公开(公告)号：US20160238953A1

公开(公告)日：2016-08-18

申请号：US15027986

申请日：2014-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Cornelius Adrianus Lambertus DE HOON ,  Marc Wilhelmus Maria VAN DER WIJST ,  Thijs VERHEES ,  Sander KERSSEMAKERS

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70766 ,  G03F7/70833 ,  G03F7/709

Abstract: A lithographic apparatus includes a base frame, an illumination system configured to condition a radiation beam and supported by the base frame, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a positioning device configured to position the substrate table, the positioning device being supported by the base frame, a sensor configured to sense a vibration caused by a torque exerted on the base frame, and an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.

Abstract translation: 光刻设备包括基架，照明系统，其配置为调节辐射束并由基架支撑，支撑结构以支撑图案形成装置，所述图案形成装置能够将辐射束赋予其横截面图案， 形成图案化的辐射束，构造成保持衬底的衬底台，配置成将图案化的辐射束投影到衬底的目标部分上的投影系统，配置成定位衬底台的定位装置，定位装置被支撑 通过基架，传感器被配置为感测由施加在基架上的扭矩引起的振动;以及致动器，其被配置为响应于感测到的振动而对照明系统或基架施加力，以致于 至少部分抑制振动。

公开(公告)号：US20170090296A1

公开(公告)日：2017-03-30

申请号：US15311544

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Mark Constant Johannes BAGGEN ,  Gerard Johannes BOOGAARD ,  Nicolaas Rudolf KEMPER ,  Sander KERSSEMAKERS ,  Robertus Mathijs Gerardus RIJS ,  Frank Johannes Jacobus VAN BOXTEL ,  Erwin Antonius Henricus Franciscus VAN DEN BOOGAERT ,  Marc Wilhelmus Maria VAN DER WIJST ,  Martinus VAN DUIJNHOVEN ,  Jessica Henrica Anna VERDONSCHOT ,  Hendrikus Herman Marie COX

IPC: G03F7/20 ,  G10K11/168

CPC classification number: G03F7/709 ,  G10K11/16 ,  G10K11/168 ,  G10K11/172

Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of Cthrough-holes (102), between the chamber and the compartment.

公开(公告)号：US20230023631A1

公开(公告)日：2023-01-26

申请号：US17787235

申请日：2020-11-13

Applicant: ASML Netherlands B.V.

Inventor： Sander KERSSEMAKERS ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Henricus Gerardus TEGENBOSCH

IPC: G03F7/20 ,  H05G2/00

Abstract: A vessel (16) for an EUV radiation source, the vessel comprising a first opening (30) for accessing an interior (32) of the vessel, a first access member (34) configured to allow or prevent access to the interior of the vessel through the first opening, a second opening (36) for accessing the interior of the vessel, the second opening being arranged in the first access member and a second access member (38) arranged on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening.

公开(公告)号：US20170131642A1

公开(公告)日：2017-05-11

申请号：US15316036

申请日：2015-05-13

Applicant: ASML Netherlands B.V.

Inventor： Johannes Jacobus Matheus BASELMANS ,  Hans BUTLER ,  Christiaan Alexander HOOGENDAM ,  Sander KERSSEMAKERS ,  Bart SMEETS ,  Robertus Nicodemus Jacobus VAN BALLEGOIJ ,  Hubertus Petrus Leonardus Henrica VAN BUSSEL

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70066 ,  G03F7/70141 ,  G03F7/70641

Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.

公开(公告)号：US20190129317A1

公开(公告)日：2019-05-02

申请号：US16219449

申请日：2018-12-13

Applicant: ASML Netherlands B.V.

Inventor： Michael RONDE ,  Lucas KUINDERSMA ,  Niels BOSCH ,  Hans BUTLER ,  Cornelius Adrianus Lambertus DE HOON ,  Marc Wilhelmus Maria VAN DER WIJST ,  Thijs VERHEES ,  Sander KERSSEMAKERS

IPC: G03F7/20

Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.

公开(公告)号：US20170199467A1

公开(公告)日：2017-07-13

申请号：US15321184

申请日：2015-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Sander KERSSEMAKERS ,  Wilhelmus Petrus DE BOEIJ ,  Gerben Frank DE LANGE ,  Christiaan Alexander HOOGENDAM ,  Petrus Franciscus VAN GILS ,  Jelmer Mattheus KAMMINGA ,  Jan Jaap KUIT ,  Carolus Johannes Catharina SCHOORMANS

IPC: G03F7/20

CPC classification number: G03F7/70425 ,  G03F7/70433 ,  G03F7/707 ,  G03F7/70716

Abstract: A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning N direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.