公开(公告)号：US10281830B2

公开(公告)日：2019-05-07

申请号：US15742179

申请日：2016-06-17

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Laurentius Johannes Adrianus Van Bokhoven ,  Christopher Charles Ward ,  Marc Léon Van Der Gaag ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/20

Abstract: A lithographic apparatus (100) includes a patterning device support structure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.

公开(公告)号：US10031428B2

公开(公告)日：2018-07-24

申请号：US14762450

申请日：2014-02-20

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Koen Cuypers ,  Marcelo Henrique De Andrade Oliveira ,  Marinus Jan Remie ,  Chattarbir Singh ,  Laurentius Johannes Adrianus Van Bokhoven ,  Henricus Anita Jozef Wilhemus Van De Ven ,  José Nilton Fonseca Junior ,  Frank Johannes Jacobus Van Boxtel ,  Daniel Nathan Burbank ,  Erik Roelof Loopstra ,  Johannes Onvlee ,  Mark Josef Schuster ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Christopher Charles Ward ,  Jan Steven Christiaan Westerlaken

IPC: G03B27/52 ,  G03F7/20

Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.

公开(公告)号：US09910368B2

公开(公告)日：2018-03-06

申请号：US14437294

申请日：2013-09-20

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Christiaan Louis Valentin ,  Erik Roelof Loopstra ,  Christopher Charles Ward ,  Daniel Nathan Burbank ,  Mark Josef Schuster ,  Peter James Graffeo

IPC: G03F7/20

CPC classification number: G03F7/70783 ,  G03F7/70266 ,  G03F7/70433 ,  G03F7/707 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70825

Abstract: A system (300) for supporting an exchangeable object (302) can include a movable structure (304) and an object holder (306) configured to be movable relative to the movable structure. The object holder can be configured to hold the exchangeable object. The system can also include a first actuator assembly (308) and second actuator assembly (316). The first actuator assembly can be configured to apply a force to the object holder to translate the exchangeable object generally along a plane. The second actuator assembly can be configured to apply a bending moment to the object holder. The exchangeable object can be a patterning device of a lithographic apparatus.

公开(公告)号：US09632433B2

公开(公告)日：2017-04-25

申请号：US14439359

申请日：2013-10-21

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William Ebert, Jr. ,  Johannes Onvlee ,  Samir A. Nayfeh ,  Mark Josef Schuster ,  Peter A. Delmastro ,  Christopher Charles Ward ,  Frank Johannes Jacobus Van Boxtel ,  Abdullah Alikhan ,  Daniel Nathan Burbank ,  Daniel Nicholas Galburt ,  Justin Matthew Verdirame

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.

公开(公告)号：US20150192856A1

公开(公告)日：2015-07-09

申请号：US14662138

申请日：2015-03-18

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Johannes Onvlee ,  Christopher J. Mason ,  Earl William Ebert, JR. ,  Peter A. Delmastro ,  Christopher Charles Ward ,  Thomas Venturino ,  Geoffrey Alan Schultz ,  Daniel Nathan Burbank

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/708

Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a cooling system and a heating system. The cooling system is configured to direct a gas flow along a first direction across a surface of the patterning device to remove heat from the patterning device prior to exposing the patterning device or during exposure of the patterning device. The heating system is configured to selectively heat areas on the surface of the patterning device prior to exposing the patterning device or during exposure of the patterning device. The selective heating and the heat removal achieve a substantially uniform temperature distribution in the patterning.

Abstract translation: 讨论了用于控制光刻设备中的图案形成装置的温度的系统。 该系统包括冷却系统和加热系统。 冷却系统被配置为沿着图案形成装置的表面沿着第一方向引导气流，以在暴露图案形成装置之前或在图案形成装置的曝光期间从图案形成装置移除热量。 加热系统被配置为在曝光图案形成装置之前或在图案形成装置的曝光期间选择性地加热图案形成装置的表面上的区域。 选择性加热和除热在图案化中实现基本均匀的温度分布。

公开(公告)号：US10394139B2

公开(公告)日：2019-08-27

申请号：US16090713

申请日：2017-03-08

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Güneş Nak{dot over (i)}bo{hacek over (g)}lu ,  Lowell Lane Baker ,  Ruud Hendrikus Martinus Johannes Bloks ,  Hakki Ergün Cekli ,  Geoffrey Alan Schultz ,  Laurentius Johannes Adrianus Van Bokhoven ,  Frank Johannes Jacobus Van Boxtel ,  Jean-Philippe Xavier Van Damme ,  Christopher Charles Ward

IPC: G03F7/20

Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.

