公开(公告)号：US6060697A

公开(公告)日：2000-05-09

申请号：US39141

申请日：1998-03-13

申请人： Akihiko Morita ,  Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Masaki Iwami ,  Joichi Nishimura ,  Kazuhiro Nishimura ,  Tetsuya Hamada ,  Satoshi Yamamoto ,  Kenji Kamei

发明人： Akihiko Morita ,  Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Masaki Iwami ,  Joichi Nishimura ,  Kazuhiro Nishimura ,  Tetsuya Hamada ,  Satoshi Yamamoto ,  Kenji Kamei

IPC分类号： H01L21/02 ,  G05D23/19 ,  H02J3/00 ,  H02J13/00 ,  H05B1/02

CPC分类号： G05D23/1951

摘要： A substrate processing apparatus reduces an instantaneous maximum power consumption at turn-on. Power receiving parts of a plurality of processing units are connected to one end of a turn-on switch respectively through switches. The other end of the turn-on switch is connected to an external power source through a breaker. Timer values are set in advance in the timers, respectively. When the turn-on switch is turned on, the timers turn on the associated switches respectively after times which are defined by the timer values, whereby the processing units are provided with electric power, each with a delay of a constant time.

摘要翻译： 基板处理装置降低开启时的瞬时最大功耗。 多个处理单元的受电部分分别通过开关连接到导通开关的一端。 导通开关的另一端通过断路器连接到外部电源。 定时器值分别在定时器中设置。 当接通开关接通时，定时器分别在由定时器值定义的时间之后分别关闭相应的开关，由此处理单元被提供电力，每个具有恒定时间的延迟。

公开(公告)号：US06051101A

公开(公告)日：2000-04-18

申请号：US39824

申请日：1998-03-16

申请人： Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Takanori Kawamoto ,  Masaki Iwami ,  Joichi Nishimura ,  Akihiko Morita

发明人： Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Takanori Kawamoto ,  Masaki Iwami ,  Joichi Nishimura ,  Akihiko Morita

IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677 ,  B65H1/00

CPC分类号： H01L21/67161 ,  H01L21/67178 ,  H01L21/67742 ,  H01L21/67745

摘要： A unit arrangement part comprises a chemical cabinet on its lowermost part, while coating units for forming a resist film on a substrate and developing units for developing the substrate after exposure are arranged on four corners of an apparatus above the chemical cabinet. Further, multistage thermal processing units for thermal-processing the substrate are arranged on front and rear portions of the apparatus above these wet processing units. A cleaning unit for supplying a cleaning liquid such as pure water and cleaning the substrate is arranged on a front side of the apparatus between the coating units as a substrate processing unit. Thus provided is a substrate processing apparatus having excellent workability in maintenance with a high degree of freedom in arrangement of processing units.

摘要翻译： 单元布置部分包括在其最下部分的化学柜，而在基板上形成抗蚀剂膜的涂布单元和曝光后用于显影基板的显影单元布置在化学柜上方的设备的四个角上。 此外，用于热处理基板的多级热处理单元布置在这些湿处理单元上方的设备的前部和后部。 在作为基板处理单元的涂布单元之间的设备的前侧设置有用于供应诸如纯水的清洁液体并清洁基板的清洁单元。 因此，提供了一种具有优异的维护可加工性的基板处理装置，并且处理单元的布置自由度高。

公开(公告)号：US6062852A

公开(公告)日：2000-05-16

申请号：US60422

申请日：1998-04-14

申请人： Takanori Kawamoto ,  Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Masaki Iwami ,  Joichi Nishimura ,  Akihiko Morita

发明人： Takanori Kawamoto ,  Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Masaki Iwami ,  Joichi Nishimura ,  Akihiko Morita

IPC分类号： H01L21/683 ,  F27D5/00 ,  H01L21/027 ,  H01L21/68

CPC分类号： H01L21/67109 ,  H01L21/67178 ,  H01L21/68728 ,  H01L21/68742

摘要： A substrate heat-treating apparatus includes a heat-treating plate, and support pins extending through the heat-treating plate to be vertically movable relative thereto. The support pins support each substrate at a lower surface thereof such that edges of the substrate are at a higher level than a central region of the substrate. This construction facilitates air flows into and out of a space between the lower surface of the substrate and the upper surface of the heat-treating plate when the substrate is vertically moved.

