摘要:
The present invention relates to a charged particle unit for deflecting and energy-selecting charged particles of a charged particle beam. Thereby, a double-focusing sector unit for deflecting and focusing the charged particle beam and an energy-filter forming a potential is provided, whereby charged particles of the charged particles beam are redirected at the potential-saddle depending on the energy of the charged articles.
摘要:
The present invention relates to a charged particle unit for deflecting and energy-selecting charged particles of a charged particle beam. Thereby, a double-focusing sector unit for deflecting and focusing the charged particle beam and an energy-filter forming a potential is provided, whereby charged particles of the charged particles beam are redirected at the potential-saddle depending on the energy of the charged articles.
摘要:
An electron beam device comprises: a beam emitter for emitting a primary electron beam; an objective electron lens for focusing the primary electron beam onto a specimen, the objective lens defining an optical axis; a beam separator having a first dispersion for separating a signal electron beam from the primary electron beam; and a dispersion compensation element. The dispersion compensation element has a second dispersion, the dispersion compensation element being adapted for adjusting the second dispersion independently of an inclination angle of the primary beam downstream of the dispersion compensation element, such that the second dispersion substantially compensates the first dispersion. The dispersion compensation element is arranged upstream, along the primary electron beam, of the beam separator.
摘要:
An achromatic beam separator device for separating a primary charged particle beam from another charged particle beam and providing the primary charged particle beam on an optical axis (142) is provided, including a primary charged particle beam inlet (134), a primary charged particle beam outlet (132) encompassing the optical axis, a magnetic deflection element (163) adapted to generate a magnetic field, and an electrostatic deflection element (165) adapted to generate an electric field overlapping the magnetic field, wherein at least one element chosen from the electrostatic deflection element and the magnetic deflection element is positioned and/or positionable to compensate an octopole influence.
摘要:
An electron beam generator or electron gun has a line-shaped cathode with a flattened tip as an electron source, a slotted diaphragm disposed in the plane of the cathode tip, and a double anode having two electrodes also fashioned as slotted diaphragms. The voltage potentials of the three slotted diaphragms, and their respective distances to the cathode, are selected such that a stigmatic virtual electron source at infinity is obtained.
摘要:
A secondary charged particle detection system for a charged particle beam device is described. The detection system includes a beam splitter for separating a primary beam and a secondary beam formed upon impact on a specimen; a beam bender for deflecting the secondary beam; a focusing lens for focusing the secondary beam; a detection element for detecting the secondary beam particles, and three deflection elements, wherein at least a first deflector is provided between the beam bender and the focusing lens, at least a second deflector is provided between the focusing lens and the detection element, at least a third deflector is provided between the beam splitter and the detection element.