公开(公告)号：US20200057386A1

公开(公告)日：2020-02-20

申请号：US16539208

申请日：2019-08-13

Applicant: ASML Netherlands B.V.

Inventor： Seyed Iman MOSSAVAT ,  Remco DIRKS ,  Hendrik Jan Hidde SMILDE

IPC: G03F7/20 ,  G01N23/20066 ,  G01N23/201

Abstract: A method of determining an estimated intensity of radiation scattered by a target illuminated by a radiation source, has the following steps: obtaining and training (402) a library REFLIB of wavelength-dependent reflectivity as a function of the wavelength, target structural parameters and angle of incidence R(λ,θ,x,y); determining (408) a wide-band library (W-BLIB) of integrals of wavelength-dependent reflectivity R of the target in a Jones framework over a range of radiation source wavelengths λ; training (TRN) (410) the wide-band library; and determining (412), using the trained wide-band library, an estimated intensity (INT) of radiation scattered by the target illuminated by the radiation source.

公开(公告)号：US20230138469A1

公开(公告)日：2023-05-04

申请号：US17801980

申请日：2021-02-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Carlo LANCIA ,  Anjan Prasad Gantapara ,  Dirk-Jan KERNKAMP ,  Seyed Iman MOSSAVAT ,  Alexander YPMA

IPC: G05B13/04

Abstract: A method of tuning a prediction model relating to at least one particular configuration of a manufacturing device. The method includes obtaining a function including at least a first function of first prediction model parameters associated with the at least one particular configuration, and a second function of the first prediction model parameters and second prediction model parameters associated with configurations of the manufacturing device and/or related devices other than the at least one particular configuration. Values of the first prediction model parameters are obtained based on an optimization of the function, and a prediction model is tuned according to these values of the first prediction model parameters to obtain a tuned prediction mode.

公开(公告)号：US20170010541A1

公开(公告)日：2017-01-12

申请号：US15114368

申请日：2015-01-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Seyed Iman MOSSAVAT ,  Hugo Augustinus Joseph CRAMER ,  Maurits VAN DER SCHAAR

IPC: G03F7/20 ,  G01B11/27

CPC classification number: G03F7/70591 ,  G01B11/272 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683

Abstract: A method of determining edge placement error within a structure produced using a lithographic process, the method comprising the steps of: (a) receiving a substrate comprising a first structure produced using the lithographic process, the first structure comprising first and second layers, each of the layers having first areas of electrically conducting material and second areas of non-electrically conducting material; (b) receiving a target signal indicative of a first target relative position which is indicative of a target position of edges between the first areas and the second areas of the first layer relative to edges between the first areas and second areas of the second layer in the first structure during said lithographic process; (c) detecting scattered radiation while illuminating the first structure with optical radiation to obtain a first signal; and (d) ascertaining an edge placement error parameter on the basis of the first signal and the first target relative position.

Abstract translation: 一种确定在使用光刻工艺制造的结构内的边缘放置误差的方法，所述方法包括以下步骤：（a）接收包括使用所述光刻工艺制造的第一结构的衬底，所述第一结构包括第一层和第二层， 所述层具有导电材料的第一区域和非导电材料的第二区域; （b）接收指示第一目标相对位置的目标信号，该第一目标相对位置指示相对于第二层的第一区域和第二区域之间的边缘在第一区域和第一层的第二区域之间的边缘的目标位置 在所述平版印刷过程中的第一结构; （c）在用光辐射照射第一结构的同时检测散射辐射以获得第一信号; 和（d）基于第一信号和第一目标相对位置确定边缘放置误差参数。

公开(公告)号：US20230040124A1

公开(公告)日：2023-02-09

申请号：US17787253

申请日：2020-11-27

Applicant: ASML Netherlands B.V.

Inventor： Han-Kwang NIENHUYS ,  Teis Johan COENEN ,  Sander Bas ROOBOL ,  Jeroen COTTAAR ,  Seyed Iman MOSSAVAT ,  Niels GEYPEN ,  Sandy Claudia SCHOLZ ,  Christina Lynn PORTER

IPC: G03F7/20 ,  G03F9/00

Abstract: Disclosed is a method of metrology. The method comprises illuminating a radiation onto a substrate; obtaining measurement data relating to at least one measurement of each of one or more structures on the substrate; using a Fourier-related transform to transform the measurement data into a transformed measurement data; and extracting a feature of the substrate from the transformed measurement data, or eliminating an impact of a nuisance parameter.

公开(公告)号：US20160154319A1

公开(公告)日：2016-06-02

申请号：US14906898

申请日：2014-08-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Seyed Iman MOSSAVAT ,  Hugo Augustinus Joseph CRAMER ,  Willem Jan GROOTJANS ,  Adriaan Johan VAN LEEST

IPC: G03F7/20

CPC classification number: G03F7/705 ,  G01N21/956 ,  G01N21/95607 ,  G03F7/70625 ,  G03F9/7092

Abstract: Methods and inspection apparatus and computer program products for assessing a quality of reconstruction of a value of a parameter of interest of a structure, which may be applied for example in metrology of microscopic structures. It is important the reconstruction provides a value of a parameter of interest (e.g. a CD) of the structure which is accurate as the reconstructed value is used to monitor and/or control a lithographic process. This is a way of assessing a quality of reconstruction (803) of a value of a parameter of interest of a structure which does not require the use of a scanning electron microscope, by predicting (804) values of the parameter of interest of structures using reconstructed values of parameters of structures, and by comparing (805) the predicted values of the parameter of interest and the reconstructed values of the parameter of interest.