公开(公告)号：US09740112B2

公开(公告)日：2017-08-22

申请号：US14436070

申请日：2013-09-23

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Arindam Sinharoy ,  Stephen S. Roux ,  Jean-Philippe Xavier Van Damme ,  Daniel Nathan Burbank ,  Mark Josef Schuster ,  Duncan Harris ,  Christopher Charles Ward

IPC: G03F7/20

CPC classification number: G03F7/70733 ,  G03F7/707 ,  G03F7/70783

Abstract: A patterning device support (200), for example, a patterning device (202) or substrate support, can be configured to release internal stresses of a patterning device loaded thereon. The patterning device support can include a positive pressuring generating interface (206a, 206b) or an acoustic vibration generating interface (206a, 206b), or can be configured to oscillate while at least a portion of patterning device is decoupled from the patterning device support. A method of transferring a patterning device between a patterning device handling apparatus and a patterning device support configured to move the patterning device can include positioning the patterning device onto a surface of the patterning device support, and performing a process that releases internal stress of the patterning device.

公开(公告)号：US20150277240A1

公开(公告)日：2015-10-01

申请号：US14436070

申请日：2013-09-23

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Arindam Sinharoy ,  Stephen S. Roux ,  Jean-Philippe Xavier Van Damme ,  Daniel Nathan Burbank ,  Mark Josef Schuster ,  Duncan Harris ,  Christopher Charles Ward

IPC: G03F7/20

CPC classification number: G03F7/70733 ,  G03F7/707 ,  G03F7/70783

Abstract: A patterning device support (200), for example, a patterning device (202) or substrate support, can be configured to release internal stresses of a patterning device loaded thereon. The patterning device support can include a positive pressuring generating interface (206a, 206b) or an acoustic vibration generating interface (206a, 206b), or can be configured to oscillate while at least a portion of patterning device is decoupled from the patterning device support. A method of transferring a patterning device between a patterning device handling apparatus and a patterning device support configured to move the patterning device can include positioning the patterning device onto a surface of the patterning device support, and performing a process that releases internal stress of the patterning device.

Abstract translation: 图案形成装置支撑件（200），例如，图案形成装置（202）或基板支撑件可以构造成释放装载在其上的图案形成装置的内部应力。 图案形成装置支撑件可以包括正压力生成界面（206a，206b）或声振动产生界面（206a，206b），或者可以被配置为在图案形成装置的至少一部分与图案形成装置支撑件分离的同时进行摆动。 在图案形成装置处理装置和被构造成移动图案形成装置的图案形成装置支撑件之间传送图案形成装置的方法可以包括将图案形成装置定位在图案形成装置支撑件的表面上，并且执行释放图案形成装置的内部应力 设备。

公开(公告)号：US20150168854A1

公开(公告)日：2015-06-18

申请号：US14411870

申请日：2013-06-05

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Ruud Hendrikus Martinus Johannes Bloks ,  Peter A. Delmastro ,  Thibault Simon Mathieu Laurent ,  Martinus Hendrikus Antonius Leenders ,  Mark Josef Schuster ,  Christopher Charles Ward ,  Frank Johannes Jacobus Van Boxtel ,  Justin Matthew Verdirame ,  Samir A. Nayfeh

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70916 ,  G03F7/70933

Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

Abstract translation: 光刻设备具有构造成支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对辐射束进行图案化，并具有辐射束通过的平面主表面; 出口开口，其构造成将气体流引导到图案形成装置上; 以及入口开口，被配置为提取已经离开出口的气体，其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。

公开(公告)号：US10423081B2

公开(公告)日：2019-09-24

申请号：US15540649

申请日：2015-12-02

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Thomas Venturino ,  Geoffrey Alan Schultz ,  Daniel Nicholas Galburt ,  Daniel Nathan Burbank ,  Santiago E. Delpuerto ,  Herman Vogel ,  Johannes Onvlee ,  Laurentius Johannes Adrianus Van Bokhoven ,  Christopher Charles Ward

IPC: G03F7/20

Abstract: An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.