Sharpening metal carbide emitters
    1.
    发明授权
    Sharpening metal carbide emitters 有权
    磨削金属碳化物放射体

    公开(公告)号:US07828622B1

    公开(公告)日:2010-11-09

    申请号:US11924530

    申请日:2007-10-25

    IPC分类号: H01J9/00 H01J9/04

    CPC分类号: H01J9/042

    摘要: A method for sharpening a metal carbide emitter tip is disclosed. The metal carbide emitter tip is exposed to an oxygen rich, low vacuum environment when the metal carbide emitter tip is at a first temperature. The metal carbide emitter tip is rapidly heated to a higher second temperature at regular intervals of time.

    摘要翻译: 公开了一种用于磨削金属碳化物发射器尖端的方法。 当金属碳化物发射极尖端处于第一温度时,金属碳化物发射极尖端暴露于富氧的低真空环境中。 金属碳化物发射极尖端以规则的时间间隔快速加热到更高的第二温度。

    Contamination pinning for auger analysis
    2.
    发明授权
    Contamination pinning for auger analysis 有权
    螺旋钻分析的污染固定

    公开(公告)号:US07855362B1

    公开(公告)日:2010-12-21

    申请号:US11924492

    申请日:2007-10-25

    IPC分类号: H01J40/00

    CPC分类号: G01N23/2276

    摘要: Electron spectroscopy methods and apparatus are disclosed. A beam of primary electrons is applied to a measurement location on a surface of a sample. A pinning flux of electrons is applied to one or more pinning regions proximate the measurement location. The pinning flux is characterized by a location, size, shape, and electron flux configured such that contaminants preferentially migrate to the pinning region rather than the measurement location. Emissions from the surface resulting from interaction with the primary electrons and the surface of the sample at the measurement location are analyzed.

    摘要翻译: 公开了电子光谱学方法和装置。 将一束一次电子施加到样品表面上的测量位置。 电子的钉扎通量被施加到靠近测量位置的一个或多个钉扎区域。 钉扎通量的特征在于配置的位置,尺寸,形状和电子通量,使得污染物优先迁移到钉扎区而不是测量位置。 分析了与测量位置处的初级电子和样品表面相互作用产生的表面的排放。

    High current density particle beam system
    3.
    发明申请
    High current density particle beam system 有权
    高电流密度粒子束系统

    公开(公告)号:US20060151711A1

    公开(公告)日:2006-07-13

    申请号:US11274608

    申请日:2005-11-15

    IPC分类号: H01J1/50

    摘要: The present invention relates to a charged particle unit for deflecting and energy-selecting charged particles of a charged particle beam. Thereby, a double-focusing sector unit for deflecting and focusing the charged particle beam and an energy-filter forming a potential is provided, whereby charged particles of the charged particles beam are redirected at the potential-saddle depending on the energy of the charged articles.

    摘要翻译: 本发明涉及带电粒子单元,用于对带电粒子束的带电粒子进行偏转和能量选择。 由此,提供用于使带电粒子束偏转和聚焦并形成电位的能量滤波器的双重聚焦扇区单元,由此带电粒子束的带电粒子根据带电物品的能量在电位鞍上被重定向 。

    Non-shot-noise-limited source for electron beam lithography or inspection
    4.
    发明授权
    Non-shot-noise-limited source for electron beam lithography or inspection 有权
    用于电子束光刻或检查的无喷射噪声限制源

    公开(公告)号:US08063365B1

    公开(公告)日:2011-11-22

    申请号:US12326518

    申请日:2008-12-02

    IPC分类号: G01N23/00

    摘要: One embodiment relates to an electron source apparatus for an electron beam lithography tool or an electron beam inspection tool. A cathode is configured to emit electrons, and an anode is configured to accelerate the electrons so as to create an electron beam. There are no beam apertures in the electron source apparatus that are positioned at non-focal planes. An electron lens may be configured to focus the electron beam to form a cathode image at a focal plane, and a beam aperture may positioned at the focal plane. Other embodiments, aspects and features are also disclosed.

    摘要翻译: 一个实施例涉及一种用于电子束光刻工具或电子束检查工具的电子源装置。 阴极被配置为发射电子,并且阳极被配置为加速电子以产生电子束。 电子源装置中没有光束孔位于非焦平面。 电子透镜可以被配置为聚焦电子束以在焦平面处形成阴极图像,并且光束孔径可以位于焦平面处。 还公开了其它实施例,方面和特征。