公开(公告)号：US20050174575A1

公开(公告)日：2005-08-11

申请号：US11105099

申请日：2005-04-13

申请人： Adam Norton ,  Abdurrahman Sezginer ,  Fred Stanke

发明人： Adam Norton ,  Abdurrahman Sezginer ,  Fred Stanke

IPC分类号： G01N21/21 ,  G01N21/25 ,  G01N21/47 ,  G01N21/956

CPC分类号： G01B11/02 ,  G01J3/02 ,  G01J3/0294 ,  G01N21/211 ,  G01N21/25 ,  G01N21/474 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/213

摘要： An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polarized illumination beam at non-normal incidence onto a periodic structure on a sample, can measure optical properties of the periodic structure. An E-O modulator in the illumination path can modulate the polarization. The head optics collect light reflected from the periodic structure and feed that light to a spectrometer for measurement. A beamsplitter in the collection path can ensure both S and P polarization from the sample are separately measured. The measurement head can be mounted for rotation of the plane of incidence to different azimuthal directions relative to the periodic structures. The instrument can be integrated within a wafer process tool in which wafers may be provided at arbitrary orientation.

公开(公告)号：US20080037015A1

公开(公告)日：2008-02-14

申请号：US11903238

申请日：2007-09-21

申请人： Adam Norton ,  Abdurrahman Sezginer ,  Fred Stanke

发明人： Adam Norton ,  Abdurrahman Sezginer ,  Fred Stanke

IPC分类号： G01J3/447

CPC分类号： G01B11/02 ,  G01J3/02 ,  G01J3/0294 ,  G01N21/211 ,  G01N21/25 ,  G01N21/474 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/213

摘要： An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polarized illumination beam at non-normal incidence onto a periodic structure on a sample, can measure optical properties of the periodic structure. An E-O modulator in the illumination path can modulate the polarization. The head optics collect light reflected from the periodic structure and feed that light to a spectrometer for measurement. A beamsplitter in the collection path can ensure both S and P polarization from the sample are separately measured. The measurement head can be mounted for rotation of the plane of incidence to different azimuthal directions relative to the periodic structures. The instrument can be integrated within a wafer process tool in which wafers may be provided at arbitrary orientation.

摘要翻译： 用于评估样品的光学测量系统具有耦合到方位角可旋转测量头的电动机旋转机构，允许光学器件相对于样品旋转。 具有将非正常入射的偏振照明光束引导到样品上的周期性结构上的光学偏振散射仪可以测量周期性结构的光学性质。 照明路径中的E-O调制器可以调制偏振。 头部光学器件收集从周期性结构反射的光并将光馈送到光谱仪进行测量。 收集路径中的分束器可以确保来自样品的S和P极化分别测量。 测量头可以安装成相对于周期性结构使入射平面旋转到不同的方位角方向。 仪器可以集成在晶片工艺工具中，其中可以以任意取向提供晶片。

公开(公告)号：US20050018190A1

公开(公告)日：2005-01-27

申请号：US10917219

申请日：2004-08-12

申请人： Abdurrahman Sezginer ,  Kenneth Johnson ,  Fred Stanke

发明人： Abdurrahman Sezginer ,  Kenneth Johnson ,  Fred Stanke

IPC分类号： G03F7/20 ,  H01L23/544 ,  G01B11/00

CPC分类号： G03F7/70633 ,  H01L22/34 ,  H01L2223/54453

摘要： Alignment accuracy between two or more patterned layers is measured using a metrology target comprising substantially overlapping diffraction gratings formed in a test area of the layers being tested. An optical instrument illuminates all or part of the target area and measures the optical response. The instrument can measure transmission, reflectance, and/or ellipsometric parameters as a function of wavelength, polar angle of incidence, azimuthal angle of incidence, and/or polarization of the illumination and detected light. Overlay error or offset between those layers containing the test gratings is determined by a processor programmed to calculate an optical response for a set of parameters that include overlay error, using a model that accounts for diffraction by the gratings and interaction of the gratings with each others' diffracted field. The model parameters might also take account of manufactured asymmetries. The calculation may involve interpolation of pre-computed entries from a database accessible to the processor. The calculated and measured responses are iteratively compared and the model parameters changed to minimize the difference.

