公开(公告)号：US20090042325A1

公开(公告)日：2009-02-12

申请号：US12246099

申请日：2008-10-06

申请人： Akira Fujimoto ,  Koji Asakawa ,  Kenichi Ohashi

发明人： Akira Fujimoto ,  Koji Asakawa ,  Kenichi Ohashi

IPC分类号： H01L21/02

CPC分类号： H01L33/22

摘要： In a semiconductor light emitting device, a semiconductor light emitting element has a light extracted surface on which a plurality of convex structures is formed. The convex structures each have a conical mesa portion constituting a refractive index gradient structure, a cylindrical portion constituting a diffraction grating structure, and a conical portion constituting a refractive index gradient structure. The mesa portion, cylindrical portion, and conical portion are arranged in this order from the light extracted surface. The period between the convex structures is longer than 1/(the refractive index of an external medium+the refractive index of the convex structures) of an emission wavelength and equal to or shorter than the emission wavelength. The circle-equivalent average diameter of the cylindrical portion is ⅓ to 9/10 of that of the bottom of the mesa portion.

摘要翻译： 在半导体发光器件中，半导体发光元件具有在其上形成有多个凸起结构的光提取表面。 凸起结构各自具有构成折射率梯度结构的圆锥台面部分，构成衍射光栅结构的圆筒部分和构成折射率梯度结构的锥形部分。 台面部分，圆柱形部分和锥形部分从光提取表面依次排列。 凸结构之间的周期长于发射波长的1 /（外部介质的折射率+凸起结构的折射率）等于或小于发射波长。 圆筒部的圆当量平均直径为台面部的底部的圆当量平均直径的1/3〜9/10。

公开(公告)号：US20050233483A1

公开(公告)日：2005-10-20

申请号：US11056094

申请日：2005-02-14

申请人： Koji Asakawa ,  Kenichi Ohashi ,  Akira Fujimoto ,  Takashi Sasaki

发明人： Koji Asakawa ,  Kenichi Ohashi ,  Akira Fujimoto ,  Takashi Sasaki

IPC分类号： C08F220/28 ,  H01L21/00 ,  H01L21/306 ,  H01L21/308 ,  H01L21/78 ,  H01L33/22

CPC分类号： H01L21/78 ,  C08F220/28 ,  H01L21/30608 ,  H01L21/3081 ,  H01L21/67086 ,  H01L33/22

摘要： Disclosed is an acid etching resistance material comprising a compound having a repeating unit represented by the following general formula (1): (in the general formula (1), R1 is a hydrogen atom or methyl group; R3 is a cyclic group selected from an alicyclic group and an aromatic group; R4 is a polar group; R2 is a group represented by the following general formula (2); and j is 0 or 1): (in the general formula (2), R5 is a hydrogen atom or methyl group).

摘要翻译： 公开了一种耐酸腐蚀性材料，其包含具有由以下通式（1）表示的重复单元的化合物：（在通式（1）中，R 1是氢原子或甲基; R 3是选自脂环族基团和芳族基团的环状基团; R 4是极性基团; R 2是代表的基团 由通式（2）表示，j为0或1）:(通式（2）中，R 5为氢原子或甲基）。

公开(公告)号：US07476910B2

公开(公告)日：2009-01-13

申请号：US11220637

申请日：2005-09-08

申请人： Akira Fujimoto ,  Koji Asakawa ,  Kenichi Ohashi

发明人： Akira Fujimoto ,  Koji Asakawa ,  Kenichi Ohashi

IPC分类号： H01L29/06

CPC分类号： H01L33/22

摘要： In a semiconductor light emitting device, a semiconductor light emitting element has a light extracted surface on which a plurality of convex structures is formed. The convex structures each have a conical mesa portion constituting a refractive index gradient structure, a cylindrical portion constituting a diffraction grating structure, and a conical portion constituting a refractive index gradient structure. The mesa portion, cylindrical portion, and conical portion are arranged in this order from the light extracted surface. The period between the convex structures is longer than 1/(the refractive index of an external medium+the refractive index of the convex structures) of an emission wavelength and equal to or shorter than the emission wavelength. The circle-equivalent average diameter of the cylindrical portion is ⅓ to 9/10 of that of the bottom of the mesa portion.

