Abstract:
An electron beam imaging apparatus capable of projecting an electron beam image on a substrate comprises a vacuum chamber having a wall and a substrate support. An electron beam source, modulator, and scanner is provided to generate, modulate, and scan one or more electron beams across the substrate. A controller is capable of generating or receiving an electrical signal to communicate with the electron beam source, modulator or scanner. One or more signal convertors are capable of converting the electrical signal to an optical signal and vice versa, the signal convertors located on either side of the wall. An optical signal carrier is capable of transmitting the optical signal through the wall of the chamber
Abstract:
An electron beam lithography system has an electron gun including at least one laser that is operable in a first mode to generate electrons for lithography. The electron beam lithography system is operable in a second mode to regenerate the photocathode of the electron gun by application of the laser. The photocathode includes a layer of cesium telluride.