公开(公告)号：US11905491B2

公开(公告)日：2024-02-20

申请号：US17492257

申请日：2021-10-01

申请人： Entegris, Inc.

发明人： Daniela White ,  YoungMin Kim ,  Michael L. White

IPC分类号： C11D3/30 ,  C11D11/00 ,  C11D7/32 ,  C11D7/26 ,  H01L21/02 ,  C11D7/34 ,  C11D7/50

CPC分类号： C11D11/0047 ,  C11D7/263 ,  C11D7/265 ,  C11D7/267 ,  C11D7/3218 ,  C11D7/3281 ,  C11D7/34 ,  C11D7/5022 ,  H01L21/02065

摘要： In general, the invention provides high pH cleaning compositions for dielectric surfaces such as PETEOS, SiO2, thermal oxide, silicon nitride, silicon, etc. The compositions of the invention afford superior surface wetting, dispersion of particles and organic residues, and prevents redeposition and re-agglomeration of the dispersed residue during cleaning to afford superior cleaning and low defectivity.

公开(公告)号：US11822250B2

公开(公告)日：2023-11-21

申请号：US16806838

申请日：2020-03-02

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Hiroyuki Iida ,  Motoki Takahashi ,  Masaharu Nakamura

IPC分类号： G03F7/32 ,  G03F7/42 ,  G03F7/30 ,  H01L21/02 ,  G03F7/40 ,  H01L21/027 ,  G03F7/16 ,  C11D7/26 ,  C11D7/50 ,  G03F7/004

CPC分类号： G03F7/325 ,  C11D7/267 ,  C11D7/5004 ,  G03F7/0048 ,  G03F7/16 ,  G03F7/30 ,  G03F7/3028 ,  G03F7/32 ,  G03F7/40 ,  G03F7/422 ,  G03F7/425 ,  H01L21/0206 ,  H01L21/02041 ,  H01L21/0273

摘要： A solution including an organic solvent (S), and an antioxidant (A), in which an antioxidant (A) includes a tocopherol compound (A1).

公开(公告)号：US11767493B2

公开(公告)日：2023-09-26

申请号：US17749520

申请日：2022-05-20

申请人： Henkel AG & Co. KGaA

发明人： Sascha Schaefer ,  Svenja Neuhaus ,  Antje Gebert-Schwarzwaelder ,  Christa Junkes ,  Arne Jansen

IPC分类号： C11D3/20 ,  C11D3/28 ,  C11D3/395 ,  C11D3/39 ,  C07D207/27 ,  C07D223/10 ,  C11D11/00 ,  C11D3/30 ,  C11D7/32 ,  C11D7/26 ,  B08B3/08 ,  B08B3/10 ,  D06L1/04

CPC分类号： C11D3/3927 ,  B08B3/08 ,  B08B3/10 ,  C07D207/27 ,  C07D223/10 ,  C11D3/2096 ,  C11D3/28 ,  C11D3/30 ,  C11D3/391 ,  C11D3/392 ,  C11D3/3942 ,  C11D3/3947 ,  C11D3/3951 ,  C11D3/3953 ,  C11D3/3956 ,  C11D7/267 ,  C11D7/3209 ,  C11D7/3281 ,  C11D11/0017 ,  C11D11/0023 ,  D06L1/04

摘要： The present invention relates to compounds which form, under perhydrolysis conditions, certain cationic organic peracids, to the use of said compounds for activating peroxygen compounds in the context of bleaching stains when washing textiles and cleaning hard surfaces, and to washing and cleaning agents that contain said compounds.

公开(公告)号：US20230212485A1

公开(公告)日：2023-07-06

申请号：US18158544

申请日：2023-01-24

申请人： FUJIFILM Corporation

发明人： Yasuo SUGISHIMA ,  Atsushi MIZUTANI

IPC分类号： C11D7/50 ,  C11D11/00 ,  C11D7/24 ,  C11D7/26 ,  C11D7/32 ,  H01L21/02

CPC分类号： C11D7/5022 ,  C11D7/244 ,  C11D7/261 ,  C11D7/267 ,  C11D7/3209 ,  C11D7/3218 ,  C11D11/0047 ,  H01L21/02057

摘要： An object of the present invention is to provide a treatment liquid for a semiconductor device, which is excellent in removal performance for residues present on a substrate, and to provide a substrate washing method using the treatment liquid.
The treatment liquid of the present invention is a treatment liquid for a semiconductor device, which includes water, a basic compound, hexylene glycol, and a compound A that is at least one kind selected from the group consisting of isobutene, (E)-2-methyl-1,3-pentadiene, 4-methyl-1,3-pentadiene, 2,2,4-trimethyloxetane, 4-methyl-3-penten-2-ol, and 2,4,4,6-tetramethyl-1,3-dioxane.

