专利检索 ap:("ASML Netherlands B.V.") AND inv:"S.M. Masudur Rahman AL ARIF" 第 1 页

1.

发明公开
A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAST ONE PATTERNING DEVICE, LITHOGRAPHIC METHOD AND METROLOGY METHOD 审中-公开

公开(公告)号：US20230176491A1

公开(公告)日：2023-06-08

申请号：US17923913

申请日：2021-04-21

申请人： ASML Netherlands B.V.

发明人： Olger Victor ZWIER , Maurits VAN DER SCHAAR , Hilko Dirk BOS , Hans VAN DER LAAN , S.M. Masudur Rahman AL ARIF , Henricus Wilhelmus Maria Van Buel , Armand Eugene Albert KOOLEN , Victor CALADO , Kaustuve BHATTACHARYYA , Jin LIAN , Sebastianus Adrianus GOORDEN , Hui Quan LIM

IPC分类号： G03F7/20

CPC分类号： G03F7/70641 , G03F7/70558 , G03F7/70633 , G03F7/70625

摘要： Disclosed is a substrate and associated patterning device. The substrate comprises at least one target arrangement suitable for metrology of a lithographic process, the target arrangement comprising at least one pair of similar target regions which are arranged such that the target arrangement is, or at least the target regions for measurement in a single direction together are, centrosymmetric. A metrology method is also disclosed for measuring the substrate. A metrology method is also disclosed comprising which comprises measuring such a target arrangement and determining a value for a parameter of interest from the scattered radiation, while correcting for distortion of the metrology apparatus used.