Abstract:
A bonding operation to increase the bond between a coating layer and substrate is described. The coating layer may be designed to resist residue on a substrate that covers a display of an electronic device. An adhesion layer including silica (SiO2) and a catalyst or dopant, such as zirconium, may be used to bond the coating layer with the substrate. The dopant can alter the chemical nature of the adhesion layer and increase the number of chemical bonding sites at a bonding surface of the adhesion layer, thereby creating an activated bonding surface. One activated surface of the adhesion layer can be bonded with the substrate, while another activated surface of the adhesion layer can be bonded with the coating layer.
Abstract:
The described embodiments relate generally to a structure and methods of forming a structure for improving thermal management in an electronic device. The structure including a casing; a cover glass; a multilayer film on an exterior surface of the casing and of the cover glass, adapted to reflect radiation in a first spectral region and to transmit radiation in a second spectral region. In embodiments consistent with the present disclosure a casing for a portable electronic device may include a reflective portion in an interior surface including a hot spot in the electronic device; and an emissive portion in the interior surface including an area non-overlapping a hot spot.
Abstract:
A woven material (100) including bonding fibers (108) and a method of reinforcing woven material using bonding fibers is disclosed. The woven material (100) includes a plurality of warp threads (102), and at least one weft thread (104) coupled to the warp threads (102). The woven material (100) also includes a plurality of bonding fibers (108). The bonding fibers (108) are positioned in parallel with the warp threads (102), and/or in parallel with the weft thread(s) (104). Additionally, the bonding fibers (108) are formed from a material having a melting temperature that is lower than a melting temperature of the material(s) used to form the warp threads (102) and the weft thread(s) (104) of the woven material.