公开(公告)号：US09958788B2

公开(公告)日：2018-05-01

申请号：US15405009

申请日：2017-01-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Vitaliy Prosyentsov ,  Willem Jurrianus Venema ,  Kars Zeger Troost ,  Adrianus Martinus Van Der Wielen

IPC: G03B27/42 ,  G03F7/20 ,  G03F1/44

CPC classification number: G03F7/705 ,  G03F1/44 ,  G03F7/70133 ,  G03F7/70783 ,  G03F7/70875

Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a fine (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.

公开(公告)号：US09658541B2

公开(公告)日：2017-05-23

申请号：US14322625

申请日：2014-07-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus Van De Kerkhof ,  Willem Jurrianus Venema ,  Bearrach Moest ,  Vasco Miguel Matias Serrao ,  Cedran Bomhof

IPC: G03B27/58 ,  G03F7/20 ,  G03F9/00 ,  B21B38/00

CPC classification number: G03F7/70775 ,  B21B38/00 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7026 ,  G03F9/7088 ,  G03F9/7092 ,  H01J2235/062

Abstract: A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems.

公开(公告)号：US09568833B2

公开(公告)日：2017-02-14

申请号：US14512120

申请日：2014-10-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Vitaliy Prosyentsov ,  Willem Jurrianus Venema ,  Kars Zeger Troost ,  Adrianus Martinus Van Der Wielen

IPC: G03B27/42 ,  G03F7/20 ,  G03F1/44

CPC classification number: G03F7/705 ,  G03F1/44 ,  G03F7/70133 ,  G03F7/70783 ,  G03F7/70875

Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.

Abstract translation: 光刻掩模版被照射以将图案转印到基板上，引起由于加热引起的变形。 使用标线的周边部分中的参考标记计算变形，并测量其相对位置随时间的变化。 定义了可以解决方程组的系统以计算每个单元的扩张的多个单元。 在一个实施例中，每个方程将标记对对于沿着连接每对的线（s，s1，s2）的细胞的扩张的位置。 可以通过组合至少一个测量的外围标记和位置之间的单元格的计算的扩张来计算位置的局部位置偏差。 校正可以根据计算结果进行应用。 可以将能量施加到图案形成装置（例如通过热输入或机械致动器）以修改局部位置偏差的分布。

公开(公告)号：US20150029481A1

公开(公告)日：2015-01-29

申请号：US14512120

申请日：2014-10-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Vitaliy PROSYENTSOV ,  Willem Jurrianus Venema ,  Kars Zeger Troost ,  Adrianus Martinus Van Der Wielen

IPC: G03F7/20

CPC classification number: G03F7/705 ,  G03F1/44 ,  G03F7/70133 ,  G03F7/70783 ,  G03F7/70875

Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.

Abstract translation: 光刻掩模版被照射以将图案转印到基板上，引起由于加热引起的变形。 使用标线的周边部分中的参考标记计算变形，并测量其相对位置随时间的变化。 定义了可以解决方程组的系统以计算每个单元的扩张的多个单元。 在一个实施例中，每个方程将标记对对于沿着连接每对的线（s，s1，s2）的细胞的扩张的位置。 可以通过组合至少一个测量的外围标记和位置之间的单元格的计算的扩张来计算位置的局部位置偏差。 校正可以根据计算结果进行应用。 可以将能量施加到图案形成装置（例如通过热输入或机械致动器）以修改局部位置偏差的分布。