摘要翻译： 使用包括在被测试层的测试区域中形成的基本上重叠的衍射光栅的测量目标来测量两个或更多个图案化层之间的对准精度。 光学仪器照亮目标区域的全部或部分，并测量光学响应。 仪器可以测量作为波长，极角入射角，入射方位角和/或照明和检测光的偏振的函数的透射率，反射率和/或椭偏参数。 包含测试光栅的那些层之间的叠加误差或偏移量被编程为使用考虑光栅衍射的模型和光栅与彼此的相互作用计算包括重叠误差的一组参数的光学响应的​​处理器来确定 '衍射场 模型参数也可能考虑到制造的不对称性。 该计算可以包括从处理器可访问的数据库插入预先计算的条目。 迭代比较计算和测量的响应，改变模型参数以最小化差异。

公开(公告)号：US20060146321A1

公开(公告)日：2006-07-06

申请号：US11364709

申请日：2006-02-28

申请人： Abdurrahman Sezginer ,  Kenneth Johnson ,  Adam Norton ,  Holger Tuitje

发明人： Abdurrahman Sezginer ,  Kenneth Johnson ,  Adam Norton ,  Holger Tuitje

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  G01N21/274 ,  G01N21/278 ,  G01N21/93

摘要： A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.

公开(公告)号：US20060164632A1

公开(公告)日：2006-07-27

申请号：US11364312

申请日：2006-02-28

申请人： Abdurrahman Sezginer ,  Kenneth Johnson ,  Adam Norton ,  Holger Tuitje

发明人： Abdurrahman Sezginer ,  Kenneth Johnson ,  Adam Norton ,  Holger Tuitje

IPC分类号： G01N21/01

CPC分类号： G01N21/9501 ,  G01N21/274 ,  G01N21/278 ,  G01N21/93

摘要： A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.

公开(公告)号：US06738136B2

公开(公告)日：2004-05-18

申请号：US10290730

申请日：2002-11-07

申请人： Adam Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke ,  Rodney Smedt

发明人： Adam Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke ,  Rodney Smedt

IPC分类号： G01J308

CPC分类号： G01J3/02 ,  G01J3/0218 ,  G01J3/08 ,  G01J3/42 ,  G01N21/55

摘要： The invention is a method and apparatus for determining characteristics of a sample. The system and method provide for detecting a monitor beam reflected off a mirror, where the monitor beam corresponds to the intensity of light incident upon the sample. The system and method also provide for detecting a measurement beam, where the measurement beam has been reflected off the sample being characterized. Both the monitor beam and the measurement beam are transmitted through the same transmission path, and detected by the same detector. Thus, potential sources of variations between the monitor beam and the measurement beam which are not due to the characteristics of the sample are minimized. Reflectivity information for the sample can be determined by comparing data corresponding to the measurement beam relative to data corresponding the monitor beam.

摘要翻译： 本发明是用于确定样品特性的方法和装置。 该系统和方法提供用于检测从反射镜反射的监视光束，其中监视光束对应于入射在样本上的光的强度。 该系统和方法还提供了用于检测测量光束，其中测量光束已经从被表征的样品反射出来。 监测光束和测量光束都通过相同的传输路径传输，并由相同的检测器检测。 因此，监测光束和测量光束之间不是由于样品特性引起的变化的潜在来源被最小化。 可以通过将与测量光束相对应的数据相对于监视光束对应的数据进行比较来确定样本的反射率信息。

