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    ANTIOXIDANTS FOR POST-CMP CLEANING FORMULATIONS
    4.
    发明申请
    ANTIOXIDANTS FOR POST-CMP CLEANING FORMULATIONS 有权
    用于后CMP清洁配方的抗氧化剂

    公开(公告)号：US20140206588A1

    公开(公告)日：2014-07-24

    申请号：US14224672

    申请日：2014-03-25

    申请人： ADVANCED TECHNOLOGY MATERIALS, INC.

    发明人： David Angst ,  Peng Zhang ,  Jeffrey Barnes ,  Prerna Sonthalia ,  Emanuel Cooper ,  Karl Boggs

    IPC分类号： C11D3/00

    CPC分类号： C11D11/0047 ,  C11D3/0073 ,  C11D3/0078 ,  C11D3/0084 ,  C11D7/265 ,  C11D7/267 ,  C11D7/32 ,  C11D7/3209 ,  C11D7/3281

    摘要： An cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions include novel corrosion inhibitors. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.

    摘要翻译： 一种清洁组合物和用于从具有所述残留物和污染物的微电子装置清洁后化学机械抛光（CMP）残留物和污染物的清洁组合物和方法。 清洁组合物包括新的腐蚀抑制剂。 该组合物可以在不影响低k电介质材料或铜互连材料的情况下从微电子器件的表面高效地清洁后CMP残留物和污染物质。

    COMPONENT FOR SOLAR ADSORPTION REFRIGERATION SYSTEM AND METHOD OF MAKING SUCH COMPONENT
    5.
    发明申请
    COMPONENT FOR SOLAR ADSORPTION REFRIGERATION SYSTEM AND METHOD OF MAKING SUCH COMPONENT 有权
    太阳能吸附制冷系统的组件和制造这种组件的方法

    公开(公告)号：US20140020419A1

    公开(公告)日：2014-01-23

    申请号：US14035834

    申请日：2013-09-24

    申请人： Advanced Technology Materials, Inc.

    发明人： J. Donald Carruthers ,  Karl Boggs ,  Luping Wang ,  Shaun M. Wilson ,  Jose I. Arno ,  Paul J. Marganski ,  Steven M. Bilodeau ,  Peng Zou ,  Brian Bobita ,  Joseph D. Sweeney

    IPC分类号： B01J20/26 ,  F25B27/00 ,  F25B35/04 ,  B01J20/28 ,  F25B17/08

    CPC分类号： B01J20/26 ,  B01J20/20 ,  B01J20/28054 ,  B01J20/28092 ,  B01J20/30 ,  B01J20/305 ,  B01J20/3078 ,  B01J2220/445 ,  C09K5/047 ,  F25B17/08 ,  F25B27/007 ,  F25B35/04 ,  F25B37/00 ,  F25B2500/01

    摘要： An adsorption structure is described that includes at least one adsorbent member formed of an adsorbent material and at least one porous member provided in contact with a portion of the adsorbent member to allow gas to enter and exit the portion of the adsorbent member. Such adsorption structure is usefully employed in adsorbent-based refrigeration systems. A method also is described for producing an adsorbent material, in which a first polymeric material provided having a first density and a second polymeric material is provided having a second density, in which the second polymeric material is in contact with the first polymeric material to form a structure. The structure is pyrolyzed to form a porous adsorbent material including a first region corresponding to the first polymeric material and a second region corresponding to the second polymeric material, in which at least one of the pore sizes and the pore distribution differs between the first region and the second region.

    摘要翻译： 描述了吸附结构，其包括由吸附剂材料形成的至少一个吸附构件和与吸附构件的一部分接触设置的至少一个多孔构件，以允许气体进入和离开吸附构件的该部分。 这种吸附结构在吸附剂型制冷系统中有用。 还描述了一种用于生产吸附材料的方法，其中提供具有第一密度的第一聚合物材料和第二聚合物材料，其具有第二密度，其中第二聚合物材料与第一聚合物材料接触以形成 一个结构。 该结构被热解以形成多孔吸附剂材料，其包括对应于第一聚合物材料的第一区域和对应于第二聚合物材料的第二区域，其中孔径和孔分布中的至少一个在第一区域和第 第二个地区。