公开(公告)号：US20240160112A1

公开(公告)日：2024-05-16

申请号：US18527891

申请日：2023-12-04

Applicant: ASML Netherlands B.V.

Inventor： Steven George HANSEN

IPC: G03F7/00 ,  G03F1/70 ,  G06F30/30 ,  G06F30/367 ,  G06F30/398

CPC classification number: G03F7/705 ,  G03F1/70 ,  G03F7/70625 ,  G03F7/70666 ,  G06F30/30 ,  G06F30/367 ,  G06F30/398 ,  G06F2119/18

Abstract: A method of determining a relationship between a stochastic variation of a characteristic of an aerial image or a resist image and one or more design variables, the method including: measuring values of the characteristic from a plurality of aerial images and/or resist images for each of a plurality of sets of values of the design variables; determining a value of the stochastic variation, for each of the plurality of sets of values of the design variables, from a distribution of the values of the characteristic for that set of values of the design variables; and determining the relationship by fitting one or more parameters from the values of the stochastic variation and the plurality of sets of values of the design variables.

公开(公告)号：US20210382393A1

公开(公告)日：2021-12-09

申请号：US17288167

申请日：2019-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Steven George HANSEN

IPC: G03F7/20 ,  G06F30/392

Abstract: A method of determining a failure model of a resist process of a patterning process. The method includes obtaining (i) measured data of a pattern failure (e.g., failure rate) related to a feature printed on a substrate based on a range of values of dose, and (ii) image intensity values for the feature via simulating a process model using the range of the dose values; and determining, via fitting the measured data of the pattern failure to a product of the dose values and the image intensity values, a failure model to model a stochastic behavior of spatial fluctuations in the resist and optionally predict failure of the feature (e.g., hole closing).

公开(公告)号：US20250028255A1

公开(公告)日：2025-01-23

申请号：US18714728

申请日：2022-11-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Chenxi LIN ,  Steven George HANSEN ,  Xin LEI ,  Yi ZOU

IPC: G03F7/00

Abstract: A method for determining values of design variables of a lithographic process based on a predicted failure rate for printing a target pattern on a substrate using a lithographic apparatus. The method includes obtaining an image corresponding to a target pattern to be printed on a substrate using a lithographic apparatus, wherein the image is generated based on a set of values of design variables of the lithographic apparatus or a lithographic process; determining image properties, the image properties representative of a pattern printed on the substrate, the pattern corresponding to the target pattern; predicting a failure rate in printing the pattern on the substrate based on the image properties; and determining a specified value of a specified design variable based on the failure rate, the specified value to be used in the lithographic process to print the target pattern on the substrate.

公开(公告)号：US20210405538A1

公开(公告)日：2021-12-30

申请号：US17392963

申请日：2021-08-03

Applicant: ASML Netherlands B.V.

Inventor： Steven George HANSEN

IPC: G03F7/20 ,  G06F30/30 ,  G06F30/367 ,  G06F30/398 ,  G03F1/70

Abstract: A method of determining a relationship between a stochastic variation of a characteristic of an aerial image or a resist image and one or more design variables, the method including: measuring values of the characteristic from a plurality of aerial images and/or resist images for each of a plurality of sets of values of the design variables; determining a value of the stochastic variation, for each of the plurality of sets of values of the design variables, from a distribution of the values of the characteristic for that set of values of the design variables; and determining the relationship by fitting one or more parameters from the values of the stochastic variation and the plurality of sets of values of the design variables.

公开(公告)号：US20190317410A1

公开(公告)日：2019-10-17

申请号：US16462569

申请日：2017-11-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Steven George HANSEN

IPC: G03F7/20 ,  G06F7/70

Abstract: A method including: obtaining a resist process dose sensitivity value for a patterning process; applying the resist process dose sensitivity value to a stochastic model providing values of a stochastic variable as a function of resist process dose sensitivity to obtain a value of the stochastic variable; and designing or modifying a parameter of the patterning process based on the stochastic variable value.

公开(公告)号：US20170010538A1

公开(公告)日：2017-01-12

申请号：US15116486

申请日：2015-02-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Steven George HANSEN

IPC: G03F7/20 ,  G03F1/70 ,  G06F17/50

CPC classification number: G03F7/705 ,  G03F1/70 ,  G03F7/70625 ,  G03F7/70666 ,  G06F17/5036 ,  G06F17/5045 ,  G06F17/5081 ,  G06F2217/12

Abstract: A method of determining a relationship between a stochastic variation of a characteristic of an aerial image or a resist image and one or more design variables, the method including: measuring values of the characteristic from a plurality of aerial images and/or resist images for each of a plurality of sets of values of the one or more design variables; determining a value of the stochastic variation, for each of the plurality of sets of values of the one or more design variables, from a distribution of the values of the characteristic for that set of values of the one or more design variables; and determining the relationship by fitting one or more parameters from the values of the stochastic variation and the plurality of sets of values of the one or more design variables.

Abstract translation: 一种确定空间图像或抗蚀剂图像的特性的随机变化与一个或多个设计变量之间的关系的方法，所述方法包括：测量来自多个空间图像的特征值和/或抗蚀剂图像 的一组或多个设计变量的多组值; 根据所述一个或多个设计变量的值集合的特征值的分布，确定所述一组或多个设计变量的所述多个值集合中的每一个的随机变化的值; 以及通过从所述一个或多个设计变量的随机变化值和所述多组值拟合一个或多个参数来确定所述关系。

公开(公告)号：US20160110488A1

公开(公告)日：2016-04-21

申请号：US14968561

申请日：2015-12-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Steven George HANSEN

IPC: G06F17/50

CPC classification number: G06F17/5068 ,  G03F1/70 ,  G03F7/70125 ,  G03F7/70433 ,  G03F7/70441 ,  G06F17/50

Abstract: Disclosed herein is a computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process.

Abstract translation: 本文公开了一种用于改进光刻工艺的计算机实现的方法，用于使用光刻投影设备将设计布局的一部分成像到基板上成像，该方法包括定义多变量成本函数，多变量成本函数是函数 的光刻过程的随机效应。