公开(公告)号：US20180257172A1

公开(公告)日：2018-09-13

申请号：US15955503

申请日：2018-04-17

Applicant: Applied Materials, Inc.

Inventor： Gang PENG ,  David W. GROECHEL ,  Jenn C. CHOW ,  Tuochuan HUANG ,  Han WANG

IPC: B23K26/00 ,  B23K26/12 ,  H01J37/32

CPC classification number: B23K26/355 ,  B23K26/123 ,  H01J37/32477 ,  H01J37/32504

Abstract: A system to provide a texture to a surface of a component for use in a semiconductor processing chamber is provided. The system includes an enclosure comprising a processing region, a support disposed in the processing region, a photon light source to generate a stream of photons, an optical module operably coupled to the photon light source, and a lens. The optical module includes a beam modulator to create a beam of photons from the stream of photons generated from the photon light source, and a beam scanner to scan the beam of photons across the surface of the component. The lens is used to receive the beam of photons from the beam scanner and distribute the beam of photons at a wavelength in a range between about 345 nm and about 1100 nm across the surface of the component to form a plurality of features on the component.

公开(公告)号：US20210046587A1

公开(公告)日：2021-02-18

申请号：US17089531

申请日：2020-11-04

Applicant: Applied Materials, Inc.

Inventor： Gang PENG ,  David W. GROECHEL ,  Jenn C. CHOW ,  Tuochuan HUANG ,  Han WANG

IPC: B23K26/352 ,  H01J37/32 ,  B23K26/12

Abstract: A system to provide a texture to a surface of a component for use in a semiconductor processing chamber is provided. The system includes an enclosure comprising a processing region, a support disposed in the processing region, a photon light source to generate a stream of photons, an optical module operably coupled to the photon light source, and a lens. The optical module includes a beam modulator to create a beam of photons from the stream of photons generated from the photon light source, and a beam scanner to scan the beam of photons across the surface of the component. The lens is used to receive the beam of photons from the beam scanner and distribute the beam of photons at a wavelength in a range between about 345 nm and about 1100 nm across the surface of the component to form a plurality of features on the component.

公开(公告)号：US20190358746A1

公开(公告)日：2019-11-28

申请号：US16532011

申请日：2019-08-05

Applicant: Applied Materials, Inc.

Inventor： Gang PENG ,  David W. GROECHEL ,  Jenn C. CHOW ,  Tuochuan HUANG ,  Han WANG

IPC: B23K26/352 ,  H01J37/32 ,  B23K26/12

Abstract: A system to provide a texture to a surface of a component for use in a semiconductor processing chamber is provided. The system includes an enclosure comprising a processing region, a support disposed in the processing region, a photon light source to generate a stream of photons, an optical module operably coupled to the photon light source, and a lens. The optical module includes a beam modulator to create a beam of photons from the stream of photons generated from the photon light source, and a beam scanner to scan the beam of photons across the surface of the component. The lens is used to receive the beam of photons from the beam scanner and distribute the beam of photons at a wavelength in a range between about 345 nm and about 1100 nm across the surface of the component to form a plurality of features on the component.

公开(公告)号：US20190341276A1

公开(公告)日：2019-11-07

申请号：US16400603

申请日：2019-05-01

Applicant: Applied Materials, Inc.

Inventor： Jenn C. CHOW ,  David W. GROECHEL ,  Tuochuan HUANG ,  Dorothea BUECHEL-RIMMEL ,  Han WANG ,  Li WU ,  Gang PENG

IPC: H01L21/67 ,  B08B3/12 ,  B08B3/02

Abstract: Embodiments described herein relate to chamber component cleaning systems and methods for cleaning a chamber component. The chamber component cleaning system includes a spray station, at least a first cleaning station, a dry station, a component transfer mechanism, and one or more enclosures that enclose the spray station, at least the first cleaning station, the dry station, and the component transfer mechanism. The spray station has a holder to position a chamber component in a path of a flow of a cleaning spray and a movable nozzle to provide the flow of the cleaning spray at a first pressure in a path of portions of the chamber component. The first cleaning station has a push mechanism to force a cleaning fluid through features and/or holes of the chamber component and at least one movable transducer to provide ultrasonic energy to the portions of the chamber component.