Recording drive waveform adjusting method for manufacturing master disc, master disc manufacturing method, master disc manufacturing apparatus, and master disc
    1.
    发明授权
    Recording drive waveform adjusting method for manufacturing master disc, master disc manufacturing method, master disc manufacturing apparatus, and master disc 失效
    用于制造母盘,母盘制造方法,母盘制造装置和母盘的记录驱动波形调节方法

    公开(公告)号:US08089843B2

    公开(公告)日:2012-01-03

    申请号:US12166974

    申请日:2008-07-02

    IPC分类号: G11B7/007

    CPC分类号: G11B7/00456 G11B7/261

    摘要: A recording drive waveform adjusting method for manufacturing a master disc is provided. The method includes forming an exposed area in an inorganic resist layer for test exposure by irradiating a master disc having the inorganic resist layer with laser light of a recording power based on a recording drive waveform according to a test recording signal. The method also includes obtaining reflected-light information by irradiating the exposed area formed in the test exposure with laser light of a reproducing power, determining whether the recording drive waveform is appropriate by using the reflected-light information, and correcting the recording drive waveform if the recording drive waveform is determined to be inappropriate in the determination.

    摘要翻译: 提供一种用于制造母盘的记录驱动波形调节方法。 该方法包括根据测试记录信号,通过用基于记录驱动波形的具有记录功率的激光照射具有无机抗蚀剂层的母盘,在用于测试曝光的无机抗蚀剂层中形成曝光区域。 该方法还包括通过用再现功率的激光照射在测试曝光中形成的曝光区域来获得反射光信息,通过使用反射光信息确定记录驱动波形是否合适,并且如果 在确定中确定记录驱动波形不合适。

    Exposure apparatus and exposure method
    2.
    发明申请
    Exposure apparatus and exposure method 审中-公开
    曝光装置和曝光方法

    公开(公告)号:US20110207035A1

    公开(公告)日:2011-08-25

    申请号:US12932033

    申请日:2011-02-16

    IPC分类号: G03F7/20 G03B27/52

    摘要: An exposure apparatus includes an exposure unit selectively performing exposure on a resist layer with a first laser beam, focused by a lens system, in a pattern including pits and lands arranged in a scanning direction; a detecting unit detecting a reflection of a second laser beam applied through the lens system to the resist layer selectively exposed to the first laser beam, the second laser beam being produced by changing a focal length of the lens system such that the resist layer is prevented from responding thereto; a calculating unit calculating, from a result of the detection, a displacement between center axes of signal waveforms representing beams reflected from first and second portions of the pattern having a smallest width and a larger width, respectively; a setting unit setting the focal length of the lens system to such a value that the displacement is maximal; and a control unit controlling the exposure unit to expose the resist layer to the first laser beam focused with the focal length set by the setting unit.

    摘要翻译: 曝光装置包括曝光单元,其以包括沿扫描方向布置的凹坑和平台的图案以由透镜系统聚焦的第一激光束选择性地对抗蚀剂层进行曝光; 检测单元,其检测通过透镜系统施加的第二激光束对选择性地暴露于第一激光束的抗蚀剂层的反射,第二激光束是通过改变透镜系统的焦距而产生的,以防止抗蚀剂层 从响应; 计算单元,从所述检测结果计算分别表示从具有最小宽度和较大宽度的图案的第一和第二部分反射的光束的信号波形的中心轴之间的位移; 设置单元,将透镜系统的焦距设定为位移最大的值; 以及控制单元,其控制所述曝光单元将所述抗蚀剂层暴露于由所述设定单元设定的所述焦距聚焦的所述第一激光束。

    RECORDING DRIVE WAVEFORM ADJUSTING METHOD FOR MANUFACTURING MASTER DISC, MASTER DISC MANUFACTURING METHOD, MASTER DISC MANUFACTURING APPARATUS, AND MASTER DISC
    3.
    发明申请
    RECORDING DRIVE WAVEFORM ADJUSTING METHOD FOR MANUFACTURING MASTER DISC, MASTER DISC MANUFACTURING METHOD, MASTER DISC MANUFACTURING APPARATUS, AND MASTER DISC 失效
    用于制造主盘,主盘制造方法,主盘制造装置和主盘的记录驱动波形调整方法

    公开(公告)号:US20090041933A1

    公开(公告)日:2009-02-12

    申请号:US12166974

    申请日:2008-07-02

    IPC分类号: B05D5/06

    CPC分类号: G11B7/00456 G11B7/261

    摘要: A recording drive waveform adjusting method for manufacturing a master disc is provided. The method includes forming an exposed area in an inorganic resist layer for test exposure by irradiating a master disc having the inorganic resist layer with laser light of a recording power based on a recording drive waveform according to a test recording signal. The method also includes obtaining reflected-light information by irradiating the exposed area formed in the test exposure with laser light of a reproducing power, determining whether the recording drive waveform is appropriate by using the reflected-light information, and correcting the recording drive waveform if the recording drive waveform is determined to be inappropriate in the determination.

