公开(公告)号：US10394139B2

公开(公告)日：2019-08-27

申请号：US16090713

申请日：2017-03-08

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Güneş Nak{dot over (i)}bo{hacek over (g)}lu ,  Lowell Lane Baker ,  Ruud Hendrikus Martinus Johannes Bloks ,  Hakki Ergün Cekli ,  Geoffrey Alan Schultz ,  Laurentius Johannes Adrianus Van Bokhoven ,  Frank Johannes Jacobus Van Boxtel ,  Jean-Philippe Xavier Van Damme ,  Christopher Charles Ward

IPC: G03F7/20

Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.

公开(公告)号：US10423081B2

公开(公告)日：2019-09-24

申请号：US15540649

申请日：2015-12-02

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Thomas Venturino ,  Geoffrey Alan Schultz ,  Daniel Nicholas Galburt ,  Daniel Nathan Burbank ,  Santiago E. Delpuerto ,  Herman Vogel ,  Johannes Onvlee ,  Laurentius Johannes Adrianus Van Bokhoven ,  Christopher Charles Ward

IPC: G03F7/20

Abstract: An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.

公开(公告)号：US20150192856A1

公开(公告)日：2015-07-09

申请号：US14662138

申请日：2015-03-18

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Johannes Onvlee ,  Christopher J. Mason ,  Earl William Ebert, JR. ,  Peter A. Delmastro ,  Christopher Charles Ward ,  Thomas Venturino ,  Geoffrey Alan Schultz ,  Daniel Nathan Burbank

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/708

Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a cooling system and a heating system. The cooling system is configured to direct a gas flow along a first direction across a surface of the patterning device to remove heat from the patterning device prior to exposing the patterning device or during exposure of the patterning device. The heating system is configured to selectively heat areas on the surface of the patterning device prior to exposing the patterning device or during exposure of the patterning device. The selective heating and the heat removal achieve a substantially uniform temperature distribution in the patterning.

Abstract translation: 讨论了用于控制光刻设备中的图案形成装置的温度的系统。 该系统包括冷却系统和加热系统。 冷却系统被配置为沿着图案形成装置的表面沿着第一方向引导气流，以在暴露图案形成装置之前或在图案形成装置的曝光期间从图案形成装置移除热量。 加热系统被配置为在曝光图案形成装置之前或在图案形成装置的曝光期间选择性地加热图案形成装置的表面上的区域。 选择性加热和除热在图案化中实现基本均匀的温度分布。

公开(公告)号：US09222847B2

公开(公告)日：2015-12-29

申请号：US14102667

申请日：2013-12-11

Applicant: ASML Holding N.V.

Inventor： Geoffrey Alan Schultz

IPC: G03B27/52 ,  G01L13/02 ,  G01B13/12 ,  G03F9/00

CPC classification number: G01L13/02 ,  G01B13/12 ,  G03F9/7026 ,  G03F9/7034 ,  G03F9/7053 ,  G03F9/7096

Abstract: In one embodiment of the present invention, there is provided a gas gauge for use in a vacuum environment having a measurement gas flow channel. The gas gauge may comprise a measurement nozzle in the measurement gas flow channel. The measurement nozzle may be configured to operate at a sonically choked flow condition of a volumetric flow being sourced from a gas supply coupled to the measurement gas flow channel. The gas gauge may further comprise a pressure sensor operatively coupled to the measurement gas flow channel downstream from the sonically choked flow condition of the volumetric flow to measure a differential pressure of the volumetric flow for providing an indication of a gap between a distal end of the measurement nozzle and a target surface proximal thereto.

Abstract translation: 在本发明的一个实施例中，提供一种用于具有测量气体流动通道的真空环境中的气量计。 气量计可以包括测量气体流动通道中的测量喷嘴。 测量喷嘴可以被配置为在来自耦合到测量气体流动通道的气体源的体积流的声波扼流流动条件下操作。 气量计还可以包括压力传感器，该压力传感器可操作地耦合到测量气体流动通道的下游，该体积流量的声波扼流流动条件以测量体积流量的压力差，以便提供体积流动的远端之间的间隙的指示 测量喷嘴和靠近其的目标表面。