Plasma Source Device and Methods
    2.
    发明申请
    Plasma Source Device and Methods 审中-公开
    等离子体源装置和方法

    公开(公告)号:US20160268104A1

    公开(公告)日:2016-09-15

    申请号:US15067060

    申请日:2016-03-10

    Abstract: This disclosure describes a remote plasma source, a gas input manifold, and related methods of making and using. In some examples, a remote plasma source is provided with a plasma chamber, a gas input manifold, and an output region. The remote plasma source also has means for introducing a gas into the plasma chamber, the means for introducing configured to impart a radial velocity and a longitudinal velocity on the gas, relative to a longitudinal axis through the remote plasma source.

    Abstract translation: 本公开描述了远程等离子体源,气体输入歧管以及相关的制造和使用方法。 在一些示例中,远程等离子体源设置有等离子体室,气体输入歧管和输出区域。 远程等离子体源还具有用于将气体引入等离子体室的装置,用于引入的装置被配置成相对于通过远程等离子体源的纵轴赋予气体上的径向速度和纵向速度。

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