公开(公告)号：US20170213696A1

公开(公告)日：2017-07-27

申请号：US15414517

申请日：2017-01-24

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Alon Litman ,  Efim Vinnitsky ,  Ofir Arzouan ,  Igor Petrov

IPC: H01J37/244 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/047 ,  H01J2237/2445 ,  H01J2237/24475 ,  H01J2237/2448

Abstract: A method for evaluating a specimen includes positioning a detector in an inserted position in which a first distance between a tip of the detector and a plane extending along a surface of the specimen is less than a distance between the plane and a tip of charged particle beam optics. While maintaining the detector at the inserted position, the surface of the specimen is scanned by a primary beam that exits from the tip of the charged particle beam optics. The detector detects x-ray photons and/or charged particles emitted or reflected from the specimen as a result of scanning the specimen with the primary beam. After completion of the scanning, the detector is positioned at a retracted position in which a second distance between the tip of the detector and the plane exceeds a distance between the tip of the charged particle beam optics and the plane.

公开(公告)号：US11626267B2

公开(公告)日：2023-04-11

申请号：US17243478

申请日：2021-04-28

Applicant: Applied Materials Israel Ltd.

Inventor： Yehuda Zur ,  Igor Petrov

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/20 ,  H01J37/18

Abstract: A method of evaluating a region of a sample, the method comprising: positioning a sample within a vacuum chamber; generating an electron beam with a scanning electron microscope (SEM) column that includes an electron gun at one end of the column and a column cap at an opposite end of the column; focusing the electron beam on the sample and scanning the focused electron beam across the region of the sample, while the SEM column is operated in tilted mode, thereby generating secondary electrons and backscattered electrons from within the region; and during the scanning, collecting backscattered electrons with one or more detectors while applying a negative bias voltage to the column cap to alter a trajectory of the secondary electrons preventing the secondary electrons from reaching the one or more detectors.

公开(公告)号：US11264198B2

公开(公告)日：2022-03-01

申请号：US16160906

申请日：2018-10-15

Applicant: Applied Materials Israel Ltd.

Inventor： Igor Petrov ,  Zvika Rosenberg ,  Arie Bader

IPC: G02B21/02 ,  H01J37/145 ,  H01J37/28

Abstract: An objective lens arrangement that may include a magnetic lens and an electrostatic lens. The magnetic lens may include one or more coils, an upper polepiece and a lower polepiece. The electrostatic lens may include an upper electrode, an internal lower electrode and an external lower electrode. A majority of the internal lower electrode may be surrounded by a majority of the external lower electrode. The upper electrode, the internal lower electrode, and the external lower electrode are arranged in a coaxial relationship along an optical axis of the objective lens arrangement. An area of a bottom aperture of the external lower electrode may not exceed an area of a bottom aperture of the internal lower electrode.

公开(公告)号：US20220351937A1

公开(公告)日：2022-11-03

申请号：US17243478

申请日：2021-04-28

Applicant: Applied Materials Israel Ltd.

Inventor： Yehuda Zur ,  Igor Petrov

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/20 ,  H01J37/18

Abstract: A method of evaluating a region of a sample, the method comprising: positioning a sample within a vacuum chamber; generating an electron beam with a scanning electron microscope (SEM) column that includes an electron gun at one end of the column and a column cap at an opposite end of the column; focusing the electron beam on the sample and scanning the focused electron beam across the region of the sample, while the SEM column is operated in tilted mode, thereby generating secondary electrons and backscattered electrons from within the region; and during the scanning, collecting backscattered electrons with one or more detectors while applying a negative bias voltage to the column cap to alter a trajectory of the secondary electrons preventing the secondary electrons from reaching the one or more detectors.

公开(公告)号：US10074513B2

公开(公告)日：2018-09-11

申请号：US15414517

申请日：2017-01-24

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Alon Litman ,  Efim Vinnitsky ,  Ofir Arzouan ,  Igor Petrov

IPC: H01J37/244 ,  H01J37/28 ,  H01J37/20

CPC classification number: H01J37/244 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/047 ,  H01J2237/2445 ,  H01J2237/24475 ,  H01J2237/2448

Abstract: A method for evaluating a specimen includes positioning a detector in an inserted position in which a first distance between a tip of the detector and a plane extending along a surface of the specimen is less than a distance between the plane and a tip of charged particle beam optics. While maintaining the detector at the inserted position, the surface of the specimen is scanned by a primary beam that exits from the tip of the charged particle beam optics. The detector detects x-ray photons and/or charged particles emitted or reflected from the specimen as a result of scanning the specimen with the primary beam. After completion of the scanning, the detector is positioned at a retracted position in which a second distance between the tip of the detector and the plane exceeds a distance between the tip of the charged particle beam optics and the plane.