EUV reticle handling system and method
    2.
    发明授权
    EUV reticle handling system and method 失效
    EUV掩模版处理系统和方法

    公开(公告)号:US07477358B2

    公开(公告)日:2009-01-13

    申请号:US11238237

    申请日:2005-09-28

    IPC分类号: G03B27/62 B65D85/38

    CPC分类号: G03F7/70741

    摘要: An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle.

    摘要翻译: 公开了用于保护掩模版的至少一个图案侧和相对侧的外壳。 外壳包括第一和第二部分,其在处理,检查,存储和运输期间形成围绕保护的掩模版的外壳。 外壳与加热器和散热器一起提供封闭的掩模版的热泳保护。

    Vibration isolator with low lateral stiffness
    3.
    发明授权
    Vibration isolator with low lateral stiffness 失效
    具有低侧向刚度的隔振器

    公开(公告)号:US06953109B2

    公开(公告)日:2005-10-11

    申请号:US10267489

    申请日:2002-10-08

    IPC分类号: F16F9/02 F16F15/023 F16F7/10

    CPC分类号: F16F15/0232 F16F9/02

    摘要: A vibration isolator (200) for isolating a first assembly (202) from vibration from a second assembly (204) includes a housing (206) that is secured to the second assembly (204) and a pendulum assembly (208). The pendulum assembly (208) includes one or more pistons (226) and a connector assembly (224). The piston (226) is coupled to the first assembly (202). The connector assembly (224) couples the piston (226) to the housing (206) and allows the piston (226) to swing laterally relative to the housing (206). The vibration isolator (200) can also include a pendulum support (264) and/or a mover (580) that moves the piston (226) and assists in supporting the load of the first assembly (202).

    摘要翻译: 用于将第一组件(202)与来自第二组件(204)的振动隔离的隔振器(200)包括固定到第二组件(204)和摆锤组件(208)的壳体(206)。 摆锤组件(208)包括一个或多个活塞(226)和连接器组件(224)。 活塞(226)联接到第一组件(202)。 连接器组件(224)将活塞(226)联接到壳体(206)并允许活塞(226)相对于壳体(206)横向摆动。 隔振器(200)还可以包括使活塞(226)移动并有助于支撑第一组件(202)的负载的摆动支撑件(264)和/或移动器(580)。

    Method and apparatus for utilizing in-situ measurements techniques in conjunction with thermoelectric chips (TECs)
    4.
    发明授权
    Method and apparatus for utilizing in-situ measurements techniques in conjunction with thermoelectric chips (TECs) 有权
    利用原位测量技术结合热电芯片(TEC)的方法和装置

    公开(公告)号:US08794011B2

    公开(公告)日:2014-08-05

    申请号:US13270522

    申请日:2011-10-11

    IPC分类号: F25B21/02

    摘要: According to one aspect of the present invention, an apparatus includes a surface and a first array. The surface emits radiation, and the first array is arranged over the surface and arranged to provide cooling to the surface, the first array including a plurality of TECs. At least a first sensing arrangement is substantially integrated with the first array, wherein the first sensing arrangement is arranged to make a non-contact measurement associated with the surface. The apparatus also includes a controller arranged to obtain the non-contact measurement and to use the non-contact measurement to control the cooling provided by the first array.

    摘要翻译: 根据本发明的一个方面,一种装置包括表面和第一阵列。 表面发射辐射,并且第一阵列布置在表面上并且布置成向表面提供冷却,第一阵列包括多个TEC。 至少第一感测装置基本上与第一阵列一体化,其中第一感测装置布置成进行与表面相关联的非接触测量。 该装置还包括控制器,其布置成获得非接触式测量并使用非接触测量来控制第一阵列所提供的冷却。

    SYSTEM AND METHOD FOR CONTROLLING THE DISTORTION OF A RETICLE
    5.
    发明申请
    SYSTEM AND METHOD FOR CONTROLLING THE DISTORTION OF A RETICLE 审中-公开
    用于控制物品失真的系统和方法

