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公开(公告)号:US10283333B2
公开(公告)日:2019-05-07
申请号:US14893775
申请日:2014-05-26
摘要: Improvement of control of size and structure of nanoclusters with a nanocluster production apparatus is intended. Increase of an obtained amount and a yield of nanoclusters having size and structure, at least one of which is selected, is intended. A nanocluster production apparatus has a vacuum chamber, a sputtering source that generates plasma by pulse discharge, a pulse power supply that supplies a pulsed power to the sputtering source, a first inert gas supply device that supplies a first inert gas to the sputtering source, a cluster growth cell stored in the vacuum chamber and a second inert gas introduction device that introduces a second inert gas into the cluster growth cell.
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公开(公告)号:US20160111262A1
公开(公告)日:2016-04-21
申请号:US14893775
申请日:2014-05-26
CPC分类号: H01J37/3405 , C23C14/14 , C23C14/3485 , C23C14/35 , H01J37/08 , H01J37/3244 , H01J37/32715 , H01J37/34 , H01J37/3426 , H01J37/3467 , H01J2237/081 , H01J2237/0812
摘要: Improvement of control of size and structure of nanoclusters with a nanocluster production apparatus is intended. Increase of an obtained amount and a yield of nanoclusters having size and structure, at least one of which is selected, is intended. A nanocluster production apparatus has a vacuum chamber, a sputtering source that generates plasma by pulse discharge, a pulse power supply that supplies a pulsed power to the sputtering source, a first inert gas supply device that supplies a first inert gas to the sputtering source, a cluster growth cell stored in the vacuum chamber and a second inert gas introduction device that introduces a second inert gas into the cluster growth cell.
摘要翻译: 使用纳米簇生产装置改善纳米簇的尺寸和结构的控制。 希望增加获得的量和具有尺寸和结构的纳米簇的产量,其中至少一个被选择。 纳米簇生产装置具有真空室,通过脉冲放电产生等离子体的溅射源,向溅射源供给脉冲功率的脉冲电源,向溅射源供给第一惰性气体的第一惰性气体供给装置, 存储在真空室中的簇生长池和将第二惰性气体引入聚集体生长池中的第二惰性气体引入装置。
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