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公开(公告)号：US20180307146A1
公开(公告)日：2018-10-25
申请号：US15766225
申请日：2016-10-25
Applicant: ASML Netherlands B.V.
Inventor： Hendrikus Gijsbertus SCHIMMEL , Jeroen Marcel HUIJBREGTSE , Maarten VAN KAMPEN , Pieter-Jan VAN ZWOL
CPC classification number: G03F7/70883 , G03F7/70033 , G03F7/70908 , G03F7/70925 , G21K1/062 , H05G2/00 , H05G2/001 , H05G2/005 , H05G2/008
Abstract: A radiation system comprises a fuel emitter configured to provide fuel to a plasma formation region, a laser arranged to provide a laser beam at the plasma formation region incident on the fuel to generate a radiation emitting plasma, and a reflective or transmissive device (30) arranged to receive radiation emitted by the plasma and to reflect or transmit at least some of the received radiation along a desired path, wherein the reflective or transmissive device comprises a body configured to reflect and/or transmit said at least some of the radiation, and selected secondary electron emission (SEE) material (34) arranged relative to the body such as to emit secondary electrons in response to the received radiation, thereby to clean material from a surface of the device.32
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公开(公告)号：US20160012929A1
公开(公告)日：2016-01-14
申请号：US14765367
申请日：2014-01-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Alexey Sergeevich KUZNETSOV , Arjen BOOGAARD , Jeroen Marcel HUIJBREGTSE , Andrey NIKIPELOV , Maarten VAN KAMPEN
CPC classification number: G21K1/062 , B82Y10/00 , C23C28/34 , G03F1/24 , G03F7/70033 , G21K2201/067 , H05G2/008
Abstract: A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.
Abstract translation: 一种制造多层反射镜的方法，其包括第一材料和硅的交替层对的多层堆叠，所述方法包括沉积所述第一材料和硅层的交替层对，所述堆叠为 由衬底支撑并且用掺杂剂材料掺杂至少第一材料的第一层。
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