公开(公告)号：US20220276553A1

公开(公告)日：2022-09-01

申请号：US17637891

申请日：2020-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey NIKIPELOV ,  Sander BALTUSSEN ,  Vadim Yevgenyevich BANINE ,  Alexandr DOLGOV ,  DONMEZ NOYAN ,  Zomer Silvester HOUWELING ,  Arnoud Willem NOTENBOOM ,  Marcus Adrianus VAN DE KERKHOF ,  Ties Wouter VAN DER WOORD ,  Paul Alexander VERMEULEN ,  David Ferdinand VLES ,  Victoria VORONINA ,  Halil Gökay YEGEN

IPC: G03F1/62 ,  C01B32/158 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.

公开(公告)号：US20180373141A1

公开(公告)日：2018-12-27

申请号：US16060837

申请日：2016-12-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Derk Servatius Gertruda BROUNS ,  Paul JANSSEN ,  Mohammad Reza KAMALI ,  Maria PETER ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  David Ferdinand VLES ,  Willem-Pieter VOORTHUIJZEN

IPC: G03F1/64 ,  G03F1/66 ,  G03F7/20

Abstract: A membrane assembly for EUV lithography, the membrane assembly including: a planar membrane; a border configured to hold the membrane; and a frame assembly connected to the border and configured to attach to a patterning device for EUV lithography, wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.

公开(公告)号：US20220008963A1

公开(公告)日：2022-01-13

申请号：US17294013

申请日：2019-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey NIKIPELOV ,  Dmitry KURILOVICH ,  Fabio SBRIZZAI ,  Marcus Adrianus VAN DE KERKHOF ,  Ties Wouter VAN DER WOORD ,  Willem Joan VAN DER ZANDE ,  Jeroen VAN DUIVENBODE ,  David Ferdinand VLES

IPC: B08B6/00 ,  B08B7/02 ,  B08B7/04 ,  G03F1/62 ,  G03F1/82

Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.

公开(公告)号：US20200209736A1

公开(公告)日：2020-07-02

申请号：US16614815

申请日：2018-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand VLES ,  Chaitanya Krishna ANDE ,  Antonius Franciscus Johannes DE GROOT ,  Adrianus Johannes Maria GIESBERS ,  Johannes Joseph JANSSEN ,  Paul JANSSEN ,  Johan Flendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Marcel Peter MEIJER ,  Wouter Rogier MEIJERINK ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Raymond OLSMAN ,  Hrishikesh PATEL ,  Maria PETER ,  Gerrit VAN DEN BOSCH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64 ,  G03F7/20

Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US20200064183A1

公开(公告)日：2020-02-27

申请号：US16488259

申请日：2018-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Joost André KLUGKIST ,  Vadim Yevgenyevich BANINE ,  Johan Franciscus Maria BECKERS ,  Madhusudhanan JAMBUNATHAN ,  Maxim Aleksandrovich NASALEVICH ,  Andrey NIKIPELOV ,  Roland Johannes Wilhelmus STAS ,  David Ferdinand VLES ,  Wilhelmus Jacobus Johannes WELTERS ,  Sandro WRICKE

IPC: G01J1/42

Abstract: A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.

公开(公告)号：US20190113853A1

公开(公告)日：2019-04-18

申请号：US16092021

申请日：2017-03-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes ONVLEE ,  Antonius Franciscus Johannes DE GROOT ,  Wim SYMENS ,  David Ferdinand VLES

IPC: G03F7/20

Abstract: A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.

公开(公告)号：US20190056654A1

公开(公告)日：2019-02-21

申请号：US15770175

申请日：2016-10-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Mária PÉTER ,  Erik Achilles ABEGG ,  Adrianus Johannes Maria GIESBERS ,  Johan Hendrik KLOOTWIJK ,  Maxim Aleksandrovich NASALEVICH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  David Ferdinand VLES ,  Willem-Pieter VOORTHUIJZEN

IPC: G03F1/62 ,  G03F7/20 ,  G03F1/38

Abstract: Methods of manufacturing a pellicle for a lithographic apparatus including a method involving depositing at least one graphene layer on a planar surface of a substrate. The substrate has a first substrate portion and a second substrate portion. The method further includes removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.

公开(公告)号：US20240027893A1

公开(公告)日：2024-01-25

申请号：US18220799

申请日：2023-07-11

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand VLES ,  Chaitanya Krishna ANDE ,  Antonius Franciscus Johannes DE GROOT ,  Adrianus Johannes Maria GIESBERS ,  Johannes Joseph JANSSEN ,  Paul JANSSEN ,  Johan Hendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Marcel Peter MEIJER ,  Wouter Rogier MEIJERINK ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Raymond OLSMAN ,  Hrishikesh PATEL ,  Mária PÉTER ,  Gerrit VAN DEN BOSCH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64

CPC classification number: G03F1/64

Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US20210181618A1

公开(公告)日：2021-06-17

申请号：US16761683

申请日：2018-11-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter-Jan VAN ZWOL ,  Adrianus Johannes Maria GIESBERS ,  Johan Hendrik KLOOTWIJK ,  Evgenia KURGANOVA ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Mária PÉTER ,  Leonid Aizikovitsj SJMAENOK ,  Ties Wouter VAN DER WOORD ,  David Ferdinand VLES

IPC: G03F1/62

Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.

公开(公告)号：US20200319546A1

公开(公告)日：2020-10-08

申请号：US16754865

申请日：2018-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Anton Wilhelmus DUYS ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Mária PÉTER ,  Pieter-Jan VAN ZWOL ,  David Ferdinand VLES

IPC: G03F1/64

Abstract: A pellicle frame for supporting a pellicle, the frame having a first surface and a second surface opposite the first surface, and a structure provided between the first and the second surfaces, wherein the first and second surfaces and the structure at least partially define at least one volume therebetween that is devoid of the material that forms the frame.