公开(公告)号：US20170176876A1

公开(公告)日：2017-06-22

申请号：US15452403

申请日：2017-03-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Timotheus Franciscus SENGERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Hans JANSEN ,  Arjen BOOGAARD

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

公开(公告)号：US20190086820A1

公开(公告)日：2019-03-21

申请号：US16197461

申请日：2018-11-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Timotheus Franciscus SENGERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Hans JANSEN ,  Arjen BOOGAARD

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

公开(公告)号：US20180046095A1

公开(公告)日：2018-02-15

申请号：US15795227

申请日：2017-10-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Timotheus Franciscus SENGERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Hans JANSEN ,  Arjen BOOGAARD

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

公开(公告)号：US20170205704A1

公开(公告)日：2017-07-20

申请号：US15320749

申请日：2015-07-02

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich NIKIPELOV ,  Vadim Yevgenyevich BANINE ,  Jozef Petrus Henricus BENSCHOP ,  Arjen BOOGAARD ,  Florian Didier Albin DHALLUIN ,  Alexey Sergeevich KUZNETSOV ,  Mária PÉTER ,  Luigi SCACCABAROZZI ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Andrei Mikhailovich YAKUNIN

IPC: G03F1/62 ,  G02B5/20 ,  G03F1/38 ,  G02B5/18 ,  G03F1/24 ,  G03F7/20

CPC classification number: G03F1/62 ,  G02B5/1838 ,  G02B5/208 ,  G03F1/24 ,  G03F1/38 ,  G03F7/70191 ,  G03F7/70316 ,  G03F7/70575 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983

Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.

公开(公告)号：US20160070178A1

公开(公告)日：2016-03-10

申请号：US14941320

申请日：2015-11-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Timotheus Franciscus SENGERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Hans JANSEN ,  Arjen BOOGAARD

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

公开(公告)号：US20160012929A1

公开(公告)日：2016-01-14

申请号：US14765367

申请日：2014-01-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Alexey Sergeevich KUZNETSOV ,  Arjen BOOGAARD ,  Jeroen Marcel HUIJBREGTSE ,  Andrey NIKIPELOV ,  Maarten VAN KAMPEN

IPC: G21K1/06 ,  G03F7/20 ,  C23C28/00 ,  H05G2/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  C23C28/34 ,  G03F1/24 ,  G03F7/70033 ,  G21K2201/067 ,  H05G2/008

Abstract: A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.

Abstract translation: 一种制造多层反射镜的方法，其包括第一材料和硅的交替层对的多层堆叠，所述方法包括沉积所述第一材料和硅层的交替层对，所述堆叠为 由衬底支撑并且用掺杂剂材料掺杂至少第一材料的第一层。