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公开(公告)号：US11531280B2
公开(公告)日：2022-12-20
申请号：US17271684
申请日：2019-08-22
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Tamer Mohamed Tawfik Ahmed Mohamed Elazhary , Justin Lloyd Kreuzer , Franciscus Godefridus Casper Bijnen , Krishanu Shome
Abstract: An apparatus and system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to a compact integrated optical device to create self images of the alignment mark which may be manipulated (e.g., mirrored, polarized) and combined to obtain information on the position of the mark and distortions within the mark. Also disclosed is a system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to an optical fiber arrangement to obtain information such as the position of the mark and distortions within the mark.
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公开(公告)号：US11347152B2
公开(公告)日：2022-05-31
申请号：US16961081
申请日：2018-12-19
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Cornelis Melchior Brouwer , Krishanu Shome
Abstract: A system for and method of processing a wafer in which a scan signal is analyzed locally to extract information about alignment, overlay, mark quality, wafer quality, and the like.
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公开(公告)号：US11175593B2
公开(公告)日：2021-11-16
申请号：US17049707
申请日：2019-04-03
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Simon Reinald Huisman , Tamer Mohamed Tawfik Ahmed Mohamed Elazhary , Yuxiang Lin , Vu Quang Tran , Sebastianus Adrianus Goorden , Justin Lloyd Kreuzer , Christopher John Mason , Igor Matheus Petronella Aarts , Krishanu Shome , Irit Tzemah
Abstract: An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.
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公开(公告)号：US11703771B2
公开(公告)日：2023-07-18
申请号：US17773003
申请日：2020-10-12
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Ali Alsaqqa , Fadi El-Ghussein , Lambertus Gerardus Maria Kessels , Roxana Rezvani Naraghi , Krishanu Shome , Timothy Allan Brunner , Sergei Sokolov
CPC classification number: G03F9/7019 , G03F9/7076
Abstract: A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating. The plate is adjacent to a wafer alignment mark disposed on a wafer. The fixed alignment mark is disposed on the plate and is configured to act as a reference mark for an initial calibration of the calibration system. The variable diffraction grating is disposed on the plate and includes a plurality of unit cells configured to form a plurality of variable alignment marks. The variable diffraction grating is configured to calibrate a shift-between-orders of one of the variable alignment marks and the fixed alignment mark.
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公开(公告)号：US20210397103A1
公开(公告)日：2021-12-23
申请号：US17297691
申请日：2019-11-26
Applicant: ASML Holding N.V.
Inventor： Greger Göte Andersson , Krishanu Shome , Zahrasadat Dastouri , Igor Matheus Petronella Aarts
Abstract: A method of applying a measurement correction includes determining an orthogonal subspace used to characterize a first principal component of the measurement and a second principal component of the measurement, and rotating the orthogonal subspace by a first angle such that the first principle component rotates to become a first factor vector and the second principle component rotates to become a second factor vector. An asymmetry vector is generated by rotating the second factor vector by a second angle, where the asymmetry vector and the first factor vector define a non-orthogonal subspace. An asymmetry contribution is determined in the measurement based on the projection of the measurement onto the first factor vector in the non-orthogonal subspace. The method also includes subtracting the asymmetry contribution from the measurement.
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Patent Agency Ranking
公开(公告)号：US10558131B2
公开(公告)日：2020-02-11
申请号：US16389208
申请日：2019-04-19
Applicant: ASML Holding N.V.
Inventor： Krishanu Shome , Justin Lloyd Kreuzer
Abstract: A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector. Additionally, an optical rotator can be configured to receive the first polarized light and rotate the polarization of the first polarized light.
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公开(公告)号：US11016396B2
公开(公告)日：2021-05-25
申请号：US16610798
申请日：2018-04-17
Applicant: ASML Holding N.V.
Inventor： Leonardo Gabriel Montilla , Krishanu Shome
IPC: G03F7/20
Abstract: A method including illuminating a product test substrate with radiation from a component, wherein the product test substrate does not have a device pattern etched therein and yields a non-zero sensitivity when illuminated, the non-zero sensitivity representing a change in an optical response characteristic of the product test substrate with respect to a change in a characteristic of the radiation; measuring at least a part of the radiation redirected by the product test substrate to determine a parameter value; and taking an action with respect to the component based on the parameter value.
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公开(公告)号：US11841628B2
公开(公告)日：2023-12-12
申请号：US17798040
申请日：2021-01-21
Applicant: ASML Holding N.V.
Inventor： Krishanu Shome , Justin Lloyd Kreuzer
CPC classification number: G03F9/7088 , G03F7/70633 , G03F9/7046 , G03F9/7049 , G03F9/7069
Abstract: An apparatus for and method of sensing multiple alignment marks in which the optical axis of a detector is divided into multiple axes each of which can essentially simultaneously detect a separate alignment mark to generate a signal which can then be multiplexed and presented to a single detector or multiple detectors thus permitting more rapid detection of multiple marks.
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9.发明授权公开(公告)号：US11789368B2
公开(公告)日：2023-10-17
申请号：US17764139
申请日：2020-09-14
Applicant: ASML Holding N.V.
IPC: G03F7/00
CPC classification number: G03F7/70191 , G03F7/7085 , G03F7/70091
Abstract: A system (500) includes an illumination system (502), a lens element (506), and a detector (504). The illumination system generates a beam of radiation (510) having a first spatial intensity distribution (800) at a pupil plane (528) and a second spatial intensity distribution (900) at a plane of a target (514). The first spatial intensity distribution comprises an annular intensity profile (802) or an intensity profile corresponding to three or more beams. The lens element focuses the beam onto the target. The second spatial intensity distribution is a conjugate of the first intensity distribution and has an intensity profile corresponding to a central beam (902) and one or more side lobes (904) that are substantially isolated from the central beam. The central beam has a beam diameter of approximately 20 microns or less at the target. The detector receives radiation scattered by the target and generates a measurement signal based on the received radiation.
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公开(公告)号：US11493852B2
公开(公告)日：2022-11-08
申请号：US17415711
申请日：2019-12-12
Applicant: ASML Holding N.V.
Inventor： Zahrasadat Dastouri , Greger Göte Andersson , Krishanu Shome , Igor Matheus Petronella Aarts
IPC: G03F9/00
Abstract: A method of applying a measurement correction includes determining an orthogonal subspace used to characterize the measurement as a plot of data. A first axis of the orthogonal subspace corresponds to constructive interference output from an interferometer of the metrology system plus a first error variable and a second axis of the orthogonal subspace corresponds to destructive interference output from the interferometer of the metrology system plus a second error variable. The method also includes determining a slope of the plot of data and determining a fitted line to the plot of data in the orthogonal subspace based on the slope.
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