公开(公告)号：US11422477B2

公开(公告)日：2022-08-23

申请号：US17053021

申请日：2019-04-23

Applicant: ASML Netherlands B.V.

Inventor： Roy Hendrikus Emilie Maria Jacobs ,  Cornelius Adrianus Lambertus De Hoon ,  Jeroen Pieter Starreveld ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20 ,  F16F13/00 ,  F16F15/023 ,  F16F15/04

Abstract: The invention provides a vibration isolation system (IS), comprising a piston (402) to carry a payload, a connecting member (410), a spring (404) and a flexible member (408). The spring is arranged to support the piston along a direction with a positive stiffness. The flexible member is arranged to apply a force to the piston along the direction via the connecting member with a negative stiffness.

公开(公告)号：US10816910B2

公开(公告)日：2020-10-27

申请号：US16079169

申请日：2017-02-03

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Cornelius Adrianus Lambertus De Hoon ,  Fransiscus Mathijs Jacobs ,  Pavel Kagan ,  Jeroen Pieter Starreveld ,  Maurice Willem Jozef Etienne Wijckmans

IPC: G03F7/20 ,  F16F9/02 ,  F16F15/023 ,  F16F13/00 ,  F16F15/027

Abstract: The invention relates to a vibration isolator, comprising: a base; a coupling element to be coupled to a vibration sensitive object; a decoupling mass; a first vibration isolator part arranged between the base and the decoupling mass; and a second vibration isolator part arranged between the decoupling mass and the coupling element, and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.

公开(公告)号：US11828344B2

公开(公告)日：2023-11-28

申请号：US17633000

申请日：2020-07-09

Applicant: ASML Netherlands B.V.

Inventor： Jeroen Johan Maarten Van De Wijdeven ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Jeroen Pieter Starreveld ,  Stan Henricus Van Der Meulen

IPC: F16F15/02 ,  G03F7/00 ,  F16F13/00

CPC classification number: F16F15/022 ,  F16F13/005 ,  G03F7/709 ,  G03F7/70833 ,  F16F2222/08

Abstract: The invention provides a support with first and second end portions. The second end portion is on the side opposite to the first end portion in a longitudinal direction of the support. A coil spring is arranged between the first and second end portions. The coil spring comprises a first spiral member that extends between the first and second end portions in a circumferential direction of the support, and a second spiral member that extends between the first and second end portions in a circumferential direction of the support. The first and second spiral members extend in the longitudinal direction around a longitudinal axis of the support, wherein the first spiral member of the coil spring and the second spiral member of the coil spring are moveable relative to each other, and wherein the support further comprises a damper device that is attached to the first spiral member.

公开(公告)号：US11269262B2

公开(公告)日：2022-03-08

申请号：US17049719

申请日：2019-04-04

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Joep Sander De Beer ,  Cornelius Adrianus Lambertus De Hoon ,  Jeroen Pieter Starreveld ,  Martinus Van Duijnhoven ,  Maurice Willem Jozef Etiënne Wijckmans

IPC: G03F7/20

Abstract: A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.

公开(公告)号：US11169450B2

公开(公告)日：2021-11-09

申请号：US17050264

申请日：2019-03-18

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Joep Sander De Beer ,  Cornelius Adrianus Lambertus De Hoon ,  Jeroen Pieter Starreveld ,  Martinus Van Duijnhoven ,  Maurice Willem Jozef Etiënne Wijckmans

IPC: G03F7/20

Abstract: The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit. The control unit is configured to: receive the first sensor signal, receive the second sensor signal, filter the first sensor signal in a low-pass filter, filter the second sensor signal in a high-pass filter, determine, based on the filtered first sensor signal and filtered second sensor signal, a force exerted by the suspending part on the suspended part, and generate, based on said force, a control signal for the actuator.

公开(公告)号：US09977349B2

公开(公告)日：2018-05-22

申请号：US15109427

申请日：2014-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Butler ,  Cornelius Adrianus Lambertus De Hoon ,  Ingmar August Kerp ,  Pieter Johannes Gertrudis Meijers ,  Jeroen Pieter Starreveld ,  Derk Ten Hoopen ,  Martinus Van Duijnhoven ,  Edward Hage ,  Evert Hendrik Jan Draaijer ,  Wesley Ooms

IPC: G03F7/20 ,  F16F15/023

CPC classification number: G03F7/70866 ,  F16F15/0232 ,  G03F7/70733 ,  G03F7/70833 ,  G03F7/709

Abstract: A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.

公开(公告)号：US11550227B2

公开(公告)日：2023-01-10

申请号：US17423328

申请日：2019-12-13

Applicant: ASML Netherlands B.V.

Inventor： Marinus Engelbertus Cornelis Mutsaers ,  Robertus Johannes Marinus De Jongh ,  Jeroen Pieter Starreveld

IPC: G03F7/20

Abstract: Disclosed is a projection system for a lithographic apparatus, comprising: a plurality of optical elements configured to direct a beam along a path, and a control system configured to receive an input signal indicative of a deformation of a first optical element of the plurality of optical elements. The plurality of optical elements may be configured to position the beam onto an object arranged on an object support, and a pattern may be imparted on the beam by a patterning device arranged on support structure. The control system is configured to generate an output signal for controlling a position of at least a second optical element of the plurality of optical elements, based on said input signal; and/or an output signal for controlling a position of said object support, based on said input signal; and/or an output signal for controlling a position of said support structure, based on said input signal.

公开(公告)号：US20190049852A1

公开(公告)日：2019-02-14

申请号：US16079169

申请日：2017-02-03

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Cornelius Adrianus Lambertus De Hoon ,  Fransiscus Mathijs Jacobs ,  Pavel Kagan ,  Jeroen Pieter Starreveld ,  Maurice Willem Jozef Etienne Wijckmans

IPC: G03F7/20 ,  F16F13/00 ,  F16F9/02 ,  F16F15/023

Abstract: The invention relates to a vibration isolator, comprising: a base; a coupling element to be coupled to a vibration sensitive object; a decoupling mass; a first vibration isolator pan arranged between the base and the decoupling mass; and a second vibration isolator part arranged between the decoupling mass and the coupling element, and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.