公开(公告)号：US4213172A

公开(公告)日：1980-07-15

申请号：US878549

申请日：1978-02-16

申请人： Antonio Scattolin ,  Sergio Bernardi

发明人： Antonio Scattolin ,  Sergio Bernardi

IPC分类号： F16M11/04 ,  F21L20060101 ,  F21S6/00 ,  F21S8/00 ,  F21V20060101 ,  F21V17/16 ,  F21V21/26 ,  F21V29/00 ,  F21S1/12 ,  F21V21/00 ,  F21V21/18

CPC分类号： F21V29/505 ,  F16M11/10 ,  F16M11/2014 ,  F16M11/2092 ,  F16M11/24 ,  F16M13/022 ,  F21S48/1104 ,  F21S6/003 ,  F21V17/164 ,  F21V21/06 ,  F21V21/26 ,  F21V29/004 ,  F21V29/74 ,  F16M2200/044 ,  F16M2200/063 ,  F21V21/088

摘要： Movable stand for lampholders comprising an articulated parallelogram member associated with one end to a supporting base and carrying, at the other end, a lampholder. In order to balance the articulated parallelogram friction means are provided acting on a rod member of the articulated parallelogram. The friction means comprise a pair of shoes, arranged opposite each other and having a substantially mating shape to the shape of the rod member whereon the shoes are acting. The pair of shoes is supported by a pair of leaf springs pivoted at their other ends to an opposite rod member to the rod member whereon the shoes are acting.

摘要翻译： 用于灯座的可移动支架包括与一端连接到支撑底座并且在另一端承载灯座的铰接平行四边形构件。 为了平衡铰接的平行四边形，提供作用在铰接的平行四边形的杆构件上的摩擦装置。 摩擦装置包括一对鞋子，它们彼此相对布置，并且具有与鞋子作用的杆件的形状基本上配合的形状。 一对鞋子由一对在其另一端枢转的板簧支撑到与鞋子作用的杆件相对的杆件上。

公开(公告)号：US20050074697A1

公开(公告)日：2005-04-07

申请号：US10945598

申请日：2004-09-21

申请人： Massimo De Vittorio ,  Sergio Bernardi ,  Dario Pisignano ,  Maria Todaro ,  Roberto Cingolani ,  Giuseppe Gigli

发明人： Massimo De Vittorio ,  Sergio Bernardi ,  Dario Pisignano ,  Maria Todaro ,  Roberto Cingolani ,  Giuseppe Gigli

IPC分类号： B29C33/38 ,  G03C1/76 ,  G03F7/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： Masters for imprint processes are produced by providing a resist layer, and patterning the resist layer after a respective mold pattern to produce a patterned resist layer adapted to be directly used as a master for imprint lithography. Preferably the resist is spin cast on a substrate and is comprised of a photoresist, such as negative-tone, electron-beam sensitive resist having a glass transition temperature above 200° C. and adapted to be mechanically stable to pressures up to 104 psi. Preferably, the resist is a polymer resist, such as an epoxy resist e.g. SU8 and SU8-2000. Patterning the resist layer includes the steps of structuring the resist layer, soft-baking the structured resist layer in order to selectively cross-link the structured portion of the structured resist layer and developing the structured resist layer in order to receive a patterned resist layer. The patterned resist layer is preferably cured e.g. by hard-bake curing in order to increase at least one of the mechanical stability and the glass transition temperature of said patterned resist layer. Structuring may be performed by optical lithography or electron beam lithography.

摘要翻译： 通过提供抗蚀剂层，并在相应的模具图案之后对抗蚀剂层进行图案化以产生适于直接用作压印光刻的母版的图案化抗蚀剂层来制造压印工艺的主体。 优选地，将抗蚀剂旋涂在基底上，并且由光致抗蚀剂，例如具有玻璃化转变温度高于200℃的负色调电子束敏感抗蚀剂组成，并适于机械稳定至高达10 4的压力 > psi。 优选地，抗蚀剂是聚合物抗蚀剂，例如环氧树脂抗蚀剂。 SU8和SU8-2000。 抗蚀剂层的图形化包括以下步骤：构建抗蚀剂层，软化烘焙结构化抗蚀剂层，以选择性地交联结构化抗蚀剂层的结构化部分并显影结构化抗蚀剂层以便接收图案化的抗蚀剂层。 图案化的抗蚀剂层优选固化，例如 通过硬烘烤固化以增加所述图案化抗蚀剂层的机械稳定性和玻璃化转变温度中的至少一个。 结构化可以通过光学光刻或电子束光刻进行。

公开(公告)号：US4872943A

公开(公告)日：1989-10-10

申请号：US207259

申请日：1988-06-15

申请人： Sergio Bernardi

发明人： Sergio Bernardi

IPC分类号： C30B19/04 ,  H01L21/368

CPC分类号： H01L21/02628 ,  C30B19/04 ,  C30B29/48 ,  H01L21/02411 ,  H01L21/02562 ,  H01L21/02625 ,  Y10S117/906 ,  Y10S148/101

摘要： A process for making single-crystal mercury cadmium telluride layers by epitaxial growth on a cadmium telluride substrate, performed inside a reactor with two communication zones, kept at different and controlled temperatures. The growth solution is directly prepared inside the reactor by subjecting weighed cadmium and tellurium quantities and a mercury bath to a specific thermal cycle so that the mercury concentration in the solution is established by absorption from the vapor phase and is controlled by the lower temperature level.

公开(公告)号：US4906325A

公开(公告)日：1990-03-06

申请号：US254380

申请日：1988-10-05

申请人： Sergio Bernardi

发明人： Sergio Bernardi

IPC分类号： C30B19/00 ,  C30B19/04 ,  C30B29/48 ,  H01L21/368

CPC分类号： H01L21/02628 ,  C30B19/04 ,  C30B29/48 ,  H01L21/02411 ,  H01L21/02562 ,  H01L21/02625 ,  Y10S117/906

摘要： A method of making symmetrical mercury cadmium telluride layers by epitaxial growth on a cadmium telluride substrate, performed inside a reactor with two communicating zones, kept at different and controlled temperatures. Growth solution is directly prepared inside the reactor by submitting to a specific thermal cycle a weighed tellurium quantity, a saturating cadmium telluride substrate and a mercury bath.