专利检索 ap:("ASAHI KASEI E-MATERIALS CORPORATION") AND inv:"Takahiro SASAKI" 第 1 页

1.

发明申请
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING HARDENED RELIEF PATTERN, SEMICONDUCTOR DEVICE AND DISPLAY DEVICE 审中-公开

公开(公告)号：US20170102613A1

公开(公告)日：2017-04-13

申请号：US15388540

申请日：2016-12-22

申请人： ASAHI KASEI E-MATERIALS CORPORATION

发明人： Satoshi SHIBUI , Tatsuya HIRATA , Takahiro SASAKI , Taisuke YAMADA

IPC分类号： G03F7/023 , G03F7/004 , G03F7/16 , G03F7/20 , H01L21/56 , G03F7/40 , C08G61/12 , G03F7/038 , G03F7/039 , H01L23/29 , G03F7/022 , G03F7/32

CPC分类号： G03F7/0233 , C08G8/22 , C08G16/0225 , C08G61/02 , C08G61/12 , C08G61/127 , C08G2261/3424 , C08G2261/76 , C08L61/12 , C08L65/00 , G03F7/0045 , G03F7/022 , G03F7/0226 , G03F7/023 , G03F7/0236 , G03F7/038 , G03F7/0382 , G03F7/0384 , G03F7/039 , G03F7/0392 , G03F7/162 , G03F7/2004 , G03F7/30 , G03F7/322 , G03F7/40 , H01L21/56 , H01L23/293

摘要： Provided is a photosensitive resin composition which comprises: (A-1) a resin containing a structure represented by general formula (1); and (B) a photo-acid generating agent. In general formula (1), X, R1 to R7, m1 to m4, n1, n2, Y and W are each as defined in the description.