公开(公告)号：US10712656B2

公开(公告)日：2020-07-14

申请号：US15752302

申请日：2016-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester Houweling ,  Eric Willem Felix Casimiri ,  Tamara Druzhinina ,  Paul Janssen ,  Michael Alfred Josephus Kuijken ,  Martinus Hendrikus Antonius Leenders ,  Sicco Oosterhoff ,  Mária Péter ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge ,  Johannes Petrus Martinus Bernardus Vermeulen ,  David Ferdinand Vles ,  Willem-Pieter Voorthuijzen

IPC: G03F1/62 ,  G03F7/20

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.

公开(公告)号：US09778574B2

公开(公告)日：2017-10-03

申请号：US15033580

申请日：2014-11-04

Applicant: ASML Netherlands B.V.

Inventor： Sander Catharina Reinier Derks ,  Eric Willem Felix Casimiri ,  Marcel Mathijs Theodore Dierichs ,  Sumant Sukdew Ramanujan Oemrawsingh ,  Wilhelmus Theodorus Anthonius Johannes Van Den Einden ,  Johannes Fransiscus Maria Velthuis ,  Alexander Nikolov Zdravkov ,  Wassim Zein Eddine

IPC: G03B27/52 ,  G03F7/20 ,  G02B5/00 ,  G02B5/20 ,  G02B5/22 ,  H05G2/00 ,  H01J5/18

CPC classification number: G03F7/70033 ,  G02B5/003 ,  G02B5/208 ,  G02B5/22 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70633 ,  G03F7/70875 ,  G03F7/70883 ,  G03F7/70933 ,  H01J5/18 ,  H05G2/001

Abstract: An apparatus comprising at least one sealing aperture (40) comprising a hollow part (41), having an inner surface (42), extending at an interface between different zones (50;60) of the apparatus; and a member (43) positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.