公开(公告)号：US20080186438A1

公开(公告)日：2008-08-07

申请号：US12026085

申请日：2008-02-05

申请人： Akira Sakai ,  Toshiaki Aiba ,  Yohei Ishida

发明人： Akira Sakai ,  Toshiaki Aiba ,  Yohei Ishida

IPC分类号： G02F1/1337 ,  G02F1/13

CPC分类号： G02F1/133734 ,  G02F1/1303

摘要： A first film is formed on a substrate by oblique deposition and thereafter a second film is formed on the first film by sputtering.

摘要翻译： 通过倾斜沉积在基板上形成第一膜，然后通过溅射在第一膜上形成第二膜。

公开(公告)号：US20090109387A1

公开(公告)日：2009-04-30

申请号：US12295692

申请日：2007-11-29

申请人： Akira Sakai ,  Hirokatsu Miyata ,  Yasufumi Asao ,  Yohei Ishida ,  Philip J. Martin ,  Avi Bendavid

发明人： Akira Sakai ,  Hirokatsu Miyata ,  Yasufumi Asao ,  Yohei Ishida ,  Philip J. Martin ,  Avi Bendavid

IPC分类号： G02F1/1337

CPC分类号： G02F1/133734

摘要： A manufacturing method of a liquid crystal optical device is provided including an alignment film forming step of forming an alignment film containing silicon oxide on a substrate, and a liquid crystal cell forming step of disposing a pair of substrates at least one of which the alignment film has been formed on, opposite to each other interposing a liquid crystal therebetween. In the alignment film forming step, the substrate surface is bombarded with a plasma beam generated by vacuum arc discharge using a cathode containing silicon, where the substrate is disposed on the course of the plasma beam obliquely with an angle. When the plasma beam bombards the substrate surface, plasma ions in the plasma beam have higher kinetic energy or higher flux density than plasma ions in a plasma beam which, if bombarding the substrate obliquely at the angle, form a film having a column structure.

摘要翻译： 提供了一种液晶光学器件的制造方法，包括：在基板上形成含有氧化硅的取向膜的取向膜形成工序;以及液晶单元形成工序，配置一对基板，至少其中一个取向膜 彼此相对地形成在其间插入液晶。 在取向膜形成步骤中，使用包含硅的阴极通过真空电弧放电产生的等离子体束来轰击衬底表面，其中衬底以等角度倾斜地设置在角度上。 当等离子体束轰击衬底表面时，等离子体束中的等离子体离子具有比等离子体束中的等离子体离子更高的动能或更高的通量密度，如果以倾斜方式以该角度轰击衬底，则其形成具有柱结构的膜。

公开(公告)号：US20100181013A1

公开(公告)日：2010-07-22

申请号：US12090275

申请日：2008-03-03

申请人： Yohei Ishida ,  Hirokatsu Miyata ,  Akira Sakai ,  Yasufumi Asao

发明人： Yohei Ishida ,  Hirokatsu Miyata ,  Akira Sakai ,  Yasufumi Asao

IPC分类号： B32B37/00 ,  B05D5/12 ,  B05D3/06

CPC分类号： G02F1/133734 ,  C23C14/0031 ,  C23C14/225 ,  G02F1/13378

摘要： A method of forming a film on a substrate is constituted by a step of depositing a material vaporized from an evaporation source onto a surface of a substrate while inclining the surface of the substrate with respect to a direction from the evaporation source to the substrate, and a step of providing the surface of the substrate with an energy depending on a deposition angle.

摘要翻译： 在基板上形成膜的方法由以下步骤构成：将从蒸发源蒸发的材料沉积到基板的表面上，同时使基板的表面相对于从蒸发源到基板的方向倾斜，并且 提供基板沉积角度的能量的步骤。

公开(公告)号：US20090324845A1

公开(公告)日：2009-12-31

申请号：US12493202

申请日：2009-06-28

申请人： Yohei Ishida ,  Hirokatsu Miyata ,  Akira Sakai

发明人： Yohei Ishida ,  Hirokatsu Miyata ,  Akira Sakai

IPC分类号： C23C14/08

CPC分类号： C23C14/226 ,  C23C14/08 ,  C23C14/5833

摘要： A method for producing an orientation film that causes orientation of a liquid crystal includes a process of vapor depositing an inorganic oxide from an oblique direction on a substrate and forming an obliquely vapor-deposited film composed of a plurality of columnar structural bodies tilted at an angle equal to or greater than 20° from a substrate normal and a process of performing ion beam irradiation onto the plurality of columnar structural bodies constituting the obliquely vapor-deposited film. An ion beam irradiation direction in the ion beam irradiation process is in a plane including a vapor deposition direction of the inorganic oxide and the substrate normal and an angle of the ion beam irradiation direction θIB measured from the direction of the columnar structural bodies is within a range of +50°≦θIB≦+100° (θIB is taken to be positive on a side where the ion beam irradiation direction approaches the substrate normal from the direction of the columnar structural bodies).

