物品缺陷密度图,其包括对应于表示该部分的缺陷数的第一分辨率水平的多个部分,以及确定代表其缺陷数量或功能的分布; 根据所述分布确定阈值,以及在所述文章缺陷密度图中的所述多个部分中识别具有高于所述阈值的缺陷数量或功能的部分; 并将至少部分邻接的识别的部分聚类成一个或多个签名,从而检测所述一个或多个签名。