Periphery exposing apparatus and method
    3.
    发明授权
    Periphery exposing apparatus and method 失效
    周边曝光装置及方法

    公开(公告)号:US5982474A

    公开(公告)日:1999-11-09

    申请号:US868382

    申请日:1997-06-03

    IPC分类号: G03F7/20 G03B27/42 G03B27/48

    CPC分类号: G03F7/2026

    摘要: A method and apparatus for exposing a substrate to light perform the steps of inputting position data of a peripheral region along an outline of a chip region on a substrate, which has been placed on a spin chuck, detecting a reference position at an outer edge of the substrate inputting axial directions of the position data and aligning axial directions of an orthogonal shifting mechanism. Based on the position data inputted, light of an irradiator is shifted along the peripheral region to expose the peripheral region in a staggered way along the outline of the chip region. The method and apparatus may also perform the steps of inputting a shape of the chip region on the substrate as image information, deriving position data of the peripheral region along the outline of the chip region from the image information, and exposing the peripheral region to light based on the position data derived. The method and apparatus may also perform the steps of inputting shape information of the substrate, the chip region, and an area around a crossing point of scribe lines in the chip region on the substrate as image information, computing the positions of the peripheral region from the image information and the shape information of the substrate and the chip region; and exposing the peripheral region to light based on the positions of the computed peripheral region.

    摘要翻译: 用于将基板曝光的方法和装置执行以下步骤:沿着已经放置在旋转卡盘上的基板上沿着芯片区域的轮廓输入周边区域的位置数据,检测在外部边缘处的基准位置 基板输入位置数据的轴向和正交变换机构的对准轴向。 基于输入的位置数据,照射器的光沿着周边区域移动,沿着芯片区域的轮廓以交错的方式露出周边区域。 该方法和装置还可以执行以下步骤:在基板上输入芯片区域的形状作为图像信息,从图像信息导出沿着芯片区域轮廓的外围区域的位置数据,并将外围区域曝光 基于导出的位置数据。 该方法和装置还可以执行以下步骤:输入衬底的形状信息,芯片区域和衬底上的芯片区域中的划线的交叉点周围的区域作为图像信息,计算外围区域的位置 基板和芯片区域的图像信息和形状信息; 并且基于所计算的周边区域的位置将外围区域曝光。

    Apparatus for detecting position of a notch in a semiconductor wafer
    4.
    发明授权
    Apparatus for detecting position of a notch in a semiconductor wafer 失效
    用于检测半导体晶片中的凹口的位置的装置

    公开(公告)号:US5438209A

    公开(公告)日:1995-08-01

    申请号:US12346

    申请日:1993-02-02

    IPC分类号: G01D5/34 H01L21/68 G01N21/86

    CPC分类号: H01L21/681 G01D5/342

    摘要: A semiconductor wafer placed on a table is rotated by a stepper motor stepwise by a broad pitch. At this time, a CCD line sensor transmits output signals to comparators. A CPU monitors output signals of the comparators and detects a notch formed in the wafer. After the notch is detected, the wafer is rotated stepwise by a fine pitch, and outer peripheral positional data of a notched region (outputs of an analog-to-digital converter) are sampled and stored in a RAM. The CPU computes a notch position from the outer peripheral positional data stored in the RAM. In this way, a V-shaped notch formed in a semiconductor wafer is detected speedily and with high precision.

    摘要翻译: 放置在桌子上的半导体晶片由步进电机逐步旋转宽间距。 此时,CCD线传感器将输出信号发送到比较器。 CPU监视比较器的输出信号并检测在晶片中形成的凹口。 在检测到缺口之后,晶片以微细的间距逐步旋转,并且将缺口区域(模拟 - 数字转换器的输出)的外围位置数据采样并存储在RAM中。 CPU从存储在RAM中的外围位置数据计算切口位置。 以这种方式,快速且高精度地检测形成在半导体晶片中的V形缺口。

    Fuel filler structure for fuel tank

    公开(公告)号:US11167637B2

    公开(公告)日:2021-11-09

    申请号:US14390693

    申请日:2012-04-12

    IPC分类号: B60K15/04

    摘要: To obtain a fuel filler structure for a fuel tank wherein when causing an opening and closing valve to close, it can be ensured that the opening and closing valve does not rapidly rotate to a closed position in which it closes a fuel fill inlet, and when causing the opening and closing valve to open, the opening and closing valve can be opened with a small force. A fuel filler structure is equipped with a damper on the near side of a flapper valve in the insertion direction of a fuel nozzle. When the flapper valve rotates to an open position, the damper does not act on the flapper valve, and when the flapper valve rotates to a closed position, the damper acts on the flapper valve.

    Resist composition and method for producing resist pattern
    9.
    发明授权
    Resist composition and method for producing resist pattern 有权
    抗蚀剂组合物和抗蚀剂图案的制造方法

    公开(公告)号:US09291893B2

    公开(公告)日:2016-03-22

    申请号:US13281145

    申请日:2011-10-25

    IPC分类号: G03F7/004 G03F7/039 G03F7/20

    摘要: A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C24 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.

    摘要翻译: 抗蚀剂组合物含有 具有由式(aa)表示的结构单元的树脂和由式(ab)表示的结构单元; 和酸产生剂,其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键,任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C24脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

    Resist composition and method for producing resist pattern
    10.
    发明授权
    Resist composition and method for producing resist pattern 有权
    抗蚀剂组合物和抗蚀剂图案的制造方法

    公开(公告)号:US09229320B2

    公开(公告)日:2016-01-05

    申请号:US13196446

    申请日:2011-08-02

    IPC分类号: G03F7/004 G03F7/039 G03F7/20

    摘要: A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator represented by the formula (B1). wherein R1 represents a hydrogen atom or a methyl group; A10 represents a single bond, an optionally substituted C1 to C6 alkanediyl group or a group represented by formula (a-1) defined in the specification; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; A20 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; R2 in each occurrence independently represents a C1 to C12 perfluoroalkyl group; n represents 1 or 2; Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; Lb1 represents an optionally substituted C1 to C17 divalent aliphatic hydrocarbon group; Y represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; and Z+ represents an organic cation.

    摘要翻译: 抗蚀剂组合物含有 具有衍生自由式(a)表示的化合物的结构单元的树脂; 和由式(B1)表示的酸发生剂。 其中R1表示氢原子或甲基; A10表示单键,可以具有取代基的C1〜C6烷二基或由说明书中定义的式(a-1)表示的基团; W1表示任选取代的C4至C36脂环族烃基; A20每次独立地表示任选取代的C 1至C 6脂族烃基; R2各自独立地表示C1〜C12全氟烷基; n表示1或2; Q1和Q2独立地表示氟原子或C1〜C6全氟烷基; Lb1表示任选取代的C 1至C 17二价脂族烃基; Y表示任选取代的C 1至C 18脂族烃基; Z +表示有机阳离子。