公开(公告)号：US20110240224A1

公开(公告)日：2011-10-06

申请号：US13070115

申请日：2011-03-23

申请人： Akihiro YOSHIMURA ,  Tetsuji SATO ,  Masato HORIGUCHI ,  Nobuhiro WADA ,  Makoto KOBAYASHI ,  Hiroshi TSUJIMOTO ,  Jun TAMURA ,  Mamoru NAOI

发明人： Akihiro YOSHIMURA ,  Tetsuji SATO ,  Masato HORIGUCHI ,  Nobuhiro WADA ,  Makoto KOBAYASHI ,  Hiroshi TSUJIMOTO ,  Jun TAMURA ,  Mamoru NAOI

IPC分类号： H01L21/3065

CPC分类号： H01J37/32091 ,  H01J37/32568

摘要： Disclosed is a substrate processing apparatus capable of suppressing generation of plasma in the space between a moving electrode and an end wall at one side of a cylindrical chamber. The substrate processing apparatus includes a cylindrical chamber to receive a wafer, a shower head movable along a central axis of the chamber inside the chamber, a susceptor opposing the shower head in the chamber, and a flexible bellows connecting the shower head to a cover of the chamber, wherein a high frequency power is applied to a processing space presented between the shower head and the susceptor, processing gas is introduced into the processing space, the shower head and the side wall of the chamber are non-contact to each other, and a bypass member is installed electrically connecting the shower head and the cover or the side wall of the chamber.

摘要翻译： 公开了一种能够抑制在圆筒形室的一侧的移动电极与端壁之间的空间中产生等离子体的基板处理装置。 基板处理装置包括用于容纳晶片的圆柱形室，可沿着室内的室的中心轴线移动的喷头，与腔室中的淋浴喷头相对的基座，以及柔性波纹管，其将淋浴头连接到 所述室，其中向所述淋浴喷头和所述基座之间呈现的处理空间施加高频功率，将处理气体引入所述处理空间中，所述淋浴喷头和所述室的侧壁彼此不接触， 并且旁路部件被安装成电连接淋浴头和盖子或室的侧壁。

公开(公告)号：US20120247678A1

公开(公告)日：2012-10-04

申请号：US13437647

申请日：2012-04-02

申请人： Chikako TAKAHASHI ,  Takashi SUZUKI ,  Masato HORIGUCHI ,  Takashi Yamamoto

发明人： Chikako TAKAHASHI ,  Takashi SUZUKI ,  Masato HORIGUCHI ,  Takashi Yamamoto

IPC分类号： H01L21/687 ,  H01L21/3065

CPC分类号： H01J37/32633 ,  H01J37/32009 ,  H01J37/3244 ,  H01J37/32532 ,  H01L21/6831 ,  Y10T279/23

摘要： An electrode assembly of a plasma processing apparatus that enables damage to an electrode plate to be prevented, and enables an increase in the number of parts to be prevented, so that the ability to carry out maintenance can be easily maintained. An upper electrode assembly has an upper electrode plate, a cooling plate (C/P) and a spacer interposed between the upper electrode plate and the C/P. The upper electrode plate has therein electrode plate gas-passing holes that penetrate through the upper electrode plate. The C/P has therein C/P gas-passing holes that penetrate through the C/P. The spacer has therein spacer gas-passing holes that penetrate through the spacer. The electrode plate gas-passing holes, the C/P gas-passing holes and the spacer gas-passing holes are not disposed collinearly.

摘要翻译： 能够防止电极板损坏的等离子体处理装置的电极组件，能够增加要防止的部件数量，能够容易地维持进行维护的能力。 上电极组件具有上电极板，冷却板（C / P）和插入在上电极板和C / P之间的间隔件。 上电极板具有穿过上电极板的电极板气体通过孔。 C / P具有穿过C / P的C / P气体通过孔。 间隔件具有穿过间隔件的隔离气体通过孔。 电极板气体通过孔，C / P气体通过孔和隔离气体通过孔不共线设置。