公开(公告)号：US09939740B2

公开(公告)日：2018-04-10

申请号：US15116794

申请日：2015-01-20

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Martijn Van Baren ,  Frank Johannes Jacobus Van Boxtel ,  Koen Cuypers ,  Jeroen Gerard Gosen ,  Laurentius Johannes Adrianus Van Bokhoven

IPC: B60R1/06 ,  G03B27/52 ,  G03B27/58 ,  G03B27/62 ,  H02K41/02 ,  G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70908

Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.

公开(公告)号：US09921497B2

公开(公告)日：2018-03-20

申请号：US15306982

申请日：2015-03-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Gerardus Arnoldus Hendricus Franciscus Janssen ,  Martijn Van Baren

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/677

CPC classification number: G03F7/70875 ,  G03F7/7075 ,  G03F7/708 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70858 ,  G03F7/70866 ,  H01L21/67 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67265 ,  H01L21/67742

Abstract: A substrate handling system includes: a thermal shield for thermally insulating a space through which a substrate passes, from a thermal load originating outside the space, the thermal shield including: a first wall and a second wall with a gap therebetween, the first wall positioned between the space and the second wall; an inlet opening configured to allow a flow of gas from a gas source to enter the gap from outside the space; and an outlet opening configured to allow the flow of gas to exit the gap to outside of the space, wherein the system is configured to direct the flow of gas to enter the gap through the inlet opening, to flow through the gap and out of the gap to outside the space through the outlet opening thereby to reduce thermal fluctuations in the space due to the thermal load originating outside the space.