公开(公告)号：US06870617B2

公开(公告)日：2005-03-22

申请号：US10796322

申请日：2004-03-09

申请人： Adam Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke ,  Rodney Smedt

发明人： Adam Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke ,  Rodney Smedt

IPC分类号： G01J3/08 ,  G01J3/42 ,  G01N21/55

CPC分类号： G01J3/02 ,  G01J3/0218 ,  G01J3/08 ,  G01J3/42 ,  G01N21/55

摘要： The invention is a method and apparatus for determining characteristics of a sample. The system and method provide for detecting a monitor beam reflected off a mirror, where the monitor beam corresponds to the intensity of light incident upon the sample. The system and method also provide for detecting a measurement beam, where the measurement beam has been reflected off the sample being characterized. Both the monitor beam and the measurement beam are transmitted through the same transmission path, and detected by the same detector. Thus, potential sources of variations between the monitor beam and the measurement beam which are not due to the characteristics of the sample are minimized. Reflectivity information for the sample can be determined by comparing data corresponding to the measurement beam relative to data corresponding the monitor beam.

摘要翻译： 本发明是用于确定样品特性的方法和装置。 该系统和方法提供用于检测从反射镜反射的监视光束，其中监视光束对应于入射在样本上的光的强度。 该系统和方法还提供了用于检测测量光束，其中测量光束已经从被表征的样品反射出来。 监测光束和测量光束都通过相同的传输路径传输，并由相同的检测器检测。 因此，监测光束和测量光束之间不是由于样品特性引起的变化的潜在来源被最小化。 可以通过将与测量光束相对应的数据相对于监视光束对应的数据进行比较来确定样本的反射率信息。

公开(公告)号：US08549458B2

公开(公告)日：2013-10-01

申请号：US12614911

申请日：2009-11-09

申请人： Abdurrahman Sezginer

发明人： Abdurrahman Sezginer

IPC分类号： G06F17/50

CPC分类号： G06F17/5077 ,  G06F2217/12 ,  Y02P90/265

摘要： Disclosed is a method, apparatus, and program product for routing an electronic design using sidewall image transfer that is correct by construction. The layout is routed by construction to allow successful manufacturing with sidewall image transfer, since the router will not allow a routing configuration in the layout that cannot be successfully manufactured with a two-mask sidewall image transfer. A layout is produced that can be manufactured by a two-mask sidewall image transfer method. In one approach, interconnections can be in arbitrary directions. In another approach, interconnections follow grid lines in x and y-directions.

摘要翻译： 公开了一种使用通过构造正确的侧壁图像传送来路由电子设计的方法，装置和程序产品。 布局通过结构进行路由，以允许成功制造侧壁图像传输，因为路由器将不允许布局中的路由配置不能用双掩模侧壁图像传输成功制造。 产生可以通过双掩模侧壁图像转印方法制造的布局。 在一种方法中，互连可以是任意方向。 在另一种方法中，互连遵循x和y方向的网格线。

公开(公告)号：US07743358B2

公开(公告)日：2010-06-22

申请号：US11203498

申请日：2005-08-13

申请人： Abdurrahman Sezginer ,  Bayram Yenikaya ,  Hsu-Ting Huang

发明人： Abdurrahman Sezginer ,  Bayram Yenikaya ,  Hsu-Ting Huang

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： An apparatus and method for modifying a mask data set includes calculating a derivative of a figure-of-merit, indicative of a data set defined by a plurality of polygon edges and then segmenting polygon edges in response to said step of calculating.

摘要翻译： 用于修改掩模数据集的装置和方法包括计算表示由多个多边形边界定义的数据集的品质因数的导数，然后响应于所述计算步骤来分割多边形边缘。

公开(公告)号：US07480891B2

公开(公告)日：2009-01-20

申请号：US11203505

申请日：2005-08-13

申请人： Abdurrahman Sezginer

发明人： Abdurrahman Sezginer

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F1/70

摘要： An apparatus and method for improving image quality in a photolithographic process includes calculating a figure-of-demerit for a photolithographic mask function and then adjusting said photolithographic mask function to reduce the figure of demerit.

摘要翻译： 用于改善光刻工艺中的图像质量的装置和方法包括计算光刻掩模功能的缺点，然后调整所述光刻掩模功能以减少刻痕图。