摘要翻译： 在半导体发光器件中，半导体发光元件具有在其上形成有多个凸起结构的光提取表面。 凸起结构各自具有构成折射率梯度结构的圆锥台面部分，构成衍射光栅结构的圆筒部分和构成折射率梯度结构的锥形部分。 台面部分，圆柱形部分和锥形部分从光提取表面依次排列。 凸结构之间的周期长于发射波长的1 /（外部介质的折射率+凸起结构的折射率）等于或小于发射波长。 圆筒部的圆当量平均直径为台面部的底部的圆当量平均直径的1/3〜9/10。

公开(公告)号：US07037738B2

公开(公告)日：2006-05-02

申请号：US10346108

申请日：2003-01-17

申请人： Hitoshi Sugiyama ,  Kenichi Ohashi ,  Atsuko Yamashita ,  Shoichi Washizuka ,  Yasuhiko Akaike ,  Shunji Yoshitake ,  Koji Asakawa ,  Katsumi Egashira ,  Akira Fujimoto

发明人： Hitoshi Sugiyama ,  Kenichi Ohashi ,  Atsuko Yamashita ,  Shoichi Washizuka ,  Yasuhiko Akaike ,  Shunji Yoshitake ,  Koji Asakawa ,  Katsumi Egashira ,  Akira Fujimoto

IPC分类号： H01L21/00

CPC分类号： H01L33/22

摘要： There is disclosed a semiconductor light-emitting element comprising a substrate having a first surface and a second surface, a semiconductor laminate formed on the first surface of the substrate and containing a light-emitting layer and a current diffusion layer having a light-extracting surface. The light-emitting element is provided with a light-extracting surface which is constituted by a finely recessed/projected surface, 90% of which is constructed such that the height of the projected portion thereof having a cone-like configuration is 100 nm or more, and the width of the base of the projected portion is within the range of 10-500 nm.

摘要翻译： 公开了一种半导体发光元件，包括具有第一表面和第二表面的基板，形成在基板的第一表面上并包含发光层的半导体层叠体和具有光提取表面的电流扩散层 。 发光元件设置有由精细凹入/突出表面构成的光提取表面，其90％构造成使得其具有锥形构造的突出部分的高度为100nm以上 ，突出部的基部的宽度在10〜500nm的范围内。

公开(公告)号：US20100160589A1

公开(公告)日：2010-06-24

申请号：US12716401

申请日：2010-03-03

申请人： Koji ASAKAWA ,  Kenichi Ohashi ,  Akira Fujimoto ,  Takashi Sasaki

发明人： Koji ASAKAWA ,  Kenichi Ohashi ,  Akira Fujimoto ,  Takashi Sasaki

IPC分类号： C08F222/10

CPC分类号： H01L21/78 ,  C08F220/28 ,  H01L21/30608 ,  H01L21/3081 ,  H01L21/67086 ,  H01L33/22

摘要： Disclosed is an acid etching resistance material comprising a compound having a repeating unit represented by the following general formula (1): (in the general formula (1), R1 is a hydrogen atom or methyl group; R3 is a cyclic group selected from an alicyclic group and an aromatic group; R4 is a polar group; R2 is a group represented by the following general formula (2); and j is 0 or 1): (in the general formula (2), R5 is a hydrogen atom or methyl group).