公开(公告)号：US20180072898A1

公开(公告)日：2018-03-15

申请号：US15816164

申请日：2017-11-17

申请人： Ethox Chemicals, LLC

发明人： James T. Tanner ,  William C. Floyd, III

IPC分类号： C09D9/00 ,  C11B9/00 ,  C11C3/04 ,  C11C3/00 ,  C09D7/00 ,  C11D7/26 ,  C11D3/18 ,  C11D3/20 ,  C11D7/32

CPC分类号： C09D9/005 ,  C09D7/43 ,  C11B9/00 ,  C11C3/00 ,  C11C3/04 ,  C11D3/188 ,  C11D3/2096 ,  C11D7/267 ,  C11D7/3209

摘要： A composition suitable for cleaning hard surfaces comprising a natural oil solvent and a natural oil thickener is provided.

公开(公告)号：US20160254139A1

公开(公告)日：2016-09-01

申请号：US15152676

申请日：2016-05-12

申请人： FUJIFILM Corporation

发明人： Tetsuya KAMIMURA ,  Yasuo SUGISHIMA ,  Atsushi MIZUTANI

IPC分类号： H01L21/02 ,  B08B3/08 ,  B08B7/00 ,  C11D7/26 ,  B08B3/04 ,  B08B3/10 ,  C11D11/00 ,  C11D7/32 ,  H01L21/3105 ,  B08B9/00

CPC分类号： H01L21/02057 ,  B08B3/041 ,  B08B3/08 ,  B08B3/10 ,  B08B7/0035 ,  B08B9/00 ,  C11D3/0073 ,  C11D3/3719 ,  C11D3/3723 ,  C11D3/3773 ,  C11D3/3776 ,  C11D7/261 ,  C11D7/265 ,  C11D7/267 ,  C11D7/32 ,  C11D7/3209 ,  C11D7/3245 ,  C11D7/3263 ,  C11D7/3272 ,  C11D7/3281 ,  C11D11/0047 ,  G03F7/425 ,  H01L21/31058 ,  H01L21/31133 ,  H01L21/31138 ,  H01L21/823814 ,  H01L21/823857

摘要： Provided is a semiconductor substrate treatment liquid which removes an organic material on the top of a semiconductor substrate from the semiconductor substrate having a Ge-containing layer that includes germanium (Ge) or cleans the surface thereof, and the treatment liquid includes a liquid chemical component which adjusts the pH of the treatment liquid to be in a range of 5 to 16 and an anticorrosive component which is used to prevent the Ge-containing layer.

摘要翻译： 提供一种半导体衬底处理液，其从具有包含锗（Ge）的Ge含量层的半导体衬底或其表面清除半导体衬底的顶部上的有机材料，并且处理液体包括液体化学组分 其将处理液的pH调节至5〜16的范围，以及用于防止含Ge层的防腐蚀成分。

公开(公告)号：US20160179011A1

公开(公告)日：2016-06-23

申请号：US14964033

申请日：2015-12-09

申请人： AIR PRODUCTS AND CHEMICALS, INC.

发明人： Rajiv Krishan Agarwal ,  Mark Richard Brown ,  Aiping Wu ,  David Barry Rennie ,  Yi-Chia Lee ,  Gene Everad Parris

IPC分类号： G03F7/42 ,  H01L21/02 ,  C11D7/26 ,  C11D11/00 ,  C11D7/32

CPC分类号： G03F7/425 ,  C11D7/261 ,  C11D7/265 ,  C11D7/267 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/3281 ,  C11D11/0047 ,  G03F7/423 ,  G03F7/426 ,  H01L21/02057 ,  H01L21/02334

摘要： A photoresist or semiconductor manufacturing residue stripping and cleaning composition comprising water, one or more alkaline compounds, one or more corrosion inhibitors, and one or more oxidized products of one or more antioxidants, the method of making the composition and the method of using the composition.

