公开(公告)号：US20240069454A1

公开(公告)日：2024-02-29

申请号：US18280266

申请日：2022-02-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Cristina CARESIO ,  Tabitha Wangari KINYANJUI ,  Andrey Valerievich ROGACHEVSKIY ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Raymund CENTENO ,  Jan Arie DEN BOER ,  Viktor TROGRLIC

IPC: G03F9/00

CPC classification number: G03F9/7034 ,  G03F9/7092

Abstract: A method of processing a data set including equispaced and/or non-equispaced data samples is disclosed. The method includes filtering of the data, wherein a kernel defined by a probability density function is convoluted over samples in the data set to perform a weighted average of the samples at a plurality of positions across the data set, and wherein a first order regression is applied to the filtered data to provide a processed data output.

公开(公告)号：US20230204352A1

公开(公告)日：2023-06-29

申请号：US17923535

申请日：2021-03-29

Applicant: ASML Netherlands B.V.

Inventor： Arjan GIJSBERTSEN ,  Viktor TROGRLIC ,  Peter Fernand William Jos DENDAS ,  Mihaita POPINCIUC ,  Andrey Valerievich ROGACHEVSKIY

IPC: G01B11/30 ,  G01B11/16 ,  G01B11/24 ,  G03F7/00

CPC classification number: G01B11/30 ,  G01B11/16 ,  G01B11/24 ,  G03F7/0005 ,  G01B2210/56

Abstract: Systems, apparatuses, and methods are provided for generating level data. An example method can include receiving first level data for a first region of a substrate. The first region can include a first subregion having a first surface level, and a second subregion having a second surface level. The example method can further include generating, based on the first level data, measurement control map data. The example method can further include generating, based on the measurement control map data, second level data for a second region of the substrate. The second region can include a plurality of third subregions each having a third surface level equal to about the first surface level, and, optionally, no region having a surface level equal to about the second surface level.

公开(公告)号：US20220244651A1

公开(公告)日：2022-08-04

申请号：US17625466

申请日：2020-06-15

Applicant: ASML Netherlands B.V.

Inventor： Andrey Valerievich ROGACHEVSKIY ,  Martin Jules Marie-Emile DE NIVELLE ,  Arjan GIJSBERTSEN ,  Willem Richard PONGERS ,  Viktor TROGRLIC

IPC: G03F9/00 ,  G03F7/20

Abstract: An apparatus for measuring a height of a substrate for processing in a lithographic apparatus is disclosed. The apparatus comprises a first sensor for sensing a height of the substrate over a first area. The apparatus also comprises a second sensor for sensing a height of the substrate over a second area. The apparatus further comprises a processor adapted to normalize first data corresponding to a signal from the first sensor with a second sensor footprint to produce a first normalized height data, and to normalize second data corresponding to a signal from the second sensor with a first sensor footprint to produce a second normalized height data. The processor is adapted to determine a correction to a measured height of the substrate based on a difference between the first and second normalized height data.