摘要翻译： 用于制造引起液晶取向的取向膜的方法包括在基板上从倾斜方向蒸镀无机氧化物的工序，形成由倾斜角度的多个柱状结构体构成的斜向蒸镀膜 与基板法线等于或大于20°，以及对构成倾斜蒸镀膜的多个柱状结构体进行离子束照射的工序。 离子束照射工序中的离子束照射方向为包括无机氧化物的蒸镀方向和基板法线的平面，从柱状结构体的方向测定的离子束照射方向θIB的角度在 + 50°<=θIB<= + 100°的范围（在离子束照射方向从柱状结构体的方向接近衬底法线的一侧，θIB被取为正）。

公开(公告)号：US08102491B2

公开(公告)日：2012-01-24

申请号：US12496201

申请日：2009-07-01

申请人： Yohei Ishida ,  Akira Sakai

发明人： Yohei Ishida ,  Akira Sakai

IPC分类号： G02F1/1337 ,  G02F1/139

CPC分类号： G02F1/1337 ,  G02F1/1395 ,  G02F2001/133388

摘要： A liquid crystal apparatus includes a display region in which electrodes are disposed in a matrix pattern, a non-display region provided at a periphery of the display region, and a liquid crystal disposed in the display region and non-display region. The liquid crystal disposed in the display region is splay-aligned when a voltage is not applied and bend-aligned when the voltage is applied. The liquid crystal disposed in the non-display region is bend-aligned. The apparatus also includes an alignment film including an inorganic material provided in at least one of a pair of substrates. The thickness of the alignment film provided in the display region is smaller than the thickness of the alignment film provided in the non-display region.

摘要翻译： 液晶装置包括电极以矩阵状配置的显示区域，设置在显示区域的周围的非显示区域以及配置在显示区域和非显示区域中的液晶。 当施加电压时施加在显示区域中的液晶被显示对准，并且在施加电压时弯曲取向。 设置在非显示区域中的液晶是弯曲对准的。 该设备还包括一个包括设置在一对基板中的至少一个中的无机材料的取向膜。 设置在显示区域中的取向膜的厚度小于设置在非显示区域中的取向膜的厚度。

公开(公告)号：US20100219064A1

公开(公告)日：2010-09-02

申请号：US12096747

申请日：2008-03-03

申请人： Akira Sakai ,  Yasufumi Asao ,  Yohei Ishida ,  Yoichi Hoshi ,  Kensuke Yagi

发明人： Akira Sakai ,  Yasufumi Asao ,  Yohei Ishida ,  Yoichi Hoshi ,  Kensuke Yagi

IPC分类号： C23C14/34

CPC分类号： G02F1/133734 ,  C23C14/0036 ,  C23C14/10 ,  C23C14/226

摘要： A film forming method is constituted by forming a silicon oxide film on a substrate by causing silicon generated by sputtering with silicon as a target to be incident on the substrate from an oblique direction while supplying oxygen gas onto the substrate.

摘要翻译： 成膜方法是通过在硅上作为靶从溅射而产生的硅从倾斜方向入射到基板上而在基板上形成氧化硅膜，同时向基板供给氧气。

公开(公告)号：US20100007831A1

公开(公告)日：2010-01-14

申请号：US12496201

申请日：2009-07-01

申请人： Yohei Ishida ,  Akira Sakai

发明人： Yohei Ishida ,  Akira Sakai

IPC分类号： G02F1/1337 ,  G02F1/13

CPC分类号： G02F1/1337 ,  G02F1/1395 ,  G02F2001/133388

摘要： Provided is a liquid crystal apparatus that includes a display region in which electrodes are disposed in a matrix pattern and a non-display region provided at a periphery of the display region and has a liquid crystal disposed in the display region and non-display region, wherein the liquid crystal disposed in the display region is splay-aligned when a voltage is not applied and bend-aligned when the voltage is applied, the liquid crystal disposed in the non-display region is bend-aligned, an alignment film including an inorganic material is provided in at least one of a pair of substrates, and a thickness of the alignment film provided in the display region is smaller than a thickness of the alignment film provided in the non-display region.

