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公开(公告)号：US10423081B2
公开(公告)日：2019-09-24
申请号：US15540649
申请日：2015-12-02
发明人： Thomas Venturino , Geoffrey Alan Schultz , Daniel Nicholas Galburt , Daniel Nathan Burbank , Santiago E. Delpuerto , Herman Vogel , Johannes Onvlee , Laurentius Johannes Adrianus Van Bokhoven , Christopher Charles Ward
IPC分类号： G03F7/20
摘要： An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.
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公开(公告)号：US10031428B2
公开(公告)日：2018-07-24
申请号：US14762450
申请日：2014-02-20
发明人： Koen Cuypers , Marcelo Henrique De Andrade Oliveira , Marinus Jan Remie , Chattarbir Singh , Laurentius Johannes Adrianus Van Bokhoven , Henricus Anita Jozef Wilhemus Van De Ven , José Nilton Fonseca Junior , Frank Johannes Jacobus Van Boxtel , Daniel Nathan Burbank , Erik Roelof Loopstra , Johannes Onvlee , Mark Josef Schuster , Robertus Nicodemus Jacobus Van Ballegoij , Christopher Charles Ward , Jan Steven Christiaan Westerlaken
摘要： A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.
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公开(公告)号：US10281830B2
公开(公告)日：2019-05-07
申请号：US15742179
申请日：2016-06-17
发明人： Laurentius Johannes Adrianus Van Bokhoven , Christopher Charles Ward , Marc Léon Van Der Gaag , Johan Gertrudis Cornelis Kunnen
IPC分类号： G03F7/20
摘要： A lithographic apparatus (100) includes a patterning device support structure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.
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公开(公告)号：US10394139B2
公开(公告)日：2019-08-27
申请号：US16090713
申请日：2017-03-08
发明人： Güneş Nak{dot over (i)}bo{hacek over (g)}lu , Lowell Lane Baker , Ruud Hendrikus Martinus Johannes Bloks , Hakki Ergün Cekli , Geoffrey Alan Schultz , Laurentius Johannes Adrianus Van Bokhoven , Frank Johannes Jacobus Van Boxtel , Jean-Philippe Xavier Van Damme , Christopher Charles Ward
IPC分类号： G03F7/20
摘要： A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.
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公开(公告)号：US10990025B2
公开(公告)日：2021-04-27
申请号：US16289875
申请日：2019-03-01
发明人： Laurentius Johannes Adrianus Van Bokhoven , Ruud Hendrikus Martinus Johannes Bloks , Günes Nakiboglu , Marinus Jan Remie , Johan Gertrudis Cornelis Kunnen
IPC分类号： G03F7/20
摘要： An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.
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公开(公告)号：US11644755B2
公开(公告)日：2023-05-09
申请号：US17279648
申请日：2019-09-11
发明人： Bearrach Moest , Rowin Meijerink , Thijs Schenkelaars , Norbertus Josephus Martinus Van Den Nieuwelaar , Laurentius Johannes Adrianus Van Bokhoven
IPC分类号： G03F7/20
CPC分类号： G03F7/705 , G03F7/706 , G03F7/70358 , G03F7/70983
摘要： A method of predicting deflection of a pellicle which will occur during movement of the pellicle in a lithographic apparatus, the method including receiving parameters regarding properties of the pellicle and receiving parameters regarding the expected movement of the pellicle. The parameters are applied to a model which predicts deflection of the pellicle as a function of those parameters. The model includes a plurality of sub-models which relate to different components of deflection of the pellicle. An output of the model may be used to predict.
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公开(公告)号：US10908517B2
公开(公告)日：2021-02-02
申请号：US16615810
申请日：2018-04-18
发明人： Jean-Philippe Xavier Van Damme , Laurentius Johannes Adrianus Van Bokhoven , Petrus Franciscus Van Gils , Gerben Pieterse
摘要： The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.
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公开(公告)号：US10705438B2
公开(公告)日：2020-07-07
申请号：US16716568
申请日：2019-12-17
发明人： Andre Bernardus Jeunink , Laurentius Johannes Adrianus Van Bokhoven , Stan Henricus Van Der Meulen , Yang-Shan Huang , Federico La Torre , Bearrach Moest , Stefan Carolus Jacobus Antonius Keij , Enno Van Den Brink , Christine Henriette Schouten , Hoite Pieter Theodoor Tolsma
摘要： A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
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公开(公告)号：US11048178B2
公开(公告)日：2021-06-29
申请号：US16772444
申请日：2018-11-22
发明人： Federico La Torre , Laurentius Johannes Adrianus Van Bokhoven , José Nilton Fonseca, Jr. , Gerben Pieterse , Erik Henricus Egidius Catharina Eummelen , Frank Johannes Jacobus Van Boxtel
IPC分类号： G03F7/20
摘要： A plate to be positioned between a movable stage and a projection system of a lithographic apparatus, the plate having a surface to face the movable stage; an opening through the plate for passage of patterned radiation beam; one or more gas outlets in a side of the opening and in the surface of the plate, wherein the one or more gas outlets are configured to supply gas to a region between the movable stage and the projection system, wherein all of the one or more gas outlets in the surface of the plate are positioned such that, for each of such one or more gas outlets, a line that is both orthogonal to the surface and intersects the gas outlet does not intersect the patterning device at any point during the entire range of movement of the patterning device.
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10.发明授权公开(公告)号：US10095129B2
公开(公告)日：2018-10-09
申请号：US15321115
申请日：2015-06-01
发明人： Giovanni Luca Gattobigio , Erik Henricus Egidius Catharina Eummelen , Ruud Olieslagers , Gerben Pieterse , Cornelius Maria Rops , Laurentius Johannes Adrianus Van Bokhoven
IPC分类号： G03F7/20
摘要： A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a substrate and a fluid confinement structure configured to confine immersion fluid in a localized region between a final element of the projection system and a surface of the substrate. The lithographic apparatus is configured to have a space bounded on one side by a surface of the projection system and/or a component of the lithographic apparatus at least partially surrounding the final element of the projection system, and on the other side by a surface of the fluid confinement structure. The apparatus is configured to increase the humidity of the gas within the space.
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