公开(公告)号：US20200152527A1

公开(公告)日：2020-05-14

申请号：US16625861

申请日：2018-05-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Victoria VORONINA ,  Tamara DRUZHININA ,  Brennan PETERSON ,  Johannes Adrianus Cornelis Maria PIJNENBURG

IPC: H01L21/66 ,  H01L23/544 ,  H01L21/311 ,  G03F9/00

Abstract: A method for revealing sensor targets on a substrate covered with a layer, the method including: obtaining locations of first areas on the substrate with yielding target portions and of second areas on the substrate with non-yielding target portions; at least partially removing feature regions of the layer covering sensor targets in the second areas to reveal sensor targets in the second areas; measuring a location of the revealed sensor targets in the second areas; determining a location of sensor targets in the first areas based on the measured location of the revealed sensor targets in the second areas; and at least partially removing sensor target regions of the layer covering the sensor targets in the first areas using the determined location of the sensor targets in the first areas.

公开(公告)号：US20230384694A1

公开(公告)日：2023-11-30

申请号：US18269387

申请日：2021-12-02

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Abdullah ALIKHAN ,  Tammo UITTERDIJK ,  Johannes Bernardus Charles ENGELEN ,  Daniel KAMIENIECKI ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ,  Thomas POIESZ ,  Leon Martin LEVASIER ,  Jim Vincent OVERKAMP ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Koos VAN BERKEL ,  Gregory James DIGUIDO ,  Anthony C. SOCCI, JR. ,  Iliya SIGAL ,  Bram Antonius Gerardus LOMANS ,  Michel Ben Isel HABETS

IPC: G03F7/00 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70708 ,  G03F7/7095 ,  G03F7/70783 ,  H01L21/6838 ,  H01L21/68757

Abstract: Systems, apparatuses, and methods are provided for manufacturing a substrate table. An example method can include forming a vacuum sheet including a plurality of vacuum connections and a plurality of recesses configured to receive a plurality of burls disposed on a core body for supporting an object such as a wafer. Optionally, at least one burl can be surrounded, partially or wholly, by a trench. The example method can further include using the vacuum sheet to mount the core body to an electrostatic sheet including a plurality of apertures configured to receive the plurality of burls. Optionally, the example method can include using the vacuum sheet to mount the core body to the electrostatic sheet such that the plurality of recesses of the vacuum sheet line up with the plurality of burls of the core body and the plurality of apertures of the electrostatic sheet.

公开(公告)号：US20210263431A1

公开(公告)日：2021-08-26

申请号：US17269909

申请日：2019-07-16

Applicant: ASML Netherlands B.V.

Inventor： Johannes Petrus Martinus Bernardus VERMEULEN ,  Luc Leonardus Adrianus Martinus MEULENDIJKS ,  Antonius Franciscus Johannes DE GROOT ,  Johannes Adrianus Cornelis Maria PIJNENBURG

IPC: G03F7/20

Abstract: The invention provides a substrate support for supporting a substrate, comprising: a support body, which support body comprises a support surface for supporting the substrate, a rotary dither device, which is configured to induce a relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis which is perpendicular to the support surface.

公开(公告)号：US20230236518A1

公开(公告)日：2023-07-27

申请号：US18008283

申请日：2021-06-09

Applicant: ASML Netherlands B.V. ,  ASML HOLDING N.V.

Inventor： Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ,  Koos VAN BERKEL ,  Marcus Adrianus VAN DE KERKHOF ,  Roger Franciscus Mattheus Maria HAMELINCK ,  Shahab SHERVIN ,  Marinus Augustinus Christiaan VERSCHUREN ,  Johannes Bernardus Charles ENGELEN ,  Matthias KRUIZINGA ,  Tammo UITTERDIJK ,  Oleksiy Sergiyovich GALAKTIONOV ,  Kjeld Gertrudus Hendrikus JANSSEN ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Peter VAN DELFT

IPC: G03F7/00

CPC classification number: G03F7/70825 ,  G03F7/70708

Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.

公开(公告)号：US20200183289A1

公开(公告)日：2020-06-11

申请号：US16690198

申请日：2019-11-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas POIESZ ,  Bert Dirk SCHOLTEN ,  Dirk Willem HARBERTS ,  Lucas Henricus Johannes STEVENS ,  Laura Maria FERNANDEZ DIAZ ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Abraham Alexander SOETHOUDT ,  Wilhelmus Jacobus Johannes WELTERS ,  Jimmy Matheus Wilhelmus VAN DE WINKEL

IPC: G03F7/20

Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

公开(公告)号：US20200150549A1

公开(公告)日：2020-05-14

申请号：US16623898

申请日：2018-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Lucas Henricus Johannes STEVENS ,  Nina Vladimirovna DZIOMKINA ,  Laura Maria FERNANDEZ DIAZ ,  Johannes Adrianus Cornelis Maria PIJNENBURG

IPC: G03F7/20 ,  H01L21/687

Abstract: A system including: a substrate support configured to hold a substrate; a conductive or semi-conductive element contacting the substrate support and covering at least part of the substrate support; and a charging device configured to apply a positive potential to the conductive or semi-conductive element with respect to the part of the substrate support that is covered by the conductive or semi-conductive element.