公开(公告)号：US20040219789A1

公开(公告)日：2004-11-04

申请号：US10778898

申请日：2004-02-12

申请人： Applied Materials, Inc.

发明人： Bingxi Sun Wood ,  Mark N. Kawaguchi ,  James S. Papanu ,  Roderick C. Mosely ,  Chiukin Steven Lai ,  Chien-Teh Kao ,  Hua Ai ,  Wei W. Wang

IPC分类号： H01L021/302 ,  H01L021/461

CPC分类号： H01L21/67069 ,  C23C14/022 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32871 ,  H01J37/34 ,  H01L21/02046 ,  H01L21/02063 ,  H01L21/31116 ,  H01L21/32136 ,  H01L21/67028 ,  H01L21/76814 ,  H01L21/76838

摘要： A substrate cleaning apparatus has a remote source to remotely energize a hydrogen-containing gas to form an energized gas having a first ratio of ionic hydrogen-containing species to radical hydrogen-containing species. The apparatus has a process chamber with a substrate support, an ion filter to filter the remotely energized gas to form a filtered energized gas having a second ratio of ionic hydrogen-containing species to radical hydrogen-containing species, the second ratio being different than the first ratio, and a gas distributor to introduce the filtered energized gas into the chamber.

摘要翻译： 基板清洁装置具有远程源，以远程激励含氢气体以形成具有离子含氢物质与自由基含氢物质的第一比例的通电气体。 该设备具有带有基板支撑件的处理室，用于过滤远程激励的气体以形成具有离子含氢物质与含氢的物质的第二比例的过滤的通电气体的离子过滤器，第二比例不同于 第一比例和气体分配器，以将过滤的通电气体引入室中。