    摘要翻译: 提供一种用于制造母盘的记录驱动波形调节方法。 该方法包括根据测试记录信号,通过用基于记录驱动波形的具有记录功率的激光照射具有无机抗蚀剂层的母盘,在用于测试曝光的无机抗蚀剂层中形成曝光区域。 该方法还包括通过用再现功率的激光照射在测试曝光中形成的曝光区域来获得反射光信息,通过使用反射光信息确定记录驱动波形是否合适,并且如果 在确定中确定记录驱动波形不合适。

    Master strategy adjustment method and disc manufacturing method
    4.
    发明授权
    Master strategy adjustment method and disc manufacturing method 失效
    主要策略调整方法及盘片制造方法

    公开(公告)号:US08582410B2

    公开(公告)日:2013-11-12

    申请号:US13411975

    申请日:2012-03-05

    IPC分类号: G11B7/00

    CPC分类号: G11B7/261 G11B7/00456

    摘要: A master strategy adjustment method includes performing first recording on a master with a predetermined strategy, performing first measurement of an evaluation value of the master of the first recording, forming a first optical disc based on the master after the first recording, performing second measurement of an evaluation value of the optical disc formed as the first optical disc, calculating a target value of the evaluation value of the master based on a difference with the first measurement evaluation value and the second measurement evaluation value, and adjusting the strategy so that the evaluation value with regard to the master matches the target value, performing recording on the master with the adjusted writing strategy, performing measurement of the evaluation value of the master, and performing determination of whether the evaluation value is within a predetermined range with the target value as a reference until an affirmative result is obtained.

    摘要翻译: 主策略调整方法包括以预定的策略在主机上执行第一记录,对第一记录的主装置的评估值进行第一测量,在第一记录之后,基于主装置形成第一光盘,执行第二记录 形成为第一光盘的光盘的评估值,基于与第一测量评估值和第二测量评估值的差异来计算主机的评估值的目标值,并且调整策略,使得评估 相对于主机的值与目标值相匹配,利用调整后的写入策略对主机进行记录,对主机的评价值进行测量,并且以目标值为判定值是否处于预定范围内 直到获得肯定结果为止。

    MASTER STRATEGY ADJUSTMENT METHOD AND DISC MANUFACTURING METHOD
    5.
    发明申请
    MASTER STRATEGY ADJUSTMENT METHOD AND DISC MANUFACTURING METHOD 失效
    主策略调整方法和盘制作方法

    公开(公告)号:US20120236697A1

    公开(公告)日:2012-09-20

    申请号:US13411975

    申请日:2012-03-05

    IPC分类号: G11B7/095

    CPC分类号: G11B7/261 G11B7/00456

    摘要: A master strategy adjustment method includes performing first recording on a master with a predetermined strategy, performing first measurement of an evaluation value of the master of the first recording, forming a first optical disc based on the master after the first recording, performing second measurement of an evaluation value of the optical disc formed as the first optical disc, calculating a target value of the evaluation value of the master based on a difference with the first measurement evaluation value and the second measurement evaluation value, and adjusting the strategy so that the evaluation value with regard to the master matches the target value, performing recording on the master with the adjusted writing strategy, performing measurement of the evaluation value of the master, and performing determination of whether the evaluation value is within a predetermined range with the target value as a reference until an affirmative result is obtained.

    摘要翻译: 主策略调整方法包括以预定的策略在主机上执行第一记录,对第一记录的主装置的评估值进行第一测量,在第一记录之后,基于主装置形成第一光盘,执行第二记录 形成为第一光盘的光盘的评估值,基于与第一测量评估值和第二测量评估值的差异来计算主机的评估值的目标值,并且调整策略,使得评估 相对于主机的值与目标值相匹配,利用调整后的写入策略对主机进行记录,对主机的评价值进行测量,并且以目标值为判定值是否处于预定范围内 直到获得肯定结果为止。

    Signal shaping circuit
    6.
    发明授权
    Signal shaping circuit 有权
    信号整形电路

    公开(公告)号:US07054238B2

    公开(公告)日:2006-05-30

    申请号:US10240097

    申请日:2002-01-29

    IPC分类号: G11B7/00

    摘要: The present invention relates to a signal shaping circuit which is capable of shaping a returning light signal of a modulated signal whose signal level and signal length are arbitrarily varied such that it can be demodulated. The shaped signal pattern generation circuit 15 has, in advance, variation pattern information with regard to a predetermined variation pattern to be applied on a returning light signal recorded therein. The counter 13 inputs a returning light signal, counts a signal length thereof and sends a count value to the shaped signal pattern generation circuit 15. An A/D conversion 14 detects a signal level of the returning light signal and sends the detected signal level to the shaped signal pattern generation circuit 15 in a similar way. The shaped signal pattern generation circuit 15 refers to the variation pattern information and calculates an optimum signal pattern corresponding to a signal length and a signal level of the inputted, returning light signal. The calculated shaped signal pattern is outputted to a shaped signal generation circuit 16. Based on the signal pattern, the shaped signal generation circuit 16 converts the returning light signal and generates an optimum shaped signal.

    摘要翻译: 信号整形电路技术领域本发明涉及一种信号整形电路,其能够对其信号电平和信号长度任意变化的调制信号的返回光信号进行整形,使得其可被解调。 成形信号图案生成电路15预先具有关于要记录在其中的返回光信号应用的预定变化图案的变化图案信息。 计数器13输入返回光信号,对其信号长度进行计数,并向成形信号图案生成电路15发送计数值。 A / D转换14检测返回光信号的信号电平,并以类似的方式将检测信号电平发送到成形信号模式产生电路15。 成形信号图案生成电路15参照变化图案信息,并计算与输入的返回光信号的信号长度和信号电平对应的最佳信号图案。 计算出的成形信号图案被输出到成形信号生成电路16。 成形信号生成电路16基于信号图案转换返回光信号,并生成最佳成形信号。