中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

12 records (took 0.018 seconds)

    Radiation system and optical device
    3.
    发明授权
    Radiation system and optical device 有权

    公开(公告)号：US10359710B2

    公开(公告)日：2019-07-23

    申请号：US15766225

    申请日：2016-10-25

    Applicant: ASML Netherlands B.V.

    Inventor： Hendrikus Gijsbertus Schimmel ,  Jeroen Marcel Huijbregtse ,  Maarten Van Kampen ,  Pieter-Jan Van Zwol

    IPC: G03F7/20 ,  H05G2/00 ,  G21K1/06

    Abstract: A radiation system comprises a fuel emitter configured to provide fuel to a plasma formation region, a laser arranged to provide a laser beam at the plasma formation region incident on the fuel to generate a radiation emitting plasma, and a reflective or transmissive device (30) arranged to receive radiation emitted by the plasma and to reflect or transmit at least some of the received radiation along a desired path, wherein the reflective or transmissive device comprises a body configured to reflect and/or transmit said at least some of the radiation, and selected secondary electron emission (SEE) material (34) arranged relative to the body such as to emit secondary electrons in response to the received radiation, thereby to clean material from a surface of the device.

    Radiation source and method for lithography
    8.
    发明授权
    Radiation source and method for lithography 有权

    公开(公告)号：US10095119B2

    公开(公告)日：2018-10-09

    申请号：US14442415

    申请日：2013-10-23

    Applicant: ASML Netherlands B.V.

    Inventor： Hendrikus Gijsbertus Schimmel ,  Michel Riepen ,  Reinier Theodorus Martinus Jilisen ,  Dennis De Graaf

    IPC: G03B27/54 ,  G03F7/20 ,  H05G2/00

    Abstract: A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.

    Particle traps and barriers for particle suppression
    9.
    发明授权
    Particle traps and barriers for particle suppression 有权

    公开(公告)号：US11175596B2

    公开(公告)日：2021-11-16

    申请号：US16633419

    申请日：2018-07-18

    Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

    Inventor： Han-Kwang Nienhuys ,  Ronald Peter Albright ,  Jacob Brinkert ,  Yang-Shan Huang ,  Hendrikus Gijsbertus Schimmel ,  Antonie Hendrik Verweij

    IPC: G03F7/20 ,  B01D45/08 ,  B01D45/10

    Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.

Patent Agency Ranking