摘要翻译： 包含水，一种或多种碱性化合物，一种或多种腐蚀抑制剂和一种或多种抗氧化剂的一种或多种氧化产物的光致抗蚀剂或半导体制造残渣汽提和清洁组合物，制备组合物的方法和使用组合物的方法 。

公开(公告)号：US20150114429A1

公开(公告)日：2015-04-30

申请号：US14401739

申请日：2013-05-17

申请人： Shrane Ning Jenq ,  Karl E. Boggs ,  Jun Liu ,  Nicole Thomas

发明人： Shrane Ning Jenq ,  Karl E. Boggs ,  Jun Liu ,  Nicole Thomas

IPC分类号： C11D11/00 ,  C11D7/32 ,  C25D5/48

CPC分类号： C11D11/0047 ,  C11D3/0073 ,  C11D7/08 ,  C11D7/267 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/3245 ,  C11D7/3281 ,  C25D5/48 ,  H01L21/02074

摘要： A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions include at least one quaternary base, at least one amine, at least one corrosion inhibitor, and at least one solvent. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device while being compatible with barrier layers.

摘要翻译： 一种清洁组合物和用于从具有所述残余物和污染物的微电子装置清洁后化学机械抛光（CMP）残留物和污染物的清洁组合物和方法。 清洁组合物包括至少一种季碱，至少一种胺，至少一种腐蚀抑制剂和至少一种溶剂。 该组合物可与微电子器件的表面高效地清洗后CMP残留物和污染物质，同时与阻挡层相容。

公开(公告)号：US20150024989A1

公开(公告)日：2015-01-22

申请号：US14510381

申请日：2014-10-09

申请人： International Business Machines Corporation

发明人： Vishal Chhabra ,  Laertis Economikos ,  John A. Fitzsimmons ,  James Hannah ,  Mahmoud Khojasteh ,  Jennifer Muncy

IPC分类号： H01L21/02 ,  C11D7/08 ,  C11D7/26

CPC分类号： H01L21/02057 ,  C11D3/042 ,  C11D3/2079 ,  C11D3/2086 ,  C11D7/08 ,  C11D7/265 ,  C11D7/267 ,  C11D11/0047

摘要： Cleaning solutions and processes for cleaning semiconductor devices or semiconductor tooling during manufacture thereof generally include contacting the semiconductor devices or semiconductor tooling with an acidic aqueous cleaning solution free of a fluorine containing compound, the acidic aqueous cleaning solution including at least one antioxidant and at least one non-oxidizing acid.

摘要翻译： 用于在制造过程中清洁半导体器件或半导体工具的清洁溶液和工艺通常包括使半导体器件或半导体工具与不含氟化合物的酸性含水清洁溶液接触，所述酸性含水清洁溶液包含至少一种抗氧化剂和至少一种抗氧化剂 非氧化性酸。

公开(公告)号：US20140352731A1

公开(公告)日：2014-12-04

申请号：US13907549

申请日：2013-05-31

申请人： Arrow-Magnolia International Inc.

发明人： Tony Atabong ,  Curtis Shaw

IPC分类号： C11D7/26 ,  B08B9/02 ,  B08B9/08 ,  B08B3/08

CPC分类号： C11D7/267 ,  B08B3/08 ,  B08B9/023 ,  B08B9/027 ,  B08B9/08 ,  C11D3/2093 ,  C11D3/2096 ,  C11D7/266 ,  C11D11/0041 ,  C11D17/003

摘要： A cleaning composition suitable for removing soil from a variety of surfaces and a method of using the same are provided. Cleaning compositions according to embodiments of the present invention include at least one carbonate ester, including, for example, ethylene carbonate, propylene carbonate, trimethylene carbonate, and combinations thereof. Depending on the specific application, the compositions may also include at least one surfactant and/or at least one thickener. Cleaning compositions as described herein may be particularly useful for removing soil from surfaces of pipes, vessels, and other equipment associated with the production and/or processing of oil and/or natural gas, such as, for example, equipment associated with a hydraulic fracturing process.

摘要翻译： 提供了适用于从各种表面除去土壤的清洁组合物及其使用方法。 根据本发明实施方案的清洁组合物包括至少一种碳酸酯，包括例如碳酸亚乙酯，碳酸亚丙酯，三亚甲基碳酸酯及其组合。 根据具体应用，组合物还可以包括至少一种表面活性剂和/或至少一种增稠剂。 如本文所述的清洁组合物可特别用于从与油和/或天然气的生产和/或加工相关的管，容器和其它设备的表面去除污垢，例如与水力压裂有关的设备 处理。