Annealing chamber
    1.
    发明授权

    公开(公告)号:US11521870B2

    公开(公告)日:2022-12-06

    申请号:US16923818

    申请日:2020-07-08

    Inventor: Giridhar Kamesh

    Abstract: Embodiments disclosed herein generally include annealing chambers. The annealing chambers allow for high throughput without sacrificing wafer-to-wafer and within wafer uniformity. The annealing chamber includes a transport system, a substrate carrier, and a plurality of thermal sources. The transport system is magnetically coupled to the substrate carrier. The transport system moves the substrate carrier along a path. A substrate supported by the substrate carrier is annealed by the thermal sources. The annealing chamber described herein allows for a higher throughput of substrate (alternatively referred to as a wafer) annealing compared to furnace annealing chambers.

    Apparatus for rotating substrates

    公开(公告)号:US12165907B2

    公开(公告)日:2024-12-10

    申请号:US16952979

    申请日:2020-11-19

    Abstract: Embodiments of the present disclosure generally relate to apparatus for substrate processing, and more specifically to apparatus for rotating substrates and to uses thereof. In an embodiment, an apparatus for rotating a substrate is provided. The apparatus includes a levitatable rotor comprising a plurality of magnets embedded therein, a plurality of gas bearings positioned to levitate the levitatable rotor, and a stator magnetically coupled to the levitatable rotor, the stator for producing a rotating magnetic field. Apparatus for processing a substrate with the apparatus for rotating substrates as well as methods of use are also described.

    TEMPERATURE ACTUATED VALVE AND METHODS OF USE THEREOF

    公开(公告)号:US20230213109A1

    公开(公告)日:2023-07-06

    申请号:US17565882

    申请日:2021-12-30

    CPC classification number: F16K31/002 G05D23/02 H01L21/67017 H01J37/32183

    Abstract: Disclosed herein is a temperature actuated valve, including a stationary member and a movable member, wherein the stationary member is configured to receive the movable member. A first flow path is defined between an outer surface of the stationary member and an inner surface of a housing and a second flow path defined by and within the movable member. The temperature actuated valve further includes at least one temperature actuated member having a first end seated against a base of the stationary member and a second end seated against a base of the movable member. The temperature actuated valve further includes a bias member having a first end connected to the base of the stationary member and a second end connected to the base of the movable member, the at least one temperature actuated member configured to compress at a first temperature and expand at a second temperature.

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