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    Methods and systems for inspecting structures for crystallographic imperfections
    3.
    发明授权
    Methods and systems for inspecting structures for crystallographic imperfections 有权
    检查晶体缺陷结构的方法和系统

    公开(公告)号：US08605858B2

    公开(公告)日：2013-12-10

    申请号：US13169902

    申请日：2011-06-27

    申请人： Surendra Singh ,  Andy Szuromi ,  Vladimir K. Tolpygo ,  Andy Kinney

    发明人： Surendra Singh ,  Andy Szuromi ,  Vladimir K. Tolpygo ,  Andy Kinney

    IPC分类号： G01N23/207

    CPC分类号： G01N23/207

    摘要： Embodiments of methods and systems for inspecting a structure for a crystallographic imperfection are provided. In the method, an X-ray wavelength that is particularly susceptible to diffraction by the crystallographic imperfection is identified. Then an X-ray source is provided to emit X-rays in the identified X-ray wavelength. While placing the structure at a sequence of positions relative to the X-ray source, X-rays are directed at the structure in multiple, non-parallel arrays to create sequential patterns of diffracted X-rays. The patterns of diffracted X-rays are digitally captured and communicated to a computer that compares them to locate the crystallographic imperfection. For a surface imperfection, the imperfection may be marked with a target to allow for physical removal.

    摘要翻译： 提供了用于检查晶体缺陷的结构的方法和系统的实施例。 在该方法中，识别出通过晶体缺陷特别容易衍射的X射线波长。 然后提供X射线源以在所识别的X射线波长中发射X射线。 当将结构放置在相对于X射线源的位置序列时，X射线被引导到多个非平行阵列中的结构以产生衍射X射线的顺序图案。 衍射X射线的图案被数字捕获并传送到计算机，以比较它们以定位晶体学缺陷。 对于表面缺陷，缺陷可以用目标标记以允许物理去除。

    METHODS AND SYSTEMS FOR INSPECTING STRUCTURES FOR CRYSTALLOGRAPHIC IMPERFECTIONS
    4.
    发明申请
    METHODS AND SYSTEMS FOR INSPECTING STRUCTURES FOR CRYSTALLOGRAPHIC IMPERFECTIONS 有权
    用于检查晶体显示结构的方法和系统

    公开(公告)号：US20120328079A1

    公开(公告)日：2012-12-27

    申请号：US13169902

    申请日：2011-06-27

    申请人： Surendra Singh ,  Andy Szuromi ,  Vladimir K. Tolpygo ,  Andy Kinney

    发明人： Surendra Singh ,  Andy Szuromi ,  Vladimir K. Tolpygo ,  Andy Kinney

    IPC分类号： G01N23/207

    CPC分类号： G01N23/207

    摘要： Embodiments of methods and systems for inspecting a structure for a crystallographic imperfection are provided. In the method, an X-ray wavelength that is particularly susceptible to diffraction by the crystallographic imperfection is identified. Then an X-ray source is provided to emit X-rays in the identified X-ray wavelength. While placing the structure at a sequence of positions relative to the X-ray source, X-rays are directed at the structure in multiple, non-parallel arrays to create sequential patterns of diffracted X-rays. The patterns of diffracted X-rays are digitally captured and communicated to a computer that compares them to locate the crystallographic imperfection. For a surface imperfection, the imperfection may be marked with a target to allow for physical removal.

    摘要翻译： 提供了用于检查晶体缺陷的结构的方法和系统的实施例。 在该方法中，识别出通过晶体缺陷特别容易衍射的X射线波长。 然后提供X射线源以在所识别的X射线波长中发射X射线。 当将结构放置在相对于X射线源的位置序列时，X射线被引导到多个非平行阵列中的结构以产生衍射X射线的顺序图案。 衍射X射线的图案被数字捕获并传送到计算机，以比较它们以定位晶体学缺陷。 对于表面缺陷，缺陷可以用目标标记以允许物理去除。