摘要翻译： 公开了一种耐酸腐蚀性材料，其包含具有由以下通式（1）表示的重复单元的化合物：（在通式（1）中，R 1为氢原子或甲基; R 3为选自 脂环族基团和芳香族基团; R4为极性基团，R2为下述通式（2）表示的基团，j为0或1）:(通式（2）中，R 5为氢原子或 甲基）。

公开(公告)号：US07445881B2

公开(公告)日：2008-11-04

申请号：US11679660

申请日：2007-02-27

申请人： Koji Asakawa ,  Kenichi Ohashi ,  Akira Fujimoto ,  Takashi Sasaki

发明人： Koji Asakawa ,  Kenichi Ohashi ,  Akira Fujimoto ,  Takashi Sasaki

IPC分类号： G03C1/00 ,  G03C7/00

CPC分类号： H01L21/78 ,  C08F220/28 ,  H01L21/30608 ,  H01L21/3081 ,  H01L21/67086 ,  H01L33/22

摘要： Disclosed is an acid etching resistance material comprising a compound having a repeating unit represented by the following general formula (1): (in the general formula (1), R1 is a hydrogen atom or methyl group; R3 is a cyclic group selected from an alicyclic group and an aromatic group; R4 is a polar group; R2 is a group represented by the following general formula (2); and j is 0 or 1): (in the general formula (2), R5 is a hydrogen atom or methyl group).

摘要翻译： 公开了一种耐酸腐蚀性材料，其包含具有由以下通式（1）表示的重复单元的化合物：（在通式（1）中，R 1是氢原子或甲基; R 3是选自脂环族基团和芳族基团的环状基团; R 4是极性基团; R 2是代表的基团 由通式（2）表示，j为0或1）:(通式（2）中，R 5为氢原子或甲基）。

公开(公告)号：US20070142592A1

公开(公告)日：2007-06-21

申请号：US11679754

申请日：2007-02-27

申请人： Koji Asakawa ,  Kenichi Ohashi ,  Akira Fujimoto ,  Takashi Sasaki

发明人： Koji Asakawa ,  Kenichi Ohashi ,  Akira Fujimoto ,  Takashi Sasaki

IPC分类号： C08F222/14 ,  C08F22/14

CPC分类号： H01L21/78 ,  C08F220/28 ,  H01L21/30608 ,  H01L21/3081 ,  H01L21/67086 ,  H01L33/22

摘要： Disclosed is an acid etching resistance material comprising a compound having a repeating unit represented by the following general formula (1): (in the general formula (1), R1 is a hydrogen atom or methyl group; R3 is a cyclic group selected from an alicyclic group and an aromatic group; R4 is a polar group; R2 is a group represented by the following general formula (2); and j is 0 or 1): (in the general formula (2), R5 is a hydrogen atom or methyl group).

公开(公告)号：US20070138139A1

公开(公告)日：2007-06-21

申请号：US11679660

申请日：2007-02-27

申请人： Koji Asakawa ,  Kenichi Ohashi ,  Akira Fujimoto ,  Takashi Sasaki

发明人： Koji Asakawa ,  Kenichi Ohashi ,  Akira Fujimoto ,  Takashi Sasaki

IPC分类号： H01B13/00 ,  B44C1/22 ,  C03C15/00

CPC分类号： H01L21/78 ,  C08F220/28 ,  H01L21/30608 ,  H01L21/3081 ,  H01L21/67086 ,  H01L33/22

摘要： Disclosed is an acid etching resistance material comprising a compound having a repeating unit represented by the following general formula (1): (in the general formula (1), R1 is a hydrogen atom or methyl group; R3 is a cyclic group selected from an alicyclic group and an aromatic group; R4 is a polar group; R2 is a group represented by the following general formula (2); and j is 0 or 1): (in the general formula (2), R5 is a hydrogen atom or methyl group).