摘要翻译： 基板热处理装置包括热处理板和延伸穿过热处理板以相对于其垂直移动的支撑销。 支撑销在其下表面处支撑每个基板，使得基板的边缘处于比基板的中心区域更高的水平。 当基板垂直移动时，这种结构便于空气流入和流出基板的下表面和热处理板的上表面之间的空间。

公开(公告)号：US07913346B2

公开(公告)日：2011-03-29

申请号：US11396820

申请日：2006-03-28

申请人： Masaki Iwami ,  Soichi Nadahara

发明人： Masaki Iwami ,  Soichi Nadahara

IPC分类号： B08B11/02

CPC分类号： H01L21/67046

摘要： A substrate treatment apparatus includes a substrate holding mechanism which holds a substrate, a scrub brush for scrubbing a surface of the substrate held by the substrate holding mechanism to remove foreign matter from the substrate surface, a treatment liquid supplying mechanism which supplies an alkaline treatment liquid to the substrate surface when the substrate is scrubbed with the scrub brush, and an alkaline fluid supplying mechanism which supplies an alkaline fluid to a surface of the scrub brush in a standby period during which no substrate is scrubbed with the scrub brush.

摘要翻译： 一种基板处理装置，包括：保持基板的基板保持机构，用于清洗由基板保持机构保持的基板的表面以从基板表面除去异物的擦洗刷，提供碱性处理液的处理液供给机构 当用洗刷刷洗涤衬底时，将衬底表面施加到衬底表面;以及碱性流体供应机构，其在待刷毛刷不用衬底被擦洗的待机期间内将碱性流体供应到擦洗刷的表面。

公开(公告)号：US20070006895A1

公开(公告)日：2007-01-11

申请号：US11482427

申请日：2006-07-07

申请人： Masaki Iwami ,  Masanobu Sato

发明人： Masaki Iwami ,  Masanobu Sato

IPC分类号： B08B7/00

CPC分类号： B08B1/04 ,  H01L21/67046

摘要： An inventive substrate cleaning brush includes a peripheral surface cleaning portion, and a marginal area cleaning portion connected to the peripheral surface cleaning portion. The peripheral surface cleaning portion has a peripheral surface cleaning surface to be pressed against a peripheral surface of a substrate. The marginal area cleaning portion has a marginal area cleaning surface to be pressed against a marginal area of a major surface of the substrate, and the marginal area cleaning surface projects from the peripheral surface cleaning surface by a variable projection length.

摘要翻译： 本发明的基材清洁刷包括外围表面清洁部分和连接到周边表面清洁部分的边缘区域清洁部分。 周边表面清洁部分具有被压靠在基板的外周表面上的外周表面清洁表面。 边缘区域清洁部分具有被压靠在基板的主表面的边缘区域上的边缘区域清洁表面，并且边缘区域清洁表面以可变的突出长度从外围表面清洁表面突出。

公开(公告)号：US20060219260A1

公开(公告)日：2006-10-05

申请号：US11396820

申请日：2006-03-28

申请人： Masaki Iwami ,  Soichi Nadahara

发明人： Masaki Iwami ,  Soichi Nadahara

IPC分类号： B08B3/06

CPC分类号： H01L21/67046

摘要： A substrate treatment apparatus includes a substrate holding mechanism which holds a substrate, a scrub brush for scrubbing a surface of the substrate held by the substrate holding mechanism to remove foreign matter from the substrate surface, a treatment liquid supplying mechanism which supplies an alkaline treatment liquid to the substrate surface when the substrate is scrubbed with the scrub brush, and an alkaline fluid supplying mechanism which supplies an alkaline fluid to a surface of the scrub brush in a standby period during which no substrate is scrubbed with the scrub brush.

