公开(公告)号：US20220342199A1

公开(公告)日：2022-10-27

申请号：US17634023

申请日：2020-08-05

申请人： ASML NETHERLANDS B.V. ,  IMEC v.z.w.

发明人： Alexandre HALBACH ,  Nitesh PANDEY ,  Sebastianus Adrianus GOORDEN ,  Veronique ROCHUS ,  Luc Roger Simonne HASPESLAGH ,  Guilherme BRONDANI TORRI

IPC分类号： G02B26/08 ,  G03F7/20

摘要： A micromirror array includes a substrate, a plurality of mirrors for reflecting incident radiation, and for each mirror of the plurality of mirrors, a respective post connecting the substrate to the respective mirror. The micromirror array further includes, for each mirror of the plurality of mirrors, one or more electrostatic actuators connected to the substrate for applying force to the respective post to displace the respective post relative to the substrate, thereby displacing the respective mirror. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.

公开(公告)号：US20240012332A1

公开(公告)日：2024-01-11

申请号：US18038601

申请日：2021-11-12

申请人： ASML Netherlands B.V.

发明人： Luc Roger Simonne HASPESLAGH ,  Nitesh PANDEY ,  Ties Wouter VAN DER WOORD ,  Halil Gökay YEGEN ,  Guilherme BRONDANI TORRI ,  Sebastianus Adrianus GOORDEN ,  Alexander Ludwig KLEIN ,  Jim Vincent OVERKAMP ,  Edgar Alberto OSORIO OLIVEROS

IPC分类号： G03F7/00 ,  G02B26/08 ,  H02N2/10 ,  H02N2/00 ,  H10N30/50 ,  H10N30/05

CPC分类号： G03F7/70116 ,  G02B26/0858 ,  H02N2/108 ,  H02N2/009 ,  H10N30/50 ,  H10N30/05 ,  G03F7/70625 ,  G03F7/7015 ,  G03F7/706849

摘要： A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.

公开(公告)号：US20240004184A1

公开(公告)日：2024-01-04

申请号：US18037957

申请日：2021-11-08

申请人： ASML Netherlands B.V.

发明人： Luc Roger Simonne HASPESLAGH ,  Nitesh PANDEY ,  Ties Wouter VAN DER WOORD ,  Halil Gökay YEGEN ,  Sebastianus Adrianus GOORDEN ,  Alexis HUMBLET ,  Alexander Ludwig KLEIN ,  Jim Vincent OVERKAMP ,  Guilherme BRONDANI TORRI ,  Edgar Alberto OSORIO OLIVEROS

IPC分类号： G02B26/08 ,  G03F7/00 ,  B81B7/02

CPC分类号： G02B26/0858 ,  G03F7/70291 ,  G03F7/70116 ,  B81B7/02 ,  B81B2207/11 ,  B81B2207/015

摘要： A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.