    公开(公告)号:US20120120379A1

    公开(公告)日:2012-05-17

    申请号:US13090183

    申请日:2011-04-19

    IPC分类号: G03B27/68

    摘要: An apparatus for controlling the distortion of a reticle (28) includes a temperature adjuster (258) and a control system (226). The temperature adjuster (258) includes a plurality of adjuster elements (258E) that individually adjust the temperature of a plurality of regions (28R) of the reticle (28). The control system (226) includes a state observer (250) and a controller (260). The state observer (250) estimates an estimated physical condition (250C) of the reticle (28). The controller (260) controls the adjuster elements (258E) of the temperature adjuster (258) based at least in part on the estimated physical condition (250C).

    摘要翻译: 用于控制掩模版(28)的变形的装置包括温度调节器(258)和控制系统(226)。 温度调节器(258)包括分别调节掩模版(28)的多个区域(28R)的温度的多个调节元件(258E)。 控制系统(226)包括状态观察器(250)和控制器(260)。 状态观察器(250)估计掩模版(28)的估计的物理条件(250℃)。 控制器(260)至少部分地基于估计的身体状况(250C)来控制温度调节器(258)的调节器元件(258E)。

    EUV reticle handling system and method
    6.
    发明授权
    EUV reticle handling system and method 有权
    EUV掩模版处理系统和方法

    公开(公告)号:US07804583B2

    公开(公告)日:2010-09-28

    申请号:US12242050

    申请日:2008-09-30

    IPC分类号: G03B27/62 G03B27/52

    CPC分类号: G03F7/70741

    摘要: An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. A method for transporting the reticle to an exposure position from a position outside an exposure chamber is disclosed, including a method for use of a load-lock chamber.

    摘要翻译: 公开了用于保护掩模版的至少一个图案侧和相对侧的外壳。 外壳包括第一和第二部分,其在处理,检查,存储和运输期间形成围绕保护的掩模版的外壳。 公开了一种用于将掩模版从暴露室外的位置传送到曝光位置的方法,包括使用负载锁定室的方法。

    Self-correcting optical elements for high-thermal-load optical systems
    7.
    发明申请
    Self-correcting optical elements for high-thermal-load optical systems 有权
    用于高热负荷光学系统的自校正光学元件

    公开(公告)号:US20090122429A1

    公开(公告)日:2009-05-14

    申请号:US11983615

    申请日:2007-11-09

    IPC分类号: G02B7/185

    CPC分类号: G02B7/028 G02B7/008 G02B7/181

    摘要: Mirrors and other optical elements are disclosed that include a body defining an optical surface (typically a reflective surface) and an opposing second surface. The body has a coefficient of thermal expansion (CTE). The optical element includes a correcting portion (e.g., a layer) attached to the second surface and having a CTE that, during heating of the optical element, imparts a bending moment to the body that at least partially offsets a change in curvature of the optical surface caused by heating. The body can be internally cooled. The body and correcting portion desirably are made of respective thermally conductive materials that can vary only slightly in CTE. The body desirably has a lower CTE than the correcting portion, and the correcting portion can be tuned according a variable property of the body and/or reflective surface. The body and correcting portion desirably function cooperatively in a thermally bimetallic-like manner.

    摘要翻译: 公开了镜子和其它光学元件,其包括限定光学表面(通常为反射表面)和相对的第二表面的主体。 身体有一个热膨胀系数(CTE)。 光学元件包括附接到第二表面并具有CTE的校正部分(例如,层),该CTE在光学元件的加热期间向本体施加弯曲力矩,该弯曲力矩至少部分地抵消光学元件的曲率变化 加热引起的表面。 身体可以内部冷却。 主体和校正部分期望地由可在CTE中稍微变化的相应导热材料制成。 身体期望地具有比校正部分更低的CTE,并且校正部分可以根据身体和/或反射表面的可变特性进行调节。 身体和校正部分期望地以热双金属样的方式协同地起作用。

    Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system
    8.
    发明授权
    Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system 失效
    具有离散致动器的自适应光学器件用于可变形反射镜系统的连续变形

    公开(公告)号:US06880942B2

    公开(公告)日:2005-04-19

    申请号:US10460644

    申请日:2003-06-13

    IPC分类号: G02B26/08 G03F7/20 G02B5/08

    CPC分类号: G03F7/70266 G02B26/0825

    摘要: Adaptive optical elements for use in high precision lithography exposure are provided with an array of discrete actuators to provide highly stable and repeatable correction of the shape of an optical element to an accuracy of a small fraction of a very short wavelength of light in the EUV range of 1 to 50 nanometers, responsive to a metrology source and sensor arrangement. The actuators are matched to the deformation characteristics of the adaptive optical elements. Preferably, the actuators provide both positive and negative force for outward and/or inward deflection continuously over the surface of the mirror. The surface of the optical element may thus be accurately, controllably and repeatably deformed to within an allowable deformation limit to optimize optical performance of an optical system for high precision lithography exposure.

    摘要翻译: 用于高精度光刻曝光的自适应光学元件设置有离散致动器的阵列,以提供高度稳定且可重复的光学元件形状的校正,使其在EUV范围内的非常短波长的光的一小部分的精度 1至50纳米,响应于测量源和传感器布置。 致动器与自适应光学元件的变形特性相匹配。 优选地,致动器在反射镜的表面上连续地向外和/或向内偏转提供正的和负的力。 因此,光学元件的表面因此可以精确地,可控地和可重复地变形到允许的变形极限内,以优化用于高精度光刻曝光的光学系统的光学性能。

    Self-correcting optical elements for high-thermal-load optical systems

    公开(公告)号:US08425060B2

    公开(公告)日:2013-04-23

    申请号:US11983615

    申请日:2007-11-09

    IPC分类号: G02B5/08

    CPC分类号: G02B7/028 G02B7/008 G02B7/181

    摘要: Mirrors and other optical elements are disclosed that include a body defining an optical surface (typically a reflective surface) and an opposing second surface. The body has a coefficient of thermal expansion (CTE). The optical element includes a correcting portion (e.g., a layer) attached to the second surface and having a CTE that, during heating of the optical element, imparts a bending moment to the body that at least partially offsets a change in curvature of the optical surface caused by heating. The body can be internally cooled. The body and correcting portion desirably are made of respective thermally conductive materials that can vary only slightly in CTE. The body desirably has a lower CTE than the correcting portion, and the correcting portion can be tuned according a variable property of the body and/or reflective surface. The body and correcting portion desirably function cooperatively in a thermally bimetallic-like manner.

    Liquid cooled mirror for use in extreme ultraviolet lithography
    10.
    发明授权
    Liquid cooled mirror for use in extreme ultraviolet lithography 有权
    用于极紫外光刻的液体冷却镜

    公开(公告)号:US07591561B2

    公开(公告)日:2009-09-22

    申请号:US11382342

    申请日:2006-05-09

    IPC分类号: G02B5/08

    摘要: Methods and apparatus for internally or directly cooling a mirror using a fluid with laminar flow properties are disclosed. According to one aspect of the present invention, an internally cooled mirror includes an optical surface that absorbs light, and at least one microchannel formed beneath the optical surface. The mirror also includes a port that supplied a fluid to the microchannel. The fluid is subjected to a laminar flow and absorbs heat associated with the absorbed light.

    摘要翻译: 公开了使用具有层流性质的流体内部或直接冷却反射镜的方法和装置。 根据本发明的一个方面,内部冷却镜包括吸收光的光学表面和形成在光学表面下方的至少一个微通道。 镜子还包括向微通道供应流体的端口。 流体经受层流并吸收与吸收的光相关的热量。