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1.发明申请Inspection Apparatus, Inspection Method, Lithographic Apparatus, Patterning Device and Manufacturing Method 审中-公开检验装置，检验方法，平版印刷装置，图案装置及制造方法公开(公告)号：US20160363871A1
公开(公告)日：2016-12-15
申请号：US15179509
申请日：2016-06-10
发明人： Anton Bernhard VAN OOSTEN , Paul Christiaan HINNEN , Robertus Cornelis Martinus DE KRUIF , Robert John SOCHA
IPC分类号： G03F7/20
CPC分类号： G03F7/70558 , G03F1/44 , G03F7/70516 , G03F7/70525 , G03F7/70625 , G03F7/70641
摘要： Disclosed is a method of monitoring a focus parameter during a lithographic process. The method comprises acquiring first and second measurements of, respectively first and second targets, wherein the first and second targets have been exposed with a relative best focus offset. The method then comprises determining the focus parameter from first and second measurements. Also disclosed are corresponding measurement and lithographic apparatuses, a computer program and a method of manufacturing devices.
摘要翻译： 公开了一种在光刻工艺期间监测焦点参数的方法。 该方法包括获取第一和第二目标的第一和第二测量，其中第一和第二目标已经以相对最佳的聚焦偏移曝光。 该方法然后包括从第一和第二测量确定焦点参数。 还公开了相应的测量和光刻设备，计算机程序和制造设备的方法。
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2.发明申请公开(公告)号：US20180046091A1
公开(公告)日：2018-02-15
申请号：US15791703
申请日：2017-10-24
发明人： Anton Bernhard VAN OOSTEN , Paul Christiaan HINNEN , Robertus Cornelis Martinus DE KRUIF , Robert John SOCHA
CPC分类号： G03F7/70558 , G03F1/44 , G03F7/70516 , G03F7/70525 , G03F7/70625 , G03F7/70641
摘要： Disclosed is a patterning device configured to pattern a beam of radiation according to a desired pattern during a lithographic process. The patterning device comprises first features configured to form a first target on a substrate during the lithographic process and second features configured to form a second target on the substrate during the lithographic process. The second features are taller, in a direction transverse to the plane of the first and second targets, than the first features, such that the first and second targets have a relative best focus offset.
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公开(公告)号：US20180314150A1
公开(公告)日：2018-11-01
申请号：US15545390
申请日：2016-02-01
发明人： Derk Servatius Gertruda BROUNS , Dennis DE GRAAF , Robertus Cornelis Martinus DE KRUIF , Paul JANSSEN , Matthias KRUIZINGA , Arnoud Willem NOTENBOOM , Daniel Andrew SMITH , Beatrijs Louise Marie-Joseph Katrien VERBRUGGE , James Norman WILEY
摘要： A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：US20210341831A1
公开(公告)日：2021-11-04
申请号：US17375283
申请日：2021-07-14
发明人： Derk Servatius Gertruda BROUNS , Dennis DE GRAAF , Robertus Cornelis Martinus DE KRUIF , Paul JANSSEN , Matthias KRUIZINGA , Arnoud Willem NOTENBOOM , Daniel Andrew SMITH , Beatrijs Louise Marie-Josep VERBRUGGE , James Norman WILEY
摘要： A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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