公开(公告)号：USD716742S1

公开(公告)日：2014-11-04

申请号：US29484670

申请日：2014-03-12

Applicant: ASM IP Holding B.V.

Designer： Hyun Soo Jang ,  Dae Youn Kim ,  Jeong Ho Lee ,  Seung Seob Lee ,  Hak Yong Kwon

公开(公告)号：USD948463S1

公开(公告)日：2022-04-12

申请号：US29679620

申请日：2019-02-07

Applicant: ASM IP Holding B.V.

Designer： Seung Hwan Lee ,  Hak Yong Kwon ,  Jong Su Kim ,  Sung Bae Kim ,  Ju Hyuk Park

公开(公告)号：US20140202382A1

公开(公告)日：2014-07-24

申请号：US14157626

申请日：2014-01-17

Applicant: ASM IP Holding B.V.

Inventor： Young-Jae KIM ,  Ki Jong Kim ,  Dong-Rak Jung ,  Hak Yong Kwon ,  Seung Woo Choi

IPC: C23C16/458

CPC classification number: C23C16/4401 ,  C23C16/4586 ,  H01L21/68742

Abstract: A deposition apparatus is provided to eliminate unnecessary empty spaces that may form between a substrate and a substrate supporting pin, which may be formed within a substrate supporting pin hole, by covering the substrate supporting pin, inserted into the substrate supporting pin hole formed in the substrate support, by a substrate supporting pin cover loaded on the substrate support. Accordingly, the temperature under the substrate can be maintained constant, and generation of parasitic plasma or contaminating particles can be avoided.

Abstract translation: 提供一种沉积装置，用于通过覆盖插入基板支撑销中形成的基板支撑销孔中的基板和基板支撑销之间形成的不必要的空白空间，该基板可以形成在基板支撑销孔内。 基板支撑，由衬底支撑销盖装载在基板支撑上。 因此，衬底下的温度可以保持恒定，并且可以避免寄生等离子体或污染颗粒的产生。