Abstract translation: 用于评估结构的感兴趣参数的值的重建质量的方法和检查装置和计算机程序产品，其可以应用于例如微观结构的计量学。 重要的是，重建提供了结构的关注参数（例如CD）的值，该值是精确的，因为重建值用于监视和/或控制光刻过程。 这是通过预测（804）结构的感兴趣的参数的值来评估不需要使用扫描电子显微镜的结构的感兴趣参数的值的重建质量（803）的方法， 通过比较（805）感兴趣参数的预测值和感兴趣参数的重建值，重建结构参数值。

公开(公告)号：US20230273529A1

公开(公告)日：2023-08-31

申请号：US18012222

申请日：2021-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Satej Subhash KHEDEKAR ,  Henricus Jozef CASTELIJNS ,  Anjan Prasad GANTAPARA ,  Stephen Henry BOND ,  Seyed Iman MOSSAVAT ,  Alexander YPMA ,  Gerald DICKER ,  Ewout Klaas STEINMEIER ,  Chaoqun GUO ,  Chenxi LIN ,  Hongwei CHEN ,  Zhaoze LI ,  Youping ZHANG ,  Yi ZOU ,  Koos VAN BERKEL ,  Joost Johan BOLDER ,  Arnaud HUBAUX ,  Andriy Vasyliovich HLOD ,  Juan Manuel GONZALEZ HUESCA ,  Frans Bernard AARDEN

IPC: G03F7/20

CPC classification number: G03F7/70525 ,  G03F7/70633 ,  G03F7/7065

Abstract: Generating a control output for a patterning process is described. A control input is received. The control input is for controlling the patterning process. The control input includes one or more parameters used in the patterning process. The control output is generated with a trained machine learning mod& based on the control input, The machine learning model is trained with training data generated from simulation of the patterning process and/or actual process data, The training data includes 1) a plurality of training control inputs corresponding to a plurality of operational conditions of the patterning process, where the plurality of operational conditions of the patterning process are associated with operational condition specific behavior of the patterning process over time, and 2) training control outputs generated using a physical model based on the training control inputs.

公开(公告)号：US20170160074A1

公开(公告)日：2017-06-08

申请号：US15365576

申请日：2016-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Seyed Iman MOSSAVAT ,  Remco DIRKS ,  Hugo Augustinus Joseph CRAMER

IPC: G01B11/02

CPC classification number: G01B11/02 ,  G03F7/705 ,  G03F7/70625

Abstract: A method including obtaining measurement results of a device manufacturing process or a product thereof, obtaining sets of one or more values of one or more parameters of a distribution by fitting the distribution against the measurement results, respectively, and obtaining, using a computer, a set of one or more values of one or more hyperparameters of a hyperdistribution by fitting the hyperdistribution against the sets of values of the parameters.

公开(公告)号：US20200319562A1

公开(公告)日：2020-10-08

申请号：US16903893

申请日：2020-06-17

Applicant: ASML Netherlands B.V.

Inventor： Hugo Augustinus Joseph CRAMER ,  Seyed Iman MOSSAVAT ,  Paul Christiaan HINNEN

IPC: G03F7/20 ,  G02B21/10 ,  G01N21/27 ,  G02B21/36

Abstract: Disclosed is method of optimizing bandwidth of measurement illumination for a measurement application, and an associated metrology apparatus. The method comprises performing a reference measurement with reference measurement illumination having a reference bandwidth and performing one or more optimization measurements, each of said one or more optimization measurements being performed with measurement illumination having a varied candidate bandwidth. The one or more optimization measurements are compared with the reference measurement; and an optimal bandwidth for the measurement application is selected based on the comparison.

公开(公告)号：US20160325504A1

公开(公告)日：2016-11-10

申请号：US15138903

申请日：2016-04-26

Applicant: ASML Netherlands B.V.

Inventor： Seyed Iman MOSSAVAT ,  Adriaan Johan VAN LEEST

IPC: B29C67/00 ,  G05B19/4099

CPC classification number: B29C67/0088 ,  B29C64/386 ,  B33Y50/02 ,  G03F7/705 ,  G03F7/70625 ,  G05B19/4099 ,  G05B2219/35134 ,  G05B2219/49007

Abstract: Disclosed are a method, computer program and associated apparatuses for metrology. The method includes acquiring inspection data comprising a plurality of inspection data elements, each inspection data element having been obtained by inspection of a corresponding target structure formed using a lithographic process; and performing an unsupervised cluster analysis on said inspection data, thereby partitioning said inspection data into a plurality of clusters in accordance with a metric. In an embodiment, a cluster representative can be identified for each cluster. The cluster representative may be reconstructed and the reconstruction used to approximate the other members of the cluster.

Abstract translation: 公开了一种计量方法，计算机程序和相关装置。 该方法包括获取包括多个检查数据元素的检查数据，每个检查数据元素是通过检查使用光刻处理形成的相应目标结构获得的; 以及对所述检查数据执行无监督的聚类分析，从而根据度量将所述检查数据划分成多个聚类。 在一个实施例中，可以为每个集群识别集群代表。 可以重建簇代表，并且重建用于近似群集的其他成员。