摘要翻译： 一种基板处理装置，包括：保持基板的基板保持机构，用于清洗由基板保持机构保持的基板的表面以从基板表面除去异物的擦洗刷，提供碱性处理液的处理液供给机构 当用洗刷刷洗涤衬底时，将衬底表面施加到衬底表面;以及碱性流体供应机构，其在待刷毛刷不用衬底被擦洗的待机期间内将碱性流体供应到擦洗刷的表面。

公开(公告)号：US20060102069A1

公开(公告)日：2006-05-18

申请号：US11256976

申请日：2005-10-25

申请人： Kentaro Tokuri ,  Kenya Morinishi ,  Masaki Iwami

发明人： Kentaro Tokuri ,  Kenya Morinishi ,  Masaki Iwami

IPC分类号： B05C13/00 ,  B05C13/02 ,  B05C11/02

CPC分类号： G03F7/162 ,  G03F7/3021 ,  H01L21/67051

摘要： An apparatus causes a substrate to rotate and supplies a treatment liquid to a substrate surface to make a treatment, without concern that a mixed substance is eluted from a cup in the use for a long time, or a thin film comes off from an inside wall surface to be contamination-causing substances even if the cup made of a water-repellent material for collecting a treatment liquid becomes hydrophilic. A cup 16 disposed to surround the sides and underside of a substrate W rotating while being held by a spin chuck 10, and serving to collect a treatment liquid diffused from the substrate to the surroundings, is made of a plastic material. Further, an inside wall surface of an upper-side cup part 24 of the cup 16, being a portion on which the treatment liquid having been diffused from the substrate impinges, is roughened to be a hydrophilic surface.

摘要翻译： 一种装置使基材旋转，并将处理液供给到基材表面进行处理，而不用担心长时间使用中的混合物质从杯中洗脱，或薄膜从内壁脱落 即使由用于收集处理液的防水材料制成的杯子变成亲水性，也是被污染物质的表面。 设置成围绕由旋转卡盘10保持的基板W的侧面和下侧设置并用于收集从基板扩散到周围的处理液体的杯16由塑料材料制成。 此外，杯16的上侧杯部24的内壁面是从基体射出的处理液在其上撞击的部分被粗糙化为亲水性表面。

公开(公告)号：US20090199869A1

公开(公告)日：2009-08-13

申请号：US12427606

申请日：2009-04-21

申请人： Yoshikazu Kago ,  Masaki Iwami ,  Masahiro Nonomura

发明人： Yoshikazu Kago ,  Masaki Iwami ,  Masahiro Nonomura

IPC分类号： B08B7/00

CPC分类号： H01L21/67046 ,  B08B1/04

摘要： A substrate cleaning apparatus includes two cleaning brushes driven independently of each other. A first cleaning brush makes a cycling movement including an outward movement progressing in a horizontal direction from a position in contact with the center of the rotation of a substrate to the outside of an edge of the substrate, an upward movement progressing in a vertically upward direction from an end position of the outward movement, an inward movement progressing in a horizontal direction from an end position of the upward movement to a position immediately over the center of the rotation of the substrate, and a downward movement progressing in a vertically downward direction from an end position of the inward movement to a start position of the outward movement. A second cleaning brush makes a similar cycling movement. The first and second cleaning brushes are adapted so that the speed of the inward movement thereof is higher than that of the outward movement thereof and so that the speed of the upward movement is higher than that of the downward movement thereof.

