公开(公告)号：US20190146352A1

公开(公告)日：2019-05-16

申请号：US16249518

申请日：2019-01-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan Saeed ,  Petrus Martinus Gerardus Johannes Arts ,  Harold Sebastiaan Buddenberg ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Floor Lodewijk Keukens ,  Ferdy Migchelbrink ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Arnoldus Johannes Martinus Jozeph Ras ,  Gheorghe Tanasa ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Daan Daniel Johannes Antonius Van Sommeren ,  Marijn Wouters ,  Miao Yu

IPC: G03F7/20 ,  H01L21/66 ,  G01N21/95

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

公开(公告)号：US10725390B2

公开(公告)日：2020-07-28

申请号：US16249518

申请日：2019-01-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan Saeed ,  Petrus Martinus Gerardus Johannes Arts ,  Harold Sebastiaan Buddenberg ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Floor Lodewijk Keukens ,  Ferdy Migchelbrink ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Arnoldus Johannes Martinus Jozeph Ras ,  Gheorghe Tanasa ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Daan Daniel Johannes Antonius Van Sommeren ,  Marijn Wouters ,  Miao Yu

IPC: G03F7/20 ,  H01L21/66 ,  G01N21/95 ,  H01L27/146 ,  H01L27/148

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

公开(公告)号：US10317804B2

公开(公告)日：2019-06-11

申请号：US15781813

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Daan Daniel Johannes Antonius Van Sommeren ,  Coen Hubertus Matheus Baltis ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Günes Nakiboglu ,  Theodorus Wilhelmus Polet ,  Walter Theodorus Matheus Stals ,  Yuri Johannes Gabriël Van De Vijver ,  Josephus Peter Van Lieshout ,  Jorge Alberto Vieyra Salas ,  Aleksandar Nikolov Zdravkov

IPC: G03F7/20

Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

公开(公告)号：US10571810B2

公开(公告)日：2020-02-25

申请号：US16407878

申请日：2019-05-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Daan Daniel Johannes Antonius Van Sommeren ,  Coen Hubertus Matheus Baltis ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Johannes Cornelius Paulus Melman ,  Günes Nakiboglu ,  Theodorus Wilhelmus Polet ,  Walter Theodorus Matheus Stals ,  Yuri Johannes Gabriël Van De Vijver ,  Josephus Peter Van Lieshout ,  Jorge Alberto Vieyra Salas ,  Aleksandar Nikolov Zdravkov

IPC: G03F7/20

Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

公开(公告)号：US10216100B2

公开(公告)日：2019-02-26

申请号：US15738701

申请日：2016-06-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan Saeed ,  Petrus Martinus Gerardus Johannes Arts ,  Harold Sebastiaan Buddenberg ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Floor Lodewijk Keukens ,  Ferdy Migchelbrink ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Arnoldus Johannes Martinus Jozeph Ras ,  Gheorghe Tanasa ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Daan Daniel Johannes Antonius Van Sommeren ,  Marijn Wouters ,  Miao Yu

IPC: G01N21/00 ,  G03F7/20 ,  H01L21/66 ,  G01N21/95 ,  H01L27/146 ,  H01L27/148

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

公开(公告)号：US11860546B2

公开(公告)日：2024-01-02

申请号：US17952119

申请日：2022-09-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/70525

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US11454892B2

公开(公告)日：2022-09-27

申请号：US17315650

申请日：2021-05-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US11029607B2

公开(公告)日：2021-06-08

申请号：US16330544

申请日：2017-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.