公开(公告)号：US20110240224A1

公开(公告)日：2011-10-06

申请号：US13070115

申请日：2011-03-23

申请人： Akihiro YOSHIMURA ,  Tetsuji SATO ,  Masato HORIGUCHI ,  Nobuhiro WADA ,  Makoto KOBAYASHI ,  Hiroshi TSUJIMOTO ,  Jun TAMURA ,  Mamoru NAOI

发明人： Akihiro YOSHIMURA ,  Tetsuji SATO ,  Masato HORIGUCHI ,  Nobuhiro WADA ,  Makoto KOBAYASHI ,  Hiroshi TSUJIMOTO ,  Jun TAMURA ,  Mamoru NAOI

IPC分类号： H01L21/3065

CPC分类号： H01J37/32091 ,  H01J37/32568

摘要： Disclosed is a substrate processing apparatus capable of suppressing generation of plasma in the space between a moving electrode and an end wall at one side of a cylindrical chamber. The substrate processing apparatus includes a cylindrical chamber to receive a wafer, a shower head movable along a central axis of the chamber inside the chamber, a susceptor opposing the shower head in the chamber, and a flexible bellows connecting the shower head to a cover of the chamber, wherein a high frequency power is applied to a processing space presented between the shower head and the susceptor, processing gas is introduced into the processing space, the shower head and the side wall of the chamber are non-contact to each other, and a bypass member is installed electrically connecting the shower head and the cover or the side wall of the chamber.

摘要翻译： 公开了一种能够抑制在圆筒形室的一侧的移动电极与端壁之间的空间中产生等离子体的基板处理装置。 基板处理装置包括用于容纳晶片的圆柱形室，可沿着室内的室的中心轴线移动的喷头，与腔室中的淋浴喷头相对的基座，以及柔性波纹管，其将淋浴头连接到 所述室，其中向所述淋浴喷头和所述基座之间呈现的处理空间施加高频功率，将处理气体引入所述处理空间中，所述淋浴喷头和所述室的侧壁彼此不接触， 并且旁路部件被安装成电连接淋浴头和盖子或室的侧壁。

公开(公告)号：US20080239691A1

公开(公告)日：2008-10-02

申请号：US12055633

申请日：2008-03-26

申请人： Masaaki MIYAGAWA ,  Akihiro YOSHIMURA

发明人： Masaaki MIYAGAWA ,  Akihiro YOSHIMURA

IPC分类号： H05K7/02 ,  F28F7/00

CPC分类号： H01L21/67103 ,  H01J37/32091 ,  H01J37/32642 ,  H01J2237/2001 ,  H01L21/67005 ,  H01L21/67069 ,  H01L21/68735

摘要： A thermally conductive sheet is used between a mounting table for mounting thereon a target substrate and an annular focus ring mounted on the mounting table to surround a circumferential peripheral portion of the target substrate. Further, the mounting table includes therein a cooling unit and is disposed in a depressurized accommodating chamber for accommodating therein the target substrate. The thermally conductive sheet has a non-adhesive layer on each of one or more surfaces thereof.

摘要翻译： 在用于安装目标基板的安装台和安装在安装台上的环形聚焦环之间使用导热片以包围目标基板的圆周周边部分。 此外，安装台包括冷却单元，并且设置在减压容纳室中，用于容纳目标基板。 导热片在其一个或多个表面中的每一个上具有非粘性层。

公开(公告)号：US20170022929A1

公开(公告)日：2017-01-26

申请号：US15117867

申请日：2015-03-18

申请人： Takashi KARITA ,  Kazunari TAKENAKA ,  Shinsuke SUGIMOTO ,  Akihiro YOSHIMURA ,  Kazuaki NISHIO

发明人： Takashi KARITA ,  Kazunari TAKENAKA ,  Shinsuke SUGIMOTO ,  Akihiro YOSHIMURA ,  Kazuaki NISHIO

IPC分类号： F02F1/16 ,  F01P3/02 ,  F02F1/36

CPC分类号： F02F1/166 ,  F01P3/02 ,  F01P2003/021 ,  F02F1/14 ,  F02F1/36

摘要： A water jacket spacer is inserted into a water jacket. The water jacket spacer includes an expansion member, a plate-shaped holder to which the expansion member is fixed, and a leaf spring that abuts the inner wall of the water jacket. The leaf spring projects from a face on the holder on the side opposite of the expansion member. The holder curves to match the shape of the water jacket. The position of the water jacket spacer in the water jacket is maintained by the biasing force of the leaf spring.

摘要翻译： 水夹套插入水套中。 水套隔套包括膨胀构件，固定有膨胀构件的板状保持器和与水套的内壁抵接的板簧。 板簧从支架的与膨胀构件相对的一侧的面突出。 支架曲线以匹配水套的形状。 水套间隔件在水套中的位置由板簧的偏置力保持。