摘要翻译： 基板清洗装置包括彼此独立地驱动的两个清洁刷。 第一清洁刷进行循环运动，包括从与基板的旋转中心接触的位置到基板的边缘的外侧在水平方向上向外运动的向外运动，向上运动沿垂直向上的方向 从向外移动的结束位置向内移动，从向上移动的结束位置向垂直于基板的旋转中心的位置在水平方向上进行向内运动，并且沿垂直向下的方向从向下移动 向内移动的结束位置到向外移动的开始位置。 第二个清洁刷子进行类似的循环运动。 第一和第二清洁刷适于使其向内移动的速度高于其向外移动的速度，并且使得向上移动的速度高于向下移动的速度。

公开(公告)号：US07311781B2

公开(公告)日：2007-12-25

申请号：US11256976

申请日：2005-10-25

申请人： Kentaro Tokuri ,  Kenya Morinishi ,  Masaki Iwami

发明人： Kentaro Tokuri ,  Kenya Morinishi ,  Masaki Iwami

IPC分类号： B05B15/04 ,  B05C11/02

CPC分类号： G03F7/162 ,  G03F7/3021 ,  H01L21/67051

摘要： An apparatus causes a substrate to rotate and supplies a treatment liquid to a substrate surface to make a treatment, without concern that a mixed substance is eluted from a cup in the use for a long time, or a thin film comes off from an inside wall surface to be contamination-causing substances even if the cup made of a water-repellent material for collecting a treatment liquid becomes hydrophilic. A cup 16 disposed to surround the sides and underside of a substrate W rotating while being held by a spin chuck 10, and serving to collect a treatment liquid diffused from the substrate to the surroundings, is made of a plastic material. Further, an inside wall surface of an upper-side cup part 24 of the cup 16, being a portion on which the treatment liquid having been diffused from the substrate impinges, is roughened to be a hydrophilic surface.

摘要翻译： 一种装置使基材旋转，并将处理液供给到基材表面进行处理，而不用担心长时间使用中的混合物质从杯中洗脱，或薄膜从内壁脱落 即使由用于收集处理液的防水材料制成的杯子变成亲水性，也是被污染物质的表面。 设置成围绕由旋转卡盘10保持的基板W的侧面和下侧设置并用于收集从基板扩散到周围的处理液体的杯16由塑料材料制成。 此外，杯16的上侧杯部24的内壁面是从基体射出的处理液在其上撞击的部分被粗糙化为亲水性表面。

公开(公告)号：US20050183754A1

公开(公告)日：2005-08-25

申请号：US11057003

申请日：2005-02-11

申请人： Yoshikazu Kago ,  Masaki Iwami ,  Masahiro Nonomura

发明人： Yoshikazu Kago ,  Masaki Iwami ,  Masahiro Nonomura

IPC分类号： H01L21/304 ,  B08B1/04 ,  H01L21/00 ,  B08B3/00

CPC分类号： H01L21/67046 ,  B08B1/04

摘要： A substrate cleaning apparatus includes two cleaning brushes driven independently of each other. A first cleaning brush makes a cycling movement including an outward movement progressing in a horizontal direction from a position in contact with the center of the rotation of a substrate to the outside of an edge of the substrate, an upward movement progressing in a vertically upward direction from an end position of the outward movement, an inward movement progressing in a horizontal direction from an end position of the upward movement to a position immediately over the center of the rotation of the substrate, and a downward movement progressing in a vertically downward direction from an end position of the inward movement to a start position of the outward movement. A second cleaning brush makes a similar cycling movement. The first and second cleaning brushes are adapted so that the speed of the inward movement thereof is higher than that of the outward movement thereof and so that the speed of the upward movement is higher than that of the downward movement thereof.

摘要翻译： 基板清洗装置包括彼此独立地驱动的两个清洁刷。 第一清洁刷进行循环运动，包括从与基板的旋转中心接触的位置到基板的边缘的外侧在水平方向上向外运动的向外运动，向上运动沿垂直向上的方向 从向外移动的结束位置向内移动，从向上移动的结束位置向垂直于基板的旋转中心的位置在水平方向上进行向内运动，并且沿垂直向下的方向从向下移动 向内移动的结束位置到向外移动的开始位置。 第二个清洁刷子进行类似的循环运动。 第一和第二清洁刷适于使其向内移动的速度高于其向外移动的速度，并且使得向上移动的速度高于向下移动的速度。