摘要翻译： 公开了一种耐酸腐蚀性材料，其包含具有由以下通式（1）表示的重复单元的化合物：（在通式（1）中，R 1是氢原子或甲基; R 3是选自脂环族基团和芳族基团的环状基团; R 4是极性基团; R 2是代表的基团 由通式（2）表示，j为0或1）:(通式（2）中，R 5为氢原子或甲基）。

公开(公告)号：US20050145864A1

公开(公告)日：2005-07-07

申请号：US11054409

申请日：2005-02-10

申请人： Hitoshi Sugiyama ,  Kenichi Ohashi ,  Atsuko Yamashita ,  Shoichi Washizuka ,  Yasuhiko Akaike ,  Shunji Yoshitake ,  Koji Asakawa ,  Katsumi Egashira ,  Akira Fujimoto

发明人： Hitoshi Sugiyama ,  Kenichi Ohashi ,  Atsuko Yamashita ,  Shoichi Washizuka ,  Yasuhiko Akaike ,  Shunji Yoshitake ,  Koji Asakawa ,  Katsumi Egashira ,  Akira Fujimoto

IPC分类号： H01L21/302 ,  H01L33/06 ,  H01L33/14 ,  H01L33/22 ,  H01L33/32 ,  H01L33/00 ,  H01L21/00

CPC分类号： H01L33/22

摘要： There is disclosed a semiconductor light-emitting element comprising a substrate having a first surface and a second surface, a semiconductor laminate formed on the first surface of the substrate and containing a light-emitting layer and a current diffusion layer having a light-extracting surface. The light-emitting element is provided with a light-extracting surface which is constituted by a finely recessed/projected surface, 90% of which is constructed such that the height of the projected portion thereof having a cone-like configuration is 100 nm or more, and the width of the base of the projected portion is within the range of 10-500 nm.

摘要翻译： 公开了一种半导体发光元件，包括具有第一表面和第二表面的基板，形成在基板的第一表面上并包含发光层的半导体层叠体和具有光提取表面的电流扩散层 。 发光元件设置有由精细凹入/突出表面构成的光提取表面，其90％构造成使得其具有锥形构造的突出部分的高度为100nm以上 ，突出部的基部的宽度在10〜500nm的范围内。

公开(公告)号：US07179672B2

公开(公告)日：2007-02-20

申请号：US10976987

申请日：2004-11-01

申请人： Koji Asakawa ,  Akira Fujimoto ,  Hitoshi Sugiyama ,  Kenichi Ohashi ,  Kenji Suzuki ,  Junichi Tonotani

发明人： Koji Asakawa ,  Akira Fujimoto ,  Hitoshi Sugiyama ,  Kenichi Ohashi ,  Kenji Suzuki ,  Junichi Tonotani

IPC分类号： H01L21/00

CPC分类号： H01L33/22 ,  H01L21/0271

摘要： A nanometer size roughened structure is formed on a surface of a light-emitting element, and luminous efficiency is improved.The roughened structure on the surface of the light-emitting element of the invention is formed into the following shape such that the refractive index smoothly changes: (1) the mean diameter of projections on the roughened surface is smaller than the light wavelength; (2) a pitch of the roughened surface is irregular; and (3) positions of the top and bottom of the roughened surface are distributed from their mean values within the light wavelength in order to give a smooth gradient of the refractive index. The surface of such light-emitting element is obtained by forming a thin film on the surface of the light-emitting element using a resin composition which contains a block copolymer or graft copolymer and forms a micophase-separated structure in a self-organization manner; selectively removing at least one phase of the microphase-separated structure of the thin film formed on the surface; and etching the surface of the light-emitting element using the remaining phase as an etching mask.

摘要翻译： 在发光元件的表面上形成纳米尺寸的粗糙结构，并提高发光效率。 本发明的发光元件表面上的粗糙结构形成为以下形状，使得折射率平滑地变化：（1）粗糙面上的突起的平均直径小于光波长; （2）粗糙表面的间距不规则; 和（3）粗糙表面的顶部和底部的位置从其在光波长内的平均值分布，以便给出折射率的平滑梯度。 这种发光元件的表面通过使用含有嵌段共聚物或接枝共聚物的树脂组合物在发光元件的表面上形成薄膜而以自组织形式形成微晶相分离结构而获得; 选择性地除去形成在表面上的薄膜的微相分离结构的至少一个相; 并使用剩余的相作为蚀刻掩模蚀刻发光元件的表面。