公开(公告)号：US20030075524A1

公开(公告)日：2003-04-24

申请号：US09978121

申请日：2001-10-15

申请人： Applied Materials, Inc.

发明人： Mark N. Kawaguchi ,  Huong T. Nguyen ,  Nikolaos Bekiaris ,  James S. Papanu

IPC分类号： C23F001/00 ,  B44C001/22 ,  H01L021/302

CPC分类号： H01L21/02063 ,  G03F7/427 ,  H01L21/31138

摘要： A method of photoresist removal is described. A substrate is located in a processing chamber. A mixture of gases is excited, the mixture comprising a majority component of a reducing process gas and a minority component of between 0.1% and 10% by volume of an oxidizing process gas. Reactive gas species are thereby generated. A photoresist layer with an exposed dielectric layer on the substrate in the chamber is then exposed to the reactive gas mixture to selectively remove the photoresist layer from the dielectric layer.

摘要翻译： 描述了光致抗蚀剂去除的方法。 衬底位于处理室中。 激发气体的混合物，该混合物包含还原过程气体的主要成分和少于0.1-10体积％的氧化处理气体的少数成分。 由此产生反应性气体物质。 然后在腔室中的衬底上具有暴露的电介质层的光致抗蚀剂层暴露于反应性气体混合物以从介电层选择性地去除光致抗蚀剂层。

公开(公告)号：US20040219789A1

公开(公告)日：2004-11-04

申请号：US10778898

申请日：2004-02-12

申请人： Applied Materials, Inc.

发明人： Bingxi Sun Wood ,  Mark N. Kawaguchi ,  James S. Papanu ,  Roderick C. Mosely ,  Chiukin Steven Lai ,  Chien-Teh Kao ,  Hua Ai ,  Wei W. Wang

IPC分类号： H01L021/302 ,  H01L021/461

CPC分类号： H01L21/67069 ,  C23C14/022 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32871 ,  H01J37/34 ,  H01L21/02046 ,  H01L21/02063 ,  H01L21/31116 ,  H01L21/32136 ,  H01L21/67028 ,  H01L21/76814 ,  H01L21/76838

摘要： A substrate cleaning apparatus has a remote source to remotely energize a hydrogen-containing gas to form an energized gas having a first ratio of ionic hydrogen-containing species to radical hydrogen-containing species. The apparatus has a process chamber with a substrate support, an ion filter to filter the remotely energized gas to form a filtered energized gas having a second ratio of ionic hydrogen-containing species to radical hydrogen-containing species, the second ratio being different than the first ratio, and a gas distributor to introduce the filtered energized gas into the chamber.

摘要翻译： 基板清洁装置具有远程源，以远程激励含氢气体以形成具有离子含氢物质与自由基含氢物质的第一比例的通电气体。 该设备具有带有基板支撑件的处理室，用于过滤远程激励的气体以形成具有离子含氢物质与含氢的物质的第二比例的过滤的通电气体的离子过滤器，第二比例不同于 第一比例和气体分配器，以将过滤的通电气体引入室中。