摘要翻译： 本发明提供一种液晶装置，其具有：电极以矩阵状配置的显示区域和设置在显示区域的周围的非显示区域，并具有配置在显示区域和非显示区域中的液晶， 其中，当施加电压而在施加电压时被弯曲取向的情况下，在显示区域中设置的液晶被显示排列，设置在非显示区域中的液晶是弯曲取向的，包括无机的取向膜 材料设置在一对基板中的至少一个中，并且设置在显示区域中的取向膜的厚度小于设置在非显示区域中的取向膜的厚度。

公开(公告)号：US20090257013A1

公开(公告)日：2009-10-15

申请号：US12442461

申请日：2008-06-05

申请人： Akira Sakai ,  Yohei Ishida ,  Yasufumi Asao ,  Hirokatsu Miyata ,  Philip J. Martin

发明人： Akira Sakai ,  Yohei Ishida ,  Yasufumi Asao ,  Hirokatsu Miyata ,  Philip J. Martin

IPC分类号： G02F1/1337 ,  G02F1/13

CPC分类号： G02F1/133734 ,  C23C14/0605 ,  C23C14/325 ,  G02F2001/133738 ,  H01J37/32055

摘要： A liquid crystal device has a pair of substrates, an alignment film formed at least on one of the pair of substrates and liquid crystal showing an orientation defined by the alignment film. The alignment film is a carbon film having a cross-sectional structure inclined relative to the direction of the film thickness by a constant angle.

摘要翻译： 液晶装置具有一对基板，形成在一对基板中的至少一个基板上的取向膜和显示由取向膜限定的取向的液晶。 取向膜是具有相对于膜厚方向以一定角度倾斜的截面结构的碳膜。

公开(公告)号：US20120223240A1

公开(公告)日：2012-09-06

申请号：US13366066

申请日：2012-02-03

申请人： Tomoaki Ichimura ,  Satoshi Okada ,  Kazumi Nagano ,  Keiichi Nomura ,  Yohei Ishida ,  Yoshito Sasaki ,  Akiya Nakayama

发明人： Tomoaki Ichimura ,  Satoshi Okada ,  Kazumi Nagano ,  Keiichi Nomura ,  Yohei Ishida ,  Yoshito Sasaki ,  Akiya Nakayama

IPC分类号： G01T1/20 ,  B32B37/02 ,  B32B37/14 ,  B32B9/00

CPC分类号： G21K4/00 ,  G01T1/2002 ,  H01L27/1462 ,  H01L27/14658

摘要： A radiation detection apparatus comprising a sensor panel and a scintillator panel is provided. The scintillator panel including a substrate, a scintillator disposed on the substrate, and a scintillator protective film that has a first organic protective layer and an inorganic protective layer, and covers the scintillator. The scintillator protective film is located between the sensor panel and the scintillator. The first organic protective layer is located on a scintillator side from the inorganic protective layer. A surface on a sensor panel side of the scintillator is partially in contact with the inorganic protective layer.

摘要翻译： 提供一种包括传感器面板和闪烁体面板的放射线检测装置。 闪烁体面板包括基板，设置在基板上的闪烁体和具有第一有机保护层和无机保护层的闪烁体保护膜，并且覆盖闪烁体。 闪烁体保护膜位于传感器面板和闪烁体之间。 第一有机保护层位于与无机保护层相反的闪烁体一侧。 闪烁体的传感器面板侧的表面部分地与无机保护层接触。

公开(公告)号：US20120219115A1

公开(公告)日：2012-08-30

申请号：US13371547

申请日：2012-02-13

申请人： Satoshi Okada ,  Kazumi Nagano ,  Keiichi Nomura ,  Yohei Ishida ,  Yoshito Sasaki ,  Tomoaki Ichimura

发明人： Satoshi Okada ,  Kazumi Nagano ,  Keiichi Nomura ,  Yohei Ishida ,  Yoshito Sasaki ,  Tomoaki Ichimura

IPC分类号： G01N23/04

CPC分类号： A61B6/4233 ,  A61B6/0407 ,  A61B6/42 ,  A61B6/4429 ,  A61B6/502 ,  A61B6/587

摘要： A radiation imaging apparatus includes a sensor which is placed in an internal space in the chassis and detects radiation. The apparatus includes a positioning mechanism which moves the sensor in the internal space to determine a position where radiation is detected, so as to change an area where radiation imaging is performed by detecting radiation using the sensor.

摘要翻译： 辐射成像装置包括放置在底盘的内部空间并检测辐射的传感器。 该装置包括定位机构，其使传感器在内部空间中移动以确定检测到辐射的位置，以便通过使用传感器检测辐射来